17 research outputs found

    A neural computation to study the scaling capability of the undoped DG MOSFET

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    The DG MOSFET is one of the most promising candidates for further CMOS scaling beyond the year of 2010. It will be scaled down to various degrees upon a wide range of system/circuit requirements (such as high-performance, low standby power and low operating power). The key electrical parameter of the DG MOSFET is the subthreshold swing (S). In this paper, we present the applicability of the artificial neural network for the study of the scaling capability of the undoped DG MOSFET. The latter is based on the development of a semi-analytical model of the subthreshold swing (S) using the Finite Elements Method (FEM). Our results are discussed in order to draw some useful information about the ULSI technology

    Contribution a l'etude de l'oxydation dynamique de refractaires. Application au graphite

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    SIGLEINIST T 71649 / INIST-CNRS - Institut de l'Information Scientifique et TechniqueFRFranc

    DISPOSITIF PLASMA POUR L'OXYDATION DYNAMIQUE DE RÉFRACTAIRES. APPLICATION AU GRAPHITE

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    On décrit un dispositif pour l'étude de l'oxydation dynamique de réfractaires. Il associe une torche à plasma soufflé d'argon et un réacteur à haute température. On présente des résultats concernant l'étude de l'oxydation dynamique du graphite dans un domaine allant de 1500 à 2200K pour les températures de l'échantillon, de 1600 à 3800K et 60 à 120 m/s pour les températures et vitesse du gaz avec des concentrations d'oxygène de 1 à 10% en volume.An experimental set up is described for the study of the dynamic oxidation of refractories compounds. It associates an Argon plasma torch and a high temperature reactor. Results concerning dynamic oxidation of graphite are given for conditions ranging from 1500 to 2200K for samples temperature, 1600 to 3800K and 60 to 120 m/s for temperature and velocity of the gaz stream with an oxygen concentration of 1 to 10% volume

    Tunable band-selective photodetector based on sputter-deposited SnOx thin-films: Effect of reactive gas pulsing process

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    International audienceIn this work, high-performance SnOx band-selective photodetectors(PDs) were realized by DC magnetron sputtering technique. Thereactive gas pulsing process (RGPP) was implemented with pulsingperiod fixed at P = 20 s to adjust tin and oxygen concentrations inthe film. The impact of pulsed oxygen time on the structural,morphological and photosensing properties of SnOx-based PDs wasinvestigated. The fabricated SnOx-based PD at a high duty cycle of80% of P demonstrated high UV photodetection capabilities andsolar-blind characteristic with a high responsivity of 21.8 mA/W, ahigh signal to noise ratio of 6×104 and a specific detectivity ofabout 5×1011 Jones. It was also revealed that the use of a shortoxygen pulsing time 8 s paves the way for the realization ofmultispectral SnOx PD, demonstrating a high responsivity values of36.45 mA/W, 36.4 mA/W and 34 mA/W over UV, Visible and NIR bands,respectively. This is attributed to the role of using RGPP inmodulating the film optoelectronic properties from metallic toinsulator when the duty cycle and thus oxygen concentration in thefilms changed from pure tin to overstoichiometric SnO2 compound.The prepared SnOx PDs demonstrated many advantageous features likelow-noise, cost effective and high sensitivity. The obtainedresults proved that SnOx can be used as an alternative material fordeveloping high-performance band-selective sensing devices

    Highly sensitive, ultra-low dark current, self-powered solar-blind ultraviolet photodetector based on ZnO thin-film with an engineered rear metallic layer

