Vibrations of the S1 state of fluorobenzene-h5 and fluorobenzene-d5 via resonance-enhanced multiphoton ionization (REMPI) spectroscopy

We report resonance-enhanced multiphoton ionization spectra of the isotopologues fluorobenzeneh5 and fluorobenzene-d5. By making use of quantum chemical calculations, the changes in the wavenumber of the vibrational modes upon deuteration are examined. Additionally, the mixing of vibrational modes both between isotopologues and also between the two electronic states is discussed. The isotopic shifts lead to dramatic changes in the appearance of the spectrum as vibrations shift in and out of Fermi resonance. Assignments of the majority of the fluorobenzene-d5 observed bands are provided, aided by previous results on fluorobenzene-h5

Singly-resonant sum frequency generation of visible light in a semiconductor disk laser

In this paper a generic approach for visible light generation is presented. It is based on sum frequency generation between a semiconductor disk laser and a solid-state laser, where the frequency mixing is achieved within the cavity of the semiconductor disk laser using a singlepass of the solid-state laser light. This exploits the good beam quality and high intra-cavity power present in the semiconductor disk laser to achieve high conversion efficiency. Combining sum frequency mixing and semiconductor disk lasers in this manner allows in principle for generation of any wavelength within the visible spectrum, by appropriate choice of semiconductor material and single-pass laser wavelength

Cruise report DISCOL 3, SONNE cruise 77 : Cruise report DISCOL 3, Sonne cruise 77 : January 26 - February 27, 1992, Balboa/Panama-Balboa/Panama

Förderkennzeichen: 03R417 01F001

Debris-Free, Droplet Laser Plasma Sources In The Euv And Soft X-Ray Ranges

Previous work with a 100-kHz water droplet system generated 13-nm and 116-nm line emissions from a Li-like O2 plasma produced by 10-ns duration, 10-Hz Nd:YAG laser pulses at approximately 1012 W/cm2. A detailed quantitative study of this source was performed with a 100-Hz laser. The radiation efficiency and the long-term operation were characterized, and results show that the droplet laser plasma source comes close to satisfying all the near-term needs of extreme ultraviolet lithography (EUVL). In particular, an overall conversion efficiency of laser light to 13-nm emission within the required spectral bandwidth in excess of 0.6%, comparable to any other existing source at this wavelength

Strained Silicon Photonics

A review of recent progress in the field of strained silicon photonics is presented. The application of strain to waveguide and photonic crystal structures can be used to alter the linear and nonlinear optical properties of these devices. Here, methods for the fabrication of strained devices are summarized and recent examples of linear and nonlinear optical devices are discussed. Furthermore, the relation between strain and the enhancement of the second order nonlinear susceptibility is investigated, which may enable the construction of optically active photonic devices made of silicon