628 research outputs found

    CO chemisorption on Ir(111)

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    The adsorption of carbon monoxide on the (111) crystallographic orientation of iridium both at and below room temperature has been investigated using both low‐energy electron diffraction (LEED) and thermal desorption mass spectrometry. At room temperature, CO adsorbs rapidly resulting in the appearance of a faint (√3×√3) R30° LEED pattern after only approximately 1.3×10^(−6) Torr s (1.72×10^(−4) Pa s) exposure. Upon further exposure to CO, the intensity of the overlayer LEED beams initially increases, but then decreases passing through a maximum at an exposure of approximately 2.4×10^(−6) Torr s (3.2×10^(−4) Pa s). By an exposure of 10^(−5) Torr s (1.3×10^(−3) Pa s) each of the (rather dim and diffuse) overlayer beams has split into two beams. These beams then move toward the substrate beams with increasing CO surface coverage, until near saturation coverage the angle between the split overlayer beams subtended at the (00) beam is greater than 30°

    Inter-Diffusion of Nickel and Palladium with Germanium

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    Nickel and palladium germanides are the most promising candidates for nano-electronic contact materials to active areas of germanium-based devices. Solid-state reactions were thermally induced in conventional thin film couples of the Ni/Ge and Pd/Ge systems in order to study the sequence of phase formation. By embedding a thin layer of tantalum or tungsten as an inert marker between coupling thin film layers and observing its movement during phase formation, the dominant diffusing species were identified and monitored. In the Ni/Ge system, Ni5Ge3 was the first phase to form followed by NiGe. The results showed that during Ni5Ge3 formation, Ni was the sole diffusing species. During NiGe formation, both Ni and Ge diffused with the Ge diffusion prominent during the early stages, while the later stage of growth was dominated by Ni diffusion. The only phases observed to form in the Pd/Ge system were PdGe and Pd2Ge, the latter being the first. Palladium was the dominant diffusing species during both phase formations. Lateral diffusion couples were also prepared by the deposition of thick rectangular islands of germanium on to thin films of nickel and palladium. Several aspects of thermally induced lateral (as opposed to vertical) growth of phases were studied

    Events, processes, and the time of a killing

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    The paper proposes a novel solution to the problem of the time of a killing (ToK), which persistently besets theories of act-individuation. The solution proposed claims to expose a crucial wrong-headed assumption in the debate, according to which ToK is essentially a problem of locating some event that corresponds to the killing. The alternative proposal put forward here turns on recognizing a separate category of dynamic occurents, viz. processes. The paper does not aim to mount a comprehensive defense of process ontology, relying instead on extant defenses. The primary aim is rather to put process ontology to work in diagnosing the current state of play over ToK, and indeed in solving it

    Syntheses and studies in potential tuberculostatics

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    Abstract Not Provided

    Artificial Neural Network to predict mean monthly total ozone in Arosa, Switzerland

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    Present study deals with the mean monthly total ozone time series over Arosa, Switzerland. The study period is 1932-1971. First of all, the total ozone time series has been identified as a complex system and then Artificial Neural Networks models in the form of Multilayer Perceptron with back propagation learning have been developed. The models are Single-hidden-layer and Two-hidden-layer Perceptrons with sigmoid activation function. After sequential learning with learning rate 0.9 the peak total ozone period (February-May) concentrations of mean monthly total ozone have been predicted by the two neural net models. After training and validation, both of the models are found skillful. But, Two-hidden-layer Perceptron is found to be more adroit in predicting the mean monthly total ozone concentrations over the aforesaid period.Comment: 22 pages, 14 figure

    The prevalence of uterine fundal pressure during the second stage of labour for women giving birth in health facilities: a systematic review and meta-analysis.

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    Background Uterine fundal pressure involves a birth attendant pushing on the woman’s uterine fundus to assist vaginal birth. It is used in some clinical settings, though guidelines recommend against it. This systematic review aimed to determine the prevalence of uterine fundal pressure during the second stage of labour for women giving birth vaginally at health facilities. Methods The population of interest were women who experienced labour in a health facility and in whom vaginal birth was anticipated. The primary outcome was the use of fundal pressure during second stage of labour. MEDLINE, EMBASE, CINAHL and Global Index Medicus databases were searched for eligible studies published from 1 January 2000 onwards. Meta-analysis was conducted to determine a pooled prevalence, with subgroup analyses to explore heterogeneity. Results Eighty data sets from 76 studies (n = 898,544 women) were included, reporting data from 22 countries. The prevalence of fundal pressure ranged from 0.6% to 69.2% between studies, with a pooled prevalence of 23.2% (95% CI 19.4–27.0, I2 = 99.97%). There were significant differences in prevalence between country income level (p < 0.001, prevalence highest in lower-middle income countries) and method of measuring use of fundal pressure (p = 0.001, prevalence highest in studies that measured fundal pressure based on women’s self-report). Conclusions The use of uterine fundal pressure on women during vaginal birth in health facilities is widespread. Efforts to prevent this potentially unnecessary and harmful practice are needed

