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    Overview of the JET results in support to ITER

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    EVOLUTION OF PROFILES OF IMPLANTED NITROGEN IN METAL BILAYERS

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    Samples consisting of bilayers of Ni or Pd on Al or Ti were produced. The top Ni or Pd layers were implanted with N-15(2)+ at fluences up to 1.5 x 10(17) N/cm2 at different temperatures. The concentration depth profiles of N-15 were determined with nuclear reaction analysis (NRA) before and after vacuum annealing. Transient diffusion of N atoms in Ni and Ti was observed during implantation at temperatures > 25-degrees-C. Under suitable conditions some of the N atoms penetrate the intermetallic interface and become trapped in the Ti or Al layer. In this way N can be introduced into these metals to concentrations far exceeding the solid solubilities, without introducing radiation damage. A model is proposed to explain the observed phenomena
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