Inhibition Action and Adsorption Behavior of Environment-Friendly Inhibitor Poly-Aspartate on Copper

采用电化学阻抗和极化曲线法研究了绿色缓蚀剂聚天冬氨酸(PASP)对铜在200mg·L-1的NaCl溶液中的缓蚀性能和吸附行为.结果表明,在20℃时,PASP使用的最佳浓度为15mg·L-1,缓蚀率可达到78.3%,PASP的吸附明显降低了Cl-的侵蚀,属于阳极型缓蚀剂.随着温度的升高,PASP的缓蚀性能下降.在50℃时,PASP的缓蚀率下降至40.4%.PASP的吸附行为服从Langmuir吸附等温式,是自发的、放热的过程,属于化学吸附.The inhibition action and adsorption behavior of an environment-friendly inhibitor poly-aspartate (PASP) on copper in aqueous NaCl (0.02%) solution were investigated by means of electrochemical techniques. The results indicated that the best inhibition efficiency of PASP was 78.3% with the concentration of 15 mg·L-1 at 20 ℃. The adsorption of PASP prevented Cu from being corroded and PASP was an anodic inhibitor. The inhibition efficiency of PASP decreased with the increase in solution temperature, it decreased to 40.4% at 50 ℃. The adsorption behavior of PASP followed Langmuir isotherm, it was spontaneous and exothermic, and belonged to chemical adsorption.国家自然科学基金(20406009);; 上海市教委重点项目(06ZZ67);; 上海市科委科技攻关计划(062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题(200512);; 上海市重点学科(P1304)资助项

Photoelectrochemical Study on the Complex of PASP and Tungstate as Inhibitors of Cupronickel B10′s Corrosion

应用光电化学的方法研究了两种环境友好型缓蚀剂聚冬天氨酸(PASP)和钨酸钠(Na2WO4)的单一配方及其复配对白铜B10在硼砂-硼酸缓冲溶液中的缓蚀作用.研究表明,在光电流循环伏安测试中,单一的PASP与Na2WO4均能够使B10表面Cu2O膜引起的p型光电流响应增大,这说明缓蚀剂增大了Cu2O膜的厚度,使B10的腐蚀速率减小.单一的PASP与Na2WO4的最佳添加浓度分别为3和5mg·L-1,单一的Na2WO4比单一的PASP使p型光电流响应增大趋势更大.若以总浓度为5mg·L-1时对两者进行复配,当PASP与Na2WO4的质量浓度比为1∶1和1∶3时,两者复配比单一使用时的p型电流光响应都更大,B10的腐蚀更小,即缓蚀剂的效果更好.交流阻抗测试结果与光电化学测试相一致.Photoelectrochemical and AC impedance measurements were conducted to study the effects of environment-friendly inhibitors poly-aspartate(PASP), Na2WO4 and their complex on the corrosion of cupronickel B10 in a borax-buffer solution. The photoelectrochemical measurement results indicated that PASP or Na2WO4 increased the p-type photocurrent which came from the Cu2O layer on the B10 surface. It showed that the inhibitors increased the thickness of the Cu2O layer and decreased the corrosion speed. The optimal concentrations of PASP and Na2WO4 was 3 and 5 mg·L-1, respectively. Na2WO4 increased photocurrent more than mono PASP did. Combined use of PASP and Na2WO4 in a total concentration of 5 mg·L-1, when the mass ratio(PASP: Na2WO4) was 1∶1 or 1∶3, increased the photocurrent more than their individual use did. The bigger the photocurrent was, the better the inhibition efficiency was. When the mass ratio (PASP: Na2WO4) was 3∶1, the combined use increased photocurrent less than their individual use did, the inhibition effect decreased. AC impedance measurement results were well agreed to the photo-electrochemical results.国家自然科学基金(20406009);; 上海市教委重点项目(06ZZ67);; 上海市重大科技攻关计划(062312045); 厦门大学固体表面物理化学国家重点实验室开放课题(200512);; 上海市重点学科(P1304)资助项

