Layout optimization in ultra deep submicron VLSI design

As fabrication technology keeps advancing, many deep submicron (DSM) effects have become increasingly evident and can no longer be ignored in Very Large Scale Integration (VLSI) design. In this dissertation, we study several deep submicron problems (eg. coupling capacitance, antenna effect and delay variation) and propose optimization techniques to mitigate these DSM effects in the place-and-route stage of VLSI physical design. The place-and-route stage of physical design can be further divided into several steps: (1) Placement, (2) Global routing, (3) Layer assignment, (4) Track assignment, and (5) Detailed routing. Among them, layer/track assignment assigns major trunks of wire segments to specific layers/tracks in order to guide the underlying detailed router. In this dissertation, we have proposed techniques to handle coupling capacitance at the layer/track assignment stage, antenna effect at the layer assignment, and delay variation at the ECO (Engineering Change Order) placement stage, respectively. More specifically, at layer assignment, we have proposed an improved probabilistic model to quickly estimate the amount of coupling capacitance for timing optimization. Antenna effects are also handled at layer assignment through a linear-time tree partitioning algorithm. At the track assignment stage, timing is further optimized using a graph based technique. In addition, we have proposed a novel gate splitting methodology to reduce delay variation in the ECO placement considering spatial correlations. Experimental results on benchmark circuits showed the effectiveness of our approaches

Investigation into yield and reliability enhancement of TSV-based three-dimensional integration circuits

Three dimensional integrated circuits (3D ICs) have been acknowledged as a promising technology to overcome the interconnect delay bottleneck brought by continuous CMOS scaling. Recent research shows that through-silicon-vias (TSVs), which act as vertical links between layers, pose yield and reliability challenges for 3D design. This thesis presents three original contributions.The first contribution presents a grouping-based technique to improve the yield of 3D ICs under manufacturing TSV defects, where regular and redundant TSVs are partitioned into groups. In each group, signals can select good TSVs using rerouting multiplexers avoiding defective TSVs. Grouping ratio (regular to redundant TSVs in one group) has an impact on yield and hardware overhead. Mathematical probabilistic models are presented for yield analysis under the influence of independent and clustering defect distributions. Simulation results using MATLAB show that for a given number of TSVs and TSV failure rate, careful selection of grouping ratio results in achieving 100% yield at minimal hardware cost (number of multiplexers and redundant TSVs) in comparison to a design that does not exploit TSV grouping ratios. The second contribution presents an efficient online fault tolerance technique based on redundant TSVs, to detect TSV manufacturing defects and address thermal-induced reliability issue. The proposed technique accounts for both fault detection and recovery in the presence of three TSV defects: voids, delamination between TSV and landing pad, and TSV short-to-substrate. Simulations using HSPICE and ModelSim are carried out to validate fault detection and recovery. Results show that regular and redundant TSVs can be divided into groups to minimise area overhead without affecting the fault tolerance capability of the technique. Synthesis results using 130-nm design library show that 100% repair capability can be achieved with low area overhead (4% for the best case). The last contribution proposes a technique with joint consideration of temperature mitigation and fault tolerance without introducing additional redundant TSVs. This is achieved by reusing spare TSVs that are frequently deployed for improving yield and reliability in 3D ICs. The proposed technique consists of two steps: TSV determination step, which is for achieving optimal partition between regular and spare TSVs into groups; The second step is TSV placement, where temperature mitigation is targeted while optimizing total wirelength and routing difference. Simulation results show that using the proposed technique, 100% repair capability is achieved across all (five) benchmarks with an average temperature reduction of 75.2? (34.1%) (best case is 99.8? (58.5%)), while increasing wirelength by a small amount

HIGH PERFORMANCE CLOCK DISTRIBUTION FOR HIGH-SPEED VLSI SYSTEMS

Tohoku University堀口 進課

Standard cell optimization and physical design in advanced technology nodes

Integrated circuits (ICs) are at the heart of modern electronics, which rely heavily on the state-of-the-art semiconductor manufacturing technology. The key to pushing forward semiconductor technology is IC feature-size miniaturization. However, this brings ever-increasing design complexities and manufacturing challenges to the $340 billion semiconductor industry. The manufacturing of two-dimensional layout on high-density metal layers depends on complex design-for-manufacturing techniques and sophisticated empirical optimizations, which introduces huge amounts of turnaround time and yield loss in advanced technology nodes. Our study reveals that unidirectional layout design can significantly reduce the manufacturing complexities and improve the yield, which is becoming increasingly adopted in semiconductor industry [61, 89]. The lithography printing of unidirectional layout can be tightly controlled using advanced patterning techniques, such as self-aligned double and quadruple patterning. Despite the manufacturing benefits, unidirectional layout leads to more restrictive solution space and brings significant impacts on the IC design automation ow for routing closure. Notably, unidirectional routing limits the standard cell pin accessibility, which further exacerbates the resource competitions during routing. Moreover, for post-routing optimization, traditional redundant-via insertion has become obsolete under unidirectional routing style, which makes the yield enhancement task extremely challenging. Regardless of complex multiple patterning and design-for-manufacturing approaches, mask optimization through resolution enhancement techniques remains as the key strategy to improve the yield of the semiconductor manufacturing processes. Among them, Sub-Resolution Assist Feature (SRAF) generation is a very important method to improve lithographic process windows. Model-based SRAF generation has been widely used to achieve high accuracy but it is time-consuming and hard to obtain consistent SRAFs. This dissertation proposes novel CAD algorithms and methodologies for standard cell optimization and physical design in advanced technology nodes, which ultimately reduces the design cycle and manufacturing cost of IC design. First, a standard cell pin access optimization engine is proposed to evaluate the pin accessibility of a given standard cell library. We further propose novel pin access planning techniques and concurrent pin access optimizations to efficiently resolve the routing resource competitions, which generates much better routing solutions than state-of-the-art, manufacturing-friendly routers. To systematically improve the manufacturing yield in the post-routing stage, a global optimization engine has been introduced for redundant local-loop insertion considering advanced manufacturing constraints. Finally, we propose the first machine learning-based framework for fast yet consistent SRAF generation with the high quality of results.Electrical and Computer Engineerin

Gaining Insights into Denoising by Inpainting

The filling-in effect of diffusion processes is a powerful tool for various image analysis tasks such as inpainting-based compression and dense optic flow computation. For noisy data, an interesting side effect occurs: The interpolated data have higher confidence, since they average information from many noisy sources. This observation forms the basis of our denoising by inpainting (DbI) framework. It averages multiple inpainting results from different noisy subsets. Our goal is to obtain fundamental insights into key properties of DbI and its connections to existing methods. Like in inpainting-based image compression, we choose homogeneous diffusion as a very simple inpainting operator that performs well for highly optimized data. We propose several strategies to choose the location of the selected pixels. Moreover, to improve the global approximation quality further, we also allow to change the function values of the noisy pixels. In contrast to traditional denoising methods that adapt the operator to the data, our approach adapts the data to the operator. Experimentally we show that replacing homogeneous diffusion inpainting by biharmonic inpainting does not improve the reconstruction quality. This again emphasizes the importance of data adaptivity over operator adaptivity. On the foundational side, we establish deterministic and probabilistic theories with convergence estimates. In the non-adaptive 1-D case, we derive equivalence results between DbI on shifted regular grids and classical homogeneous diffusion filtering via an explicit relation between the density and the diffusion time