Development of a high performance gantry system for a new generation of optical slope measuring profilers

A new high performance metrology gantry system has been developed within the scope of collabora tive efforts of optics groups at the US Departmen o fEnergy synchrotron radiatio facilities as well as the BESSY II synchrotron at the Helmholtz Zentrum Berlin Germany and the participation of industrial vendors of x ray optics and metrology instrumentation directed to create a new generation of optical slope measuring systems OSMS . The slope measurement accuracy of the OSMS is expected to be of 50 nrad, which is strongly required for the current and future metrology of x ray optics for the next generation of light sources. The fabricated system was installed and commissioned December2012 at the Advanced Photon Source APS at Argonne National Laboratory to replace the aging APS Long Trace Profiler APSLTP II . Preliminary tests were conducted in January and May 2012 using the optical system configuration of the Nanometer Optical Component Measuring Machine NOM developed at Helmholtz Zentrum Berlin HZB BESSY II. With a flat Si mirror that is 350 mm long and has 200nrad rms nominal slope error over a useful length of 300mm, the system provides a repeatability of about 53nrad. This value corresponds to the design performance of 50nrad rms accuracy for inspection of ultra precise flat optic