Photoelectrochemical study of inhibition mechanism of PASP on copper

用光电化学方法研究了绿色水处理药剂聚天冬氨酸对铜的缓蚀作用,铜在硼酸-硼砂缓冲溶液(pH=9.2)中,表面的Cu2O膜显p-型光响应,添加适量缓蚀剂聚天冬氨酸(PASP)后,PASP吸附在铜电极表面成膜促使Cu2O膜增厚,体现在电位在负向扫描过程中Cu2O膜的p-型光电流增大。p-型光电流越大,缓蚀性能越好。当PASP浓度为3mg·L-1时,Cu2O膜的p-型光电流最大,缓蚀性能最好。Cl-的存在会阻止PASP在铜电极表面的吸附,使Cu2O膜暴露而受侵蚀,导致了PASP的缓蚀性能变差。The inhibition mechanism of polyaspartic(PASP)on copper electrode in a borax buffer solution was studied by the photocurrent response method.The copper electrode in a borax buffer solution showed p-type photocurrent response which came from Cu2O layer on its surface.The photocurrent response during cathodic polarization became bigger when inhibitor PASP which could be adsorbed on the Cu electrode and make Cu2O layer thicker was added.The bigger the photocurrent response,the better the inhibition effect.When adding PASP with a concentration of 3 mg·L-1,the photocurrent response was the biggest and inhibition of copper corrosion was the best.Cl- could prevent PASP from being absorbed and make Cu2O layer unprotected,resulting in worse inhibition.国家自然科学基金项目(20406009);; 上海市曙光计划项目(04SG55);; 上海市教委重点项目(06ZZ67);; 上海市科委科技攻关计划项目(062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题项目(200512);; 上海市重点学科项目(P1304)~

Inhibition Action of the Self-Assembled Monolayers of 3-Amino-1,2,4-triazole on Brass

3-氨基-1,2,4-三氮唑(ATA)是一种环境友好型金属处理剂,以其在黄铜表面制备了自组装单分子膜(SAMs),用电化学方法研究ATASAMs对黄铜的缓蚀作用及其吸附行为.结果表明,ATA分子易在黄铜表面形成稳定的ATASAMs,SAMs抑制了黄铜的阳极氧化过程,改变了电极表面的双电层结构,固/液界面双电层电容明显降低,有良好的缓蚀效果.研究结果还表明,ATA的吸附行为符合Langmuir吸附等温式,吸附机理是典型的化学吸附.The anticorrosion and inhibiting mechanism for the self-assembled monolayers (SAMs) of 3-amino-1,2, 4-triazole (ATA) on the surface of brass had been investigated by electrochemical method, as well as its adsorption behavior. The results indicated that ATA was liable to interact with brass forming SAMs on the surface of brass. The SAMs changed the structure of the electric-double layer. The SAMs restrained the process of anodic oxidation and had well anticorrosion effect. It was in good agreement with the results by EIS and polarization curve methods. The results from electrochemical measurements indicated that the corrosion resistance for brass electrode was improved by the ATA SAMs. Adsorption of the ATA SAMs was found to follow the Langmuir′s adsorption isotherm, and the adsorption mechanism was typical chemisorption.国家自然科学基金(20406009、50371053);; 上海市曙光计划(04SG55);; 上海市教委重点项目(06ZZ67);; 上海市科技攻关计划(062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题(200512);; 上海市重点学科建设项目(P1304)资

Photoelectrochemical Study of Influence Factors on Corrosion Resistance of Cupronickel B30 in Simulated Water

用动电位伏安法和光电化学方法对模拟水中白铜B30耐蚀性影响因素进行了研究.白铜B30表面膜显示p-型光响应,光响应来自电极表面的Cu2O层,在模拟水溶液中表面膜的半导体性质会发生转变,由p-型转为n-型;在不同Cl-,SO24?浓度的模拟水溶液中,电位正向扫描时呈现阳极光电流,电位负向扫描时随着Cl-,SO24?离子浓度的增加,光响应由p-型向n-型转变,阳极光电流峰面积与阴极光电流峰面积之比增大,耐蚀性能降低;随着温度的升高,白铜B30的耐蚀性能降低;在pH=7～9之间,其耐蚀性能随着pH的升高而提高,当pH>9时,其耐蚀性能随着pH的升高呈降低趋势.Influence factors on semiconduction properties of oxide films on a cupronickel electrode in the simulated water was studied by cyclic voltammetry and photocurrent response method. The cupronickel electrode showed p-type photoresponse, which came from Cu2O layer on its surface. The photoresponse changed to n-type in the simulated water. The transition from p-type to n-type might be related to the doping of Cl- and SO 42? anions into Cu2O film. It did not show n-type photoresponse when the cupronickel elec- trode was immersed in the simulated water containing some sulfide. It was shown that the degree of corro- sion increased with the concentration of these anions and temperature. In addition, as the pH increased be- tween 7 and 9, the corrosion resistance of B30 was enhanced, while it lowered as the pH was beyond 9.国家自然科学基金(Nos.20406009,50371053);; 上海市曙光计划(No.04SG55);; 上海市教委重点项目(No.06ZZ67);; 上海市科技攻关计划(No.062312045);; 厦门大学固体表面物理化学国家重点实验室开放课题(No.200512);; 上海市重点学科(P1304)建设资助项目

