6 research outputs found

    Coaxial Ion Source : pressure dependence of gas flow and field ion emission

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    We investigated the pressure dependence of gas flow and field ion intensity of a coaxial ion source operating at room temperature over a wide pressure range, testing various gases and ionisation voltages. Flow conductance measurements taking into account the different gases' viscosity and molecular mass consistently exhibit a generic pattern. Three different flow regimes appear with increasing upstream pressure. Since the coaxial ion source supplies the gas locally, very near the apex of the tip where ionisation occurs, large ionisation currents can be obtained without degrading the propagation conditions of the beam. Compared with field ionisation in a partial pressure chamber, using the coaxial ion source increases the ion current a hundredfold for the same residual low pressure. We also show that the gas flow regime does not impact ionisation yield. Although a fuller characterisation remains to be performed, brightness reaches 3 x 10 11 A/m 2 /sr at 12kV extracting voltage. a) https://www.cinam.univ-mrs.fr

    Faisceau d'ions focalisé à partir de source à structure coaxiale

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    The coaxial ion source (CIS) is a GFIS (Gas Field Ion Source) whose physical principle is based on field ionisation. It can operate at room temperature. The aim of my thesis is to characterise and optimise it so that it can be integrated into a focused ion beam.A flow of gas is injected through the coaxial ion source, to be ionised at the tip. During the three years of my thesis, I was able to characterise the flow regimes of the coaxial ion source, as well as the ionisation intensity of the source in all the desired pressure and voltage ranges. A layer of palladium was deposited to increase the lifetime of the tips. An estimate of the brightness was made. The results are so promising for a FIB application that the source will soon be evaluated under these conditions.In addition to the studies carried out on the yield ionisation induced by the geometry of the coaxial structure, a study on the yield ionisation induced by the shape of the tips was made possible by the effects of water corrosion under an intense electric field.These results are presented using a document structure that includes an introduction to the subject on the history of field ionisation sources, a chapter on "Materials and methods", a chapter on "Experimental results and interpretations" followed by a chapter on "Introduction to an FIB", and a general conclusion.La source d’ions à structure coaxiale (CIS) est une source de type GFIS (Gas Field Ion Source) dont le principe physique repose sur l’ionisation de champ. Elle peut fonctionner à température ambiante. L’objectif de ma thèse est de la caractériser et l’optimiser pour pouvoir l’intégrer dans un faisceau d’ions focalisés.Un flux de gaz est injecté à travers la structure coaxiale, pour être ionisé en bout de pointe. Durant ces trois années de thèse j’ai pu caractériser les régimes d’écoulements de la structure coaxiale, ainsi que l’intensité d’ionisation de la source dans toutes les gammes de pression et de tension souhaitées. Une couche de palladium a été déposée pour augmenter la durée de vie des pointes. Une estimation de la brillance a été effectuée. Les résultats sont si prometteurs pour une application FIB que la source sera bientôt évaluée dans ces conditions.Au-delà des études effectuées sur l’efficacité d’ionisation induite par la géométrie de la structure coaxiale, une étude sur l’efficacité d’ionisation induite par la forme des pointes a été permise par des effets de corrosion du tungstène par l’eau sous champ électrique intense.Ces résultats sont présentés à travers une structure de document comprenant une introduction au sujet portant sur l’histoire des sources à ionisation de champ, entre autres ; un chapitre « Matériel et méthodes », un chapitre « résultats expérimentaux et interprétations » suivi d’un chapitre « Introduction dans un FIB » pour finir sur une conclusion générale

