Ion source development for the proposed FNAL 750-keV injector upgrade

Currently there is a Proposed FNAL 750keV Injector Upgrade for the replacement of the 40 year old Fermi National Laboratory (FNAL) Cockcroft-Walton accelerators with a new ion source and 200MHz Radio Frequency Quadruple (RFQ). The slit type magnetron being used now will be replaced with a round aperture magnetron similar to the one used at Brookhaven National Lab (BNL). Operational experience from BNL has shown that this type of source is more reliable with a longer lifetime due to better power efficiency. The current source development effort is to produce a reliable source with >60mA of H- beam current, 15Hz rep-rate, 100s pulse width, and a duty factor of 0.15%. The source will be based on the BNL design along with development done at FNAL for the High Intensity Neutrino Source (HINS).Comment: 8 pp. 2nd International Symposium on Negative Ions, Beams and Sources: NIBS2010, 16-19 Nov 2010. Takayama, Japa

Dry etching of metallization

The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in which samples are directly exposed to an electrical discharge, and ion beam processes in which samples are etched by a beam of ions extracted from a discharge. The plasma etch processes can be distinguished by the degree to which ion bombardment contributes to the etch process. This, in turn is related to capability for anisotropic etching. Reactive Ion Etching (RIE) and Ion Beam Etching are of most interest for etching of thin film metals. RIE is generally considered the best process for large volume, anisotropic aluminum etching

Performance Characterization of a Solenoid-type Gas Valve for the H−H^{-} Magnetron Source at FNAL

The magnetron-style $H^{-}$ ion sources currently in operation at Fermilab use piezoelectric gas valves to function. This kind of gas valve is sensitive to small changes in ambient temperature, which affect the stability and performance of the ion source. This motivates the need to find an alternative way of feeding H2 gas into the source. A solenoid-type gas valve has been characterized in a dedicated off-line test stand to assess the feasibility of its use in the operational ion sources. $H^{-}$ ion beams have been extracted at 35 keV using this valve. In this study, the performance of the solenoid gas valve has been characterized measuring the beam current output of the magnetron source with respect to the voltage and pulse width of the signal applied to the gas valve.Comment: 4 pp. arXiv admin note: text overlap with arXiv:1701.0175

Implementation of Design Changes Towards a More Reliable, Hands-off Magnetron Ion Source

As the main $H^{-}$ ion source for the accelerator complex, magnetron ion sources have been used at Fermilab since the 1970s. At the offline test stand, new R&D is carried out to develop and upgrade the present magnetron-type sources of $H^{-}$ ions of up to 80 mA and 35 keV beam energy in the context of the Proton Improvement Plan. The aim of this plan is to provide high-power proton beams for the experiments at FNAL. In order to reduce the amount of tuning and monitoring of these ion sources, a new electronic system consisting of a current-regulated arc discharge modulator allow the ion source to run at a constant arc current for improved beam output and operation. A solenoid-type gas valve feeds $H_{2}$ gas into the source precisely and independently of ambient temperature. This summary will cover several studies and design changes that have been tested and will eventually be implemented on the operational magnetron sources at Fermilab. Innovative results for this type of ion source include cathode geometries, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction, with the aim to improve source lifetime, stability, and reducing the amount of tuning needed. In this summary, I will highlight the advances made in ion sources at Fermilab and will outline the directions of the continuing R&D effort.Comment: 4 pp. arXiv admin note: substantial text overlap with arXiv:1701.0175

Improvements on the Stability and Operation of a Magnetron H- Ion Source

The magnetron H- ion sources developed in the 1970s currently in operation at Fermilab provide beam to the rest of the accelerator complex. A series of modifications to these sources have been tested in a dedicated offline test stand with the aim of improving different operational issues. The solenoid type gas valve was tested as an alternative to the piezoelectric gas valve in order to avoid its temperature dependence. A new cesium oven was designed and tested in order to avoid glass pieces that were present with the previous oven, improve thermal insulation and fine tune its temperature. A current-regulated arc modulator was developed to run the ion source at a constant arc current, providing very stable beam outputs during operations. In order to reduce beam noise, the addition of small amounts of N2 gas was explored, as well as testing different cathode shapes with increasing plasma volume. This paper summarizes the studies and modifications done in the source over the last three years with the aim of improving its stability, reliability and overall performance.Comment: 8 pages, 19 figure

Overview of Recent Studies and Design Changes for the FNAL Magnetron Ion Source

This paper will cover several studies and design changes that will eventually be implemented to the Fermi National Accelerator Laboratory (FNAL) magnetron ion source. The topics include tungsten cathode insert, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction. The studies were performed on the FNAL test stand, with the aim to improve source lifetime, stability, and reducing the amount of tuning needed.Comment: 8 p

Frequency and time standards based on stored ions

The method of ion storage provides a basis for excellent time and frequency standards. This is due to the ability to confine ions for long periods of time without the usual perturbations associated with confinement (e.g., wall shifts). In addition, Doppler effects can be greatly suppressed. The use of stored ions for microwave frequency standards and the future possibilities for an optical frequency standard based on stored ions are addressed