87 research outputs found
Resistivity due to low-symmetrical defects in metals
The impurity resistivity, also known as the residual resistivity, is
calculated ab initio using multiple-scattering theory. The mean-free path is
calculated by solving the Boltzmann equation iteratively. The resistivity due
to low-symmetrical defects, such as an impurity-vacancy pair, is calculated for
the FCC host metals Al and Ag and the BCC transition metal V. Commonly, 1/f
noise is attributed to the motion of such defects in a diffusion process.Comment: 24 pages in REVTEX-preprint format, 10 Postscript figures. Phys. Rev.
B, vol. 57 (1998), accepted for publicatio
Implications of TCO Topography on Intermediate Reflector Design for a Si mc Si Tandem Solar Cells Experiments and Rigorous Optical Simulations
Comprehensive Comparison of Various Techniques for the Analysis of Elemental Distributions in Thin Films
The present work shows results on elemental distribution analyses in Cu(In,Ga)Se2 thin films for solar cells performed by use of wavelength-dispersive and energy-dispersive X-ray spectrometry (EDX) in a scanning electron microscope, EDX in a transmission electron microscope, X-ray photoelectron, angle-dependent soft X-ray emission, secondary ion-mass (SIMS), time-of-flight SIMS, sputtered neutral mass, glow-discharge optical emission and glow-discharge mass, Auger electron, and Rutherford backscattering spectrometry, by use of scanning Auger electron microscopy, Raman depth profiling, and Raman mapping, as well as by use of elastic recoil detection analysis, grazing-incidence X-ray and electron backscatter diffraction, and grazing-incidence X-ray fluorescence analysis. The Cu(In,Ga)Se2 thin films used for the present comparison were produced during the same identical deposition run and exhibit thicknesses of about 2 μm. The analysis techniques were compared with respect to their spatial and depth resolutions, measuring speeds, availabilities, and detection limit
The Equilibria of Diosgenin–Phosphatidylcholine and Diosgenin–Cholesterol in Monolayers at the Air/Water Interface
Field testing and exploitation of genetically modified cassava with low-amylose or amylose-free starch in Indonesia
The development and testing in the field of genetically modified -so called- orphan crops like cassava in tropical countries is still in its infancy, despite the fact that cassava is not only used for food and feed but is also an important industrial crop. As traditional breeding of cassava is difficult (allodiploid, vegetatively propagated, outbreeding species) it is an ideal crop for improvement through genetic modification. We here report on the results of production and field testing of genetically modified low-amylose transformants of commercial cassava variety Adira4 in Indonesia. Twenty four transformants were produced and selected in the Netherlands based on phenotypic and molecular analyses. Nodal cuttings of these plants were sent to Indonesia where they were grown under biosafety conditions. After two screenhouse tests 15 transformants remained for a field trial. The tuberous root yield of 10 transformants was not significantly different from the control. Starch from transformants in which amylose was very low or absent showed all physical and rheological properties as expected from amylose-free cassava starch. The improved functionality of the starch was shown for an adipate acetate starch which was made into a tomato sauce. This is the first account of a field trial with transgenic cassava which shows that by using genetic modification it is possible to obtain low-amylose cassava plants with commercial potential with good root yield and starch quality
Comprehensive Comparison of Various Techniques for the Analysis of Elemental Distributions in Thin Films
Strongly Reduced Si Surface Recombination by Charge Injection during Etching in Diluted HF HNO3
In this study, we investigated the behaviour of the surface recombination of light induced charge carriers during the etching of Si in alkaline KOH and in acidic etching solutions of HF HNO3 CH3COOH HNA or HF HNO3 H3PO4 HNP at different concentration ratios of HF and HNO3 by means of photoluminescence PL measurements. The surface recombination velocity is strongly reduced during the first stages of etching in HF HNO3 containing solutions pointing to a well passivated interface by the etching process, where a positive surface charge is induced by hole injection from NO related surface species into the Si near surface region back surface field effect . This injected charge leads to a change in band bending by about 150 mV that repulses the light induced charge carriers from the surface and therefore enhances the photoluminescence intensity, since non radiative surface recombination is reduce
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