The contact heat conductance at diamond-OFHC copper interface with GaIn eutectic as a heat transfer medium

Results of an experimental study of the contact heat conductance across a single diamond crystal interface with OFHC copper (Cu) are reported. Gallium-indium (GaIn) eutectic was used as an interstitial material. Contact conductance data are important in the design and the prediction of the performance of x-ray diamond monochromators under high-heat-load conditions. Two sets of experiments were carried out. In one, the copper surface in contact with diamond was polished and then electroless plated with 1 {mu}m of nickel, while in the other, the copper contact surface was left as machined. Measured average interface heat conductances are 44.7 {plus_minus}8 W/cm{sup 2}{minus}K for nonplated copper and 23.0 {plus_minus}3 W/cm{sup 2}{minus}K for nickel-plated copper. For reference, the thermal contact conductances at a copper-copper interface (without diamond) were also measured, and the results are reported. A typical diamond monochromator, 0.2 mm thick, will absorb about 44 W under a standard undulator beam at the Advanced Photon Source. The measured conductance for nickel-plated copper suggests that the temperature drop across the interface of diamond and nickel-plated copper, with a 20 mm{sup 2} contact area, will be about 10{degree}C. Therefore temperature rises are rather modest, and the accuracy of the measured contact conductances presented here are sufficient for design purposes

3-D surface profile measurements of large x-ray synchrotron radiation mirrors using stitching interferometry.

Stitching interferometry, using small-aperture, high-resolution, phase-measuring interferometry, has been proposed for quite some time now as a metrology technique to obtain 3-dimensional profiles of surfaces of oversized optical components and substrates. The aim of this work is to apply this method to the specific case of long grazing-incidence x-ray mirrors, such as those used in beamlines at synchrotron radiation facilities around the world. Both fabrication and characterization of these mirrors would greatly benefit from this technique because it offers the potential for providing measurements with accuracy and resolution better than those obtained using existing noncontact laser profilers, such as the long trace profiler (LTP). Measurement data can be used as feedback for computer-controlled fabrication processes to correct for possible topography errors. The data can also be used for simulating and predicting mirror performance under realistic conditions. A semiautomated stitching system was built and tested at the X-ray Optics Metrology Laboratory of the Advanced Photon Source at Argonne National Laboratory. The initial objective was to achieve a measurement sensitivity on the order of 1 {micro}rad rms. Preliminary tests on a 1 m-long x-ray mirror showed system repeatability of less than 0.6 {micro}rad rms. This value is comparable to that of a conventional LTP. The measurement accuracy was mostly affected by environmental perturbations and system calibration effects. With a fully automated and improved system (to be built in the near future), we expect to achieve measurement sensitivity on the order of 0.0 {micro}rad rms or better. In this paper, after a brief review of basic principles and general technical difficulties and challenges of the stitching technique, a detailed description of the measurement setup is given and preliminary results obtained with it are analyzed and discussed

Performance of cryogenically cooled, high-heat-load silicon crystal monochromators with porous media augmentation

The performance of two Si crystal x-ray monochromators internally cooled with liquid nitrogen was tested on the F2-wiggler beamline at the Cornell High Energy Synchrotron Source (CHESS). Both crystals were (111)-oriented blocks of rectangular cross section having identical dimensions. Seven 6.4-mm-diameter coolant channels were drilled through the crystals along the beam direction. In one of the crystals, porous Cu mesh inserts were bonded into the channels to enhance the heat transfer. The channels of the second crystal were left as drilled. Symmetric, double-crystal rocking curves were recorded simultaneously for both the first and third order reflections at 8 and 24 keV. The power load on the cooled crystal was adjusted by varying the horizontal beam size using slits. The measured Si(333) rocking curve of the unenhanced crystal at 24 keV at low power was 1.9 arcsec FWHM. The theoretical width is 0.63 arcsec. The difference is due to residual fabrication and mounting strain. For a maximum incident power of 601 W and an average power density of about 10 W/MM{sup 2}, the rocking curve was 2.7 arcsec. The rocking curve for the enhanced crystal at low power was 2.4 arcsec. At a maximum incident power of 1803 W and an average power density of about 19 W/mm{sup 2} the rocking curve width was 2.2 arcsec FWHM. The use of porous mesh augmentation is a simple, but very effective, means to improve the performance of cryogenically cooled Si monochromators exposed to high power x-ray beams

A finite element analysis of room temperature silicon crystals for the advanced photon source bending-magnet and insertion-device beams

In this paper, we give the results of a series of thermal and distortion finite element analyses performed on room temperature silicon for the three standard APS sources, namely, the bending magnet, Wiggler A, and Undulator A. The modeling was performed with the silicon cooled directly with water or liquid gallium through rectangular channels

Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

An ongoing collaboration among four US Department of Energy (DOE) National Laboratories has demonstrated key technology prototypes and software modeling tools required for new high-coherent flux beamline optical systems. New free electron laser (FEL) and diffraction-limited storage ring (DLSR) light sources demand wavefront preservation from source to sample to achieve and maintain optimal performance. Fine wavefront control was achieved using a novel, roomtemperature cooled mirror system called REAL (resistive element adjustable length) that combines cooling with applied, spatially variable auxiliary heating. Single-grating shearing interferometry (also called Talbot interferometry) and Hartmann wavefront sensors were developed and used for optical characterization and alignment on several beamlines, across a range of photon energies. Demonstrations of non-invasive hard x-ray wavefront sensing were performed using a thin diamond single-crystal as a beamsplitter

Hard x ray spectroscopy and imaging by a reflection zone plate in the presence of astigmatism

The feasibility of an off axis x ray reflection zone plate to perform wavelength dispersive spectroscopy, on axis point focusing, and two dimensional imaging is demonstrated by means of one and the same diffractive optical element DOE at a synchrotron radiation facility. The resolving power varies between 30 and 400 in the range of 7.6 keV to 9.0 keV, with its maximum at the design energy of 8.3 keV. This result is verified using an adjustable entrance slit, by which horizontal H and vertical V focusing to 0.85 amp; 956;m H and 1.29 amp; 956;m V is obtained near the sagittal focal plane of the astigmatic configuration. An angular and axial scan proves an accessible field of view of at least 0.6 arcmin 0.8 arcmin and a focal depth of plus minus 0.86 mm. Supported by the grating efficiency of around 17.5 and a very short pulse elongation, future precision x ray fluorescence and absorption studies of transition metals at their K edge on an ultrashort timescale could benefit from our finding

Performance of cryogenically cooled, high‐heat‐load silicon crystal monochromators with porous media augmentation

The performance of two Si crystal x-ray monochromators internally cooled with liquid nitrogen was tested on the F2-wiggler beamline at the Cornell High Energy Synchrotron Source (CHESS). Both crystals were (111)-oriented blocks of rectangular cross section having identical dimensions. Seven 6.4-mm-diameter coolant channels were drilled through the crystals along the beam direction. In one of the crystals, porous Cu mesh inserts were bonded into the channels to enhance the heat transfer. The channels of the second crystal were left as drilled. Symmetric, double-crystal rocking curves were recorded simultaneously for both the first and third order reflections at 8 and 24 keV. The power load on the cooled crystal was adjusted by varying the horizontal beam size using slits. The measured Si(333) rocking curve of the unenhanced crystal at 24 keV at low power was 1.9 arcsec FWHM. The theoretical width is 0.63 arcsec. The difference is due to residual fabrication and mounting strain. For a maximum incident power of 601 W and an average power density of about 10 W/MM{sup 2}, the rocking curve was 2.7 arcsec. The rocking curve for the enhanced crystal at low power was 2.4 arcsec. At a maximum incident power of 1803 W and an average power density of about 19 W/mm{sup 2} the rocking curve width was 2.2 arcsec FWHM. The use of porous mesh augmentation is a simple, but very effective, means to improve the performance of cryogenically cooled Si monochromators exposed to high power x-ray beams

Liquid‐metal‐cooled curved‐crystal monochromator for Advanced Photon Source bending‐magnet beamline 1‐BM

The authors describe a horizontally focusing curved-crystal monochromator that invokes a 4-point bending scheme and a liquid-metal cooling bath. The device has been designed for dispersive diffraction and spectroscopy in the 5--20 keV range, with a predicted focal spot size of {le} 100 {micro}m. To minimize thermal distortions and thermal equilibration time, the 355 x 32 x 0.8 mm crystal will be nearly half submerged in a bath of Ga-In-Sn-Zn alloy. The liquid metal thermally couples the crystal to the water-cooled Cu frame, while permitting the required crystal bending. Calculated thermal profiles and anticipated focusing properties are discussed

Contact-cooled U-monochromators for high heat load x-ray beamlines

This paper describes the design, expected performance, and preliminary test results of a contact-cooled monochromator for use on high heat load x-ray beamlines. The monochromator has a cross section in the shape of the letter U. This monochromator should be suitable for handing heat fluxes up to 5 W/square millimeter. As such, for the present application, it is compatible with the best internally cooled crystal monochromators. There are three key features in the design of this monochromator. First, it is contact cooled, thereby eliminating fabrication of cooling channels, bonding, and undesirable strains in the monochromator due to coolant-manifold-to-crystal-interface. Second, by illuminating the entire length of the crystal and extracting the central part of the reflected beam, sharp slope changes in the beam profile and thus slope errors are avoided. Last, by appropriate cooling of the crystal, tangential slope error can be substantially reduced