Processing large raster and vector data in apache spark

Spatial data processing frameworks in many cases are limited to vector data only. However, an important type of spatial data is raster data which is produced by sensors on satellites but also by high resolution cameras taking pictures of nano structures, such as chips on wafers. Often the raster data sets become large and need to be processed in parallel on a cluster environment. In this paper we demonstrate our STARK framework with its support for raster data and functionality to combine raster and vector data in filter and join operations. To save engineers from the burden of learning a programming language, queries can be formulated in SQL in a web interface. In the demonstration, users can use this web interface to inspect examples of raster data using our extended SQL queries on a Apache Spark cluster

Metrologische Nanopositionierung kombiniert mit Zwei-Photonen-Laserdirektschreiben

The extension of nanopositioning and nanomeasuring machines (NPM-machines) to fabrication machines by using a femtosecond laser for the implementation of direct laser writing by means of two-photon absorption (2PA) is a promising approach for cross-scale metrological fabrication in the field of lithographic techniques [24]. To this end, a concept for integrating two-photon technology into an NPM machine was developed and implemented, followed by a characterization of the system and targeted investigations to provide evidence for the synergy of the two techniques. On this basis, a new approach to high-throughput micro- and nano-fabrication was developed and investigated, demonstrating new possibilities in cross-scale, high-precision manufacturing [6]. This mixand-match approach is based on a combination of 2PA laser writing with field emission lithography to fabricate masters for subsequent nanoimprint lithography. Not only the advantages of the large positioning range of the NMM-1 could be highlighted, but also the advantages resulting from the highly accurate positioning. A systematic reduction of the distance between two adjacent lines resulted in a minimum photoresist width of less than 30 nm [16], which can be classified among the smallest distances between two laser-written lines described in the literature [4, 10, 20]. The center-to-center distance of the lines of about 1.695 μm at a numerical aperture of 0.16 and a wavelength of 801 nm is only about 56 % of the Rayleigh diffraction limit extended for the two-photon process. Thus, for the first time, a resist width far below the diffraction limit could be realized with conventional two-photon laser writing in positive photoresist.507514897-