Kinetics of CxNy formation on electrode surface through electrochemical method

Powded CxNy coatings were deposited from acetonitrile on Ni, Si, and C surfaces at a voltage of 500-2000 V by the electrochemical method. Electrolysis products were analyzed by IR spectroscopy, X-ray phase analysis and electron microscopy. According to FTIR data, at frequencies 1370 and 1530 cm-1, absorption bands characteristic for stretching C-N and C=N oscillations are observed. The obtained results indicate that the deposition process occurs in different manner in each specific case, i.e., the kinetics of the electrode depends on the electrode material (Ni, Si, and C)

Kinetics of CxNy formation on electrode surface using the electrochemical method

Powded CxNy coatings were deposited from acetonitrile on Ni, Si, and C surfaces at a voltage 500-2000 V by the electrochemical method. Electrolysis products were analyzed by IR spectroscopy, X-ray phase analysis and electron microscopy. According to FTIR data, at frequencies 1370 and 1530 cm-1, absorption bands characteristic for stretching C-N and C=N oscillations are observed. The obtained results indicate that the deposition process occurs in a different manner in each specific case, i.e., the kinetics of the electrode depends on the electrode material (Ni, Si, and C)