    Effect of high temperature deposition on CoSi 2 phase formation

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    Abstract: This paper discusses the nucleation behaviour of the CoSi to CoSi2 transformation from cobalt silicide thin films grown by deposition at elevated substrate temperatures ranging from 375 °C to 600 °C. A combination of channelling, real-time Rutherford backscattering spectrometry, real-time x-ray diffraction, and transmission electron microscopy was used to investigate the effect of the deposition temperature on the subsequent formation temperature of CoSi2, its growth behaviour, and the epitaxial quality of the CoSi2 thus formed. The temperature at which deposition took place was observed to exert a significant and systematic influence on both the formation temperature of CoSi2 and its growth mechanism. CoSi films grown at the lowest temperatures were found to increase the CoSi2 nucleation temperature above that of CoSi2 grown by conventional solid phase reaction, whereas the higher deposition temperatures reduced the nucleation temperature significantly. In addition, a systematic change in growth mechanism of the subsequent CoSi2 growth occurs as a function of deposition temperature. First, the CoSi2 growth rate from films grown at the lower reactive deposition temperatures is substantially lower than that grown at higher reactive deposition temperatures, even though the onset of growth occurs at a higher temperature, Second, for deposition temperatures below 450 °C, the growth appears columnar, indicating nucleation controlled growth. Elevated deposition temperatures, on the other hand, render the CoSi2 formation process layer-by-layer which indicates enhanced nucleation of the CoSi2 and diffusion controlled growth. Our results further indicate that this observed trend is most likely related to stress and changes in microstructure introduced during reactive deposition of the CoSi film. The deposition temperature therefore provides a handle to tune the CoSi2 growth mechanism

    On the growth kinetics of Ni(Pt) silicide thin films

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    We report on the effect of Pt on the growth kinetics of ÎŽ-Ni2Si and Ni 1−xPtxSi thin films formed by solid phase reaction of a Ni(Pt) alloyed thin film on Si(100). The study was performed by real-time Rutherford backscattering spectrometry examining the silicide growth rates for initial Pt concentrations of 0, 1, 3, 7, and 10 at. % relative to the Ni content. Pt was found to exert a drastic effect on the growth kinetics of both phases. ÎŽ-Ni2Si growth is slowed down tremendously, which results in the simultaneous growth of this phase with Ni 1−xPtxSi. Activation energies extracted for the Ni 1−xPtxSi growth process exhibit an increase from Ea = 1.35 ± 0.06 eV for binary NiSi to Ea = 2.7 ± 0.2 eV for Ni 1−xPtxSi with an initial Pt concentration of 3 at. %. Further increasing the Pt content to 10 at. % merely increases the activation energy for Ni 1−xPtxSi growth to Ea = 3.1 ± 0.5 eV

    Impact of calcium on salivary α-amylase activity, starch paste apparent viscosity and thickness perception

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    Thickness perception of starch-thickened products during eating has been linked to starch viscosity and salivary amylase activity. Calcium is an essential cofactor for α-amylase and there is anecdotal evidence that adding extra calcium affects amylase activity in processes like mashing of beer. The aims of this paper were to (1) investigate the role of salivary calcium on α-amylase activity and (2) to measure the effect of calcium concentration on apparent viscosity and thickness perception when interacting with salivary α-amylase in starch-based samples. α-Amylase activity in saliva samples from 28 people was assessed using a typical starch pasting cycle (up to 95 °C). The activity of the enzyme (as measured by the change in starch apparent viscosity) was maintained by the presence of calcium, probably by protecting the enzyme from heat denaturation. Enhancement of α-amylase activity by calcium at 37 °C was also observed although to a smaller extent. Sensory analysis showed a general trend of decreased thickness perception in the presence of calcium, but the result was only significant for one pair of samples, suggesting a limited impact of calcium enhanced enzyme activity on perceived thickness

    The new Heavy Ion ERDA set up at iThemba LABS Gauteng : multilayer thin film depth profiling using direct calculation and Monte Carlo simulation codes

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    We report here on the recently built Heavy Ion ERDA set up at iThemba LABS Gauteng; describing a typical application in the study of interfacial reactions in an Al2O3–Ti ceramic–metal multilayer structure annealed in vacuum at 800 C for 2 h. Depth profile extraction was found to be best obtained through combined use of direct calculation and Monte Carlo simulation codes as opposed to using just either of the methods. The obtained profile suggests a case of the Kirkendall effect, whereupon the inter-diffusion between the metal and the ceramic was largely due to the faster diffusion of the metal into the amorphous ceramic than diffusion of the ceramic elements into the metallic layer.National Research Foundation (iThemba LABS) and the International Atomic Energy Agency (IAEA).http://www.elsevier.com/locate/nimbhb201
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