    Faisceau d'ions focalisé à partir de source à structure coaxiale

    No full text
    The coaxial ion source (CIS) is a GFIS (Gas Field Ion Source) whose physical principle is based on field ionisation. It can operate at room temperature. The aim of my thesis is to characterise and optimise it so that it can be integrated into a focused ion beam.A flow of gas is injected through the coaxial ion source, to be ionised at the tip. During the three years of my thesis, I was able to characterise the flow regimes of the coaxial ion source, as well as the ionisation intensity of the source in all the desired pressure and voltage ranges. A layer of palladium was deposited to increase the lifetime of the tips. An estimate of the brightness was made. The results are so promising for a FIB application that the source will soon be evaluated under these conditions.In addition to the studies carried out on the yield ionisation induced by the geometry of the coaxial structure, a study on the yield ionisation induced by the shape of the tips was made possible by the effects of water corrosion under an intense electric field.These results are presented using a document structure that includes an introduction to the subject on the history of field ionisation sources, a chapter on "Materials and methods", a chapter on "Experimental results and interpretations" followed by a chapter on "Introduction to an FIB", and a general conclusion.La source d’ions à structure coaxiale (CIS) est une source de type GFIS (Gas Field Ion Source) dont le principe physique repose sur l’ionisation de champ. Elle peut fonctionner à température ambiante. L’objectif de ma thèse est de la caractériser et l’optimiser pour pouvoir l’intégrer dans un faisceau d’ions focalisés.Un flux de gaz est injecté à travers la structure coaxiale, pour être ionisé en bout de pointe. Durant ces trois années de thèse j’ai pu caractériser les régimes d’écoulements de la structure coaxiale, ainsi que l’intensité d’ionisation de la source dans toutes les gammes de pression et de tension souhaitées. Une couche de palladium a été déposée pour augmenter la durée de vie des pointes. Une estimation de la brillance a été effectuée. Les résultats sont si prometteurs pour une application FIB que la source sera bientôt évaluée dans ces conditions.Au-delà des études effectuées sur l’efficacité d’ionisation induite par la géométrie de la structure coaxiale, une étude sur l’efficacité d’ionisation induite par la forme des pointes a été permise par des effets de corrosion du tungstène par l’eau sous champ électrique intense.Ces résultats sont présentés à travers une structure de document comprenant une introduction au sujet portant sur l’histoire des sources à ionisation de champ, entre autres ; un chapitre « Matériel et méthodes », un chapitre « résultats expérimentaux et interprétations » suivi d’un chapitre « Introduction dans un FIB » pour finir sur une conclusion générale

    Bright sources under the projection microscope: using an insulating crystal on a conductor as electron source

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    International audienceThe development of bright sources is allowing technological breakthroughs, especially in the field of microscopy. This requires a very advanced control and understanding of the emission mechanisms. For bright electron sources, a projection microscope with a field emission tip provides an interference image that corresponds to a holographic recording. Image reconstruction can be performed digitally to form a “real” image of the object. However, interference images can only be obtained with a bright source that is small: often, an ultra-thin tip of tungsten whose radius of curvature is of the order of 10nm. The contrast and ultimate resolution of this image-projecting microscope depend only on the size of the apparent source. Thus, a projection microscope can be used to characterize source brightness: for example, analyzing the interference contrast enables the size of the source to be estimated. Ultra-thin W tips are not the only way to obtain bright sources: field emission can also be achieved by applying voltages leading to a weak macroscopic electric field ( 10 μm). Moreover, analyzing the holograms reveals the source size, and the brightness of these new emitters equals that of traditional field emission sources

    Coaxial Ion Source : pressure dependence of gas flow and field ion emission

    No full text
    We investigated the pressure dependence of gas flow and field ion intensity of a coaxial ion source operating at room temperature over a wide pressure range, testing various gases and ionisation voltages. Flow conductance measurements taking into account the different gases' viscosity and molecular mass consistently exhibit a generic pattern. Three different flow regimes appear with increasing upstream pressure. Since the coaxial ion source supplies the gas locally, very near the apex of the tip where ionisation occurs, large ionisation currents can be obtained without degrading the propagation conditions of the beam. Compared with field ionisation in a partial pressure chamber, using the coaxial ion source increases the ion current a hundredfold for the same residual low pressure. We also show that the gas flow regime does not impact ionisation yield. Although a fuller characterisation remains to be performed, brightness reaches 3 Ă— 10 11 A/m 2 /sr at 12kV extracting voltage. a) https://www.cinam.univ-mrs.fr

    Coaxial Ion Source : pressure dependence of gas flow and field ion emission

    No full text
    We investigated the pressure dependence of gas flow and field ion intensity of a coaxial ion source operating at room temperature over a wide pressure range, testing various gases and ionisation voltages. Flow conductance measurements taking into account the different gases' viscosity and molecular mass consistently exhibit a generic pattern. Three different flow regimes appear with increasing upstream pressure. Since the coaxial ion source supplies the gas locally, very near the apex of the tip where ionisation occurs, large ionisation currents can be obtained without degrading the propagation conditions of the beam. Compared with field ionisation in a partial pressure chamber, using the coaxial ion source increases the ion current a hundredfold for the same residual low pressure. We also show that the gas flow regime does not impact ionisation yield. Although a fuller characterisation remains to be performed, brightness reaches 3 Ă— 10 11 A/m 2 /sr at 12kV extracting voltage. a) https://www.cinam.univ-mrs.fr
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