福建鲍产业发展形势分析

鲍,素有\"软黄金\"的美誉。自上世纪90年代开始,福建引入皱纹盘鲍与日本盘鲍的杂交鲍并逐渐扩大养殖规模。笔者归纳了福建省鲍的养殖分布及生产情况,结合鲍的消费结构及产业支撑现状发现鲍产业发展过程中的育苗场规划,养殖管理,种质退化,安全用药等方面存在问题,对此提出推进科学养殖,增强环保意识;加强管理制度建设,实现质量监管;加强种质管理,选育新品种;加强技术体系建设;提升产业融合度等建议

Inhibition action and adsorption behavior of environment-friendly inhibitor poly-aspartate on copper

The inhibition action and adsorption behavior of an environment-friendly inhibitor poly-aspartate (PASP) on copper in aqueous NaCl (0.02%) solution were investigated by means of electrochemical techniques. The results indicated that the best inhibition efficiency of PASP was 78.3% with the concentration of 15 mg center dot L-1 at 20 degrees C. The adsorption of PASP prevented Cu from being corroded and PASP was an anodic inhibitor. The inhibition efficiency of PASP decreased with the increase in solution temperature, it decreased to 40.4% at 50 degrees C. The adsorption behavior of PASP followed Langmuir isotherm, it was spontaneous and exothermic, and belonged to chemical adsorption

Photoelectrochemical study of influence factors on corrosion resistance of cupronickel B30 in simulated water

Influence factors on semiconduction properties of oxide films on a cupronickel electrode in the simulated water was studied by cyclic voltammetry and photocurrent response method. The cupronickel electrode showed p-type photoresponse, which came from CU2O layer on its surface. The photoresponse changed to n-type in the simulated water. The transition from p-type to n-type might be related to the doping of Cl- and SO42- anions into CU2O film. It did not show n-type photoresponse when the cupronickel electrode was immersed in the simulated water containing some sulfide. It was shown that the degree of corrosion increased with the concentration of these anions and temperature. In addition, as the pH increased between 7 and 9, the corrosion resistance of B30 was enhanced, while it lowered as the pH was beyond 9

Photoelectrochemical study on the complex of PASP and tungstate as inhibitors of cupronickel B10's corrosion

Photoelectrochemical and AC impedance measurements were conducted to study the effects of environment-friendly inhibitors poly-aspartate(PASP), Na2WO4 and their complex on the corrosion of cupronickel B10 in a borax-buffer solution. The photoelectrochemical measurement results indicated that PASP or Na2WO4 increased the p-type photocurrent which came from the Cu2O layer on the B10 surface. It showed that the inhibitors increased the thickness of the Cu2O layer and decreased the corrosion speed. The optimal concentrations of PASP and Na2WO4 was 3 and 5 mg.L-1, respectively. Na2WO4 increased photocurrent more than mono PASP did. Combined use of PASP and Na2WO4 in a total concentration of 5 mg.L-1, when the mass ratio(PASP: Na2WO4) was 1:1 or 1:3, increased the photocurrent more than their individual use did. The bigger the photocurrent was, the better the inhibition efficiency was. When the mass ratio (PASP: Na2WO4) was 3:1, the combined use increased photocurrent less than their individual use did, the inhibition effect decreased. AC impedance measurement results were well agreed to the photoelectrochemical results

Inhibition action of the self-assembled monolayers of 3-amino-1,2,4-triazole on brass

The anticorrosion and inhibiting mechanism for the self-assembled monolayers (SAMs) of 3-amino-1,2,4-triazole (ATA) on the surface of brass had been investigated by electrochemical method, as well as its adsorption behavior. The results indicated that ATA was liable to interact with brass forming SAMs on the surface of brass. The SAMs changed the structure of the electric-double layer. The SAMs restrained the process of anodic oxidation and had well anticorrosion effect. It was in good agreement with the results by EIS and polarization curve methods. The results from electrochemical measurements indicated that the corrosion resistance for brass electrode was improved by the ATA SAMs. Adsorption of the ATA SAMs was found to follow the Langmuir's adsorption isotherm, and the adsorption mechanism was typical chemisorption