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    International audienceIn this paper, novel self-powered, solar-blind UV photodetector (PD) designs based on a ZnO thin-film with engineered back metal layer (BML) were fabricated by RF magnetron sputtering and e-beam evaporation techniques. An exhaustive study concerning the impact of dissimilar BML (Au and Ni) on the device structural, optical and electrical properties was carried out. The measured I–V curves illustrated an asymmetrical behavior, enabling a clear and distinctive photovoltaic mode. Superb sensitivity of 107, high ION/IOFF ratio of 149dB, ultralow dark-noise current less than 11pA and responsivity exceeding 0.27A/W were reached for the prepared ZnO-based UV-PDs in self-powered mode. The role of the engineered BML in promoting effective separation and transfer of the photo-induced carriers was discussed using the band-diagram theory. The influence of the annealing process on the UV-sensor performance was also investigated. The annealed device at 500°C demonstrated a lower dark current of a few picoamperes and a high rejection ratio of 2.2:103, emphasizing its exciting visible blindness characteristics. Therefore, the use of an engineered BML with optimized annealing conditions open up new perspectives to realizing high-performance, self-powered solar-blind UV-PDs based on simple thin film-ZnO structure strongly desirable for various optoelectronic applications

    An original way to obtain porous Zn(1–x)MgxO thin films by spray pyrolysis technique

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    Zn(1–x)MgxO thin films with various concentrations of magnesium were deposited using the spray pyrolysis method. The transmittance spectra recorded for all films exhibit maxima exceeding 90%. The band gap energy of the films with wurtzite structure increases from 3.22 up to 3.60 eV by incorporating Mg into ZnO. However, when the atomic ratio of Mg exceeded 0.4, a second crystalline phase (assigned to cubic MgO) became discernable in XRD patterns, a compressive strain was observed in the wurtzite lattice, and crystallite sizes decreased significantly. In accordance with these observations, finer grains with a pronounced columnar growth were observed in 3D AFM representations and the surface roughness decreases significantly. Finally, selective etching in water yields to porous films with a great surface-to-volume ratio, a lower refractive index and a better light transmission. These porous films with tunable band gap seem to be excellent candidates to various interesting applications

    Modeling of magnetic properties (Cr/NiO/Ni) based multi-layers deposited by magnetron sputtering using Preisach model

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    International audienceIn the present work, thin films of Cr/NiO/Ni are deposited on glass substrates using RF magnetron sputtering technique. The uniformity and homogeneity of the prepared films were controlled by varying the power of the source, the target-substrate distance and the pressure of the plasma gas which is argon. In order to test the Preisach Model, we carried out measurements according to two directions: parallel and perpendicular to the substrate plane using a Vibrating Sample Magnetometer at room temperature. Good agreement has been obtained by comparing the experimental hysteresis loops to the ones determined using Preisach model. We conclude that this model is powerful in predicting the magnetic properties of multilayer systems

    Microstructured ZnO-ZnS composite for earth-abundant photovoltaics: Elaboration, surface analysis and enhanced optical performances

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    International audienceIn this paper, ZnO-ZnS composite structure is proposed as a new efficient and earth-abundant absorber material for thin-film solar cells (TFSCs). Promising elaboration strategy based on combining vacuum thermal evaporation technique and oxidation process under an annealing temperature of 500°C was used to prepare ZnO-ZnS composite with high sun-light absorption capabilities. The fabricated microstructure was then characterized by Scanning Electron Microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and UV–Visible absorption spectroscopy. The influence of the annealing time on the structural and optical performances of the prepared samples was investigated. Surface analysis demonstrated the ZnO decoration of ZnS thin-film, where SEM images showed dense and pinhole-free ZnO-ZnS composite with micrometer-sized grains and a few voids visible at thin-films surface. Optical characterization showed that the prepared thin-film absorber exhibits an optical band-gap of 2.65 eV with a high Total Absorption Efficiency (TAE) of 62% and an absorption coefficient exceeding 2 × 104 cm−1. In addition, I-V characteristics under dark and 1-sun illumination of the microstructured ZnO-ZnS composite were extracted. It was revealed that the proposed absorber showcases a high visible photoresponse. Therefore, promoting effective light-scattering effects, this innovative ZnO-ZnS composite offers a sound pathway to prepare alternative low-cost absorbers for the future development of TFSCs
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