Modeling of thermally induced skew variations in clock distribution network

Clock distribution network is sensitive to large thermal gradients on the die as the performance of both clock buffers and interconnects are affected by temperature. A robust clock network design relies on the accurate analysis of clock skew subject to temperature variations. In this work, we address the problem of thermally induced clock skew modeling in nanometer CMOS technologies. The complex thermal behavior of both buffers and interconnects are taken into account. In addition, our characterization of the temperature effect on buffers and interconnects provides valuable insight to designers about the potential impact of thermal variations on clock networks. The use of industrial standard data format in the interface allows our tool to be easily integrated into existing design flow

A software controlled voltage tuning system using multi-purpose ring oscillators

This paper presents a novel software driven voltage tuning method that utilises multi-purpose Ring Oscillators (ROs) to provide process variation and environment sensitive energy reductions. The proposed technique enables voltage tuning based on the observed frequency of the ROs, taken as a representation of the device speed and used to estimate a safe minimum operating voltage at a given core frequency. A conservative linear relationship between RO frequency and silicon speed is used to approximate the critical path of the processor. Using a multi-purpose RO not specifically implemented for critical path characterisation is a unique approach to voltage tuning. The parameters governing the relationship between RO and silicon speed are obtained through the testing of a sample of processors from different wafer regions. These parameters can then be used on all devices of that model. The tuning method and software control framework is demonstrated on a sample of XMOS XS1-U8A-64 embedded microprocessors, yielding a dynamic power saving of up to 25% with no performance reduction and no negative impact on the real-time constraints of the embedded software running on the processor

Cross-Layer Resiliency Modeling and Optimization: A Device to Circuit Approach

The never ending demand for higher performance and lower power consumption pushes the VLSI industry to further scale the technology down. However, further downscaling of technology at nano-scale leads to major challenges. Reduced reliability is one of them, arising from multiple sources e.g. runtime variations, process variation, and transient errors. The objective of this thesis is to tackle unreliability with a cross layer approach from device up to circuit level

Simulation study of scaling design, performance characterization, statistical variability and reliability of decananometer MOSFETs

This thesis describes a comprehensive, simulation based scaling study – including device design, performance characterization, and the impact of statistical variability – on deca-nanometer bulk MOSFETs. After careful calibration of fabrication processes and electrical characteristics for n- and p-MOSFETs with 35 nm physical gate length, 1 nm EOT and stress engineering, the simulated devices closely match the performance of contemporary 45 nm CMOS technologies. Scaling to 25 nm, 18 nm and 13 nm gate length n and p devices follows generalized scaling rules, augmented by physically realistic constraints and the introduction of high-k/metal-gate stacks. The scaled devices attain the performance stipulated by the ITRS. Device a.c. performance is analyzed, at device and circuit level. Extrinsic parasitics become critical to nano-CMOS device performance. The thesis describes device capacitance components, analyzes the CMOS inverter, and obtains new insights into the inverter propagation delay in nano-CMOS. The projection of a.c. performance of scaled devices is obtained. The statistical variability of electrical characteristics, due to intrinsic parameter fluctuation sources, in contemporary and scaled decananometer MOSFETs is systematically investigated for the first time. The statistical variability sources: random discrete dopants, gate line edge roughness and poly-silicon granularity are simulated, in combination, in an ensemble of microscopically different devices. An increasing trend in the standard deviation of the threshold voltage as a function of scaling is observed. The introduction of high-k/metal gates improves electrostatic integrity and slows this trend. Statistical evaluations of variability in Ion and Ioff as a function of scaling are also performed. For the first time, the impact of strain on statistical variability is studied. Gate line edge roughness results in areas of local channel shortening, accompanied by locally increased strain, both effects increasing the local current. Variations are observed in both the drive current, and in the drive current enhancement normally expected from the application of strain. In addition, the effects of shallow trench isolation (STI) on MOSFET performance and on its statistical variability are investigated for the first time. The inverse-narrow-width effect of STI enhances the current density adjacent to it. This leads to a local enhancement of the influence of junction shapes adjacent to the STI. There is also a statistical impact on the threshold voltage due to random STI induced traps at the silicon/oxide interface

Threat Analysis, Countermeaures and Design Strategies for Secure Computation in Nanometer CMOS Regime

Advancements in CMOS technologies have led to an era of Internet Of Things (IOT), where the devices have the ability to communicate with each other apart from their computational power. As more and more sensitive data is processed by embedded devices, the trend towards lightweight and efficient cryptographic primitives has gained significant momentum. Achieving a perfect security in silicon is extremely difficult, as the traditional cryptographic implementations are vulnerable to various active and passive attacks. There is also a threat in the form of hardware Trojans inserted into the supply chain by the untrusted third-party manufacturers for economic incentives. Apart from the threats in various forms, some of the embedded security applications such as random number generators (RNGs) suffer from the impacts of process variations and noise in nanometer CMOS. Despite their disadvantages, the random and unique nature of process variations can be exploited for generating unique identifiers and can be of tremendous use in embedded security. In this dissertation, we explore techniques for precise fault-injection in cryptographic hardware based on voltage/temperature manipulation and hardware Trojan insertion. We demonstrate the effectiveness of these techniques by mounting fault attacks on state-of-the-art ciphers. Physically Unclonable Functions (PUFs) are novel cryptographic primitives for extracting secret keys from complex manufacturing variations in integrated circuits (ICs). We explore the vulnerabilities of some of the popular strong PUF architectures to modeling attacks using Machine Learning (ML) algorithms. The attacks use silicon data from a test chip manufactured in IBM 32nm silicon-on-insulator (SOI) technology. Attack results demonstrate that the majority of strong PUF architectures can be predicted to very high accuracies using limited training data. We also explore the techniques to exploit unreliable data from strong PUF architectures and effectively use them to improve the prediction accuracies of modeling attacks. Motivated by the vulnerabilities of existing PUF architectures, we present a novel modeling attack resistant PUF architecture based on non-linear computing elements. Post-silicon validation results are used to demonstrate the effectiveness of the non-linear PUF architecture against modeling and fault-injection attacks. Apart from the techniques to improve the security of PUF circuits, we also present novel solutions to improve the performance of PUF circuits from the perspectives of IC fabrication and system/protocol design. Finally, we present a statistical benchmark suite to evaluate PUFs in conceptualization phase and also to enable fine-grained security assessments for varying PUF parameters. Data compressibility analyses for validating the statistical benchmark suite are also presented

Design of Variation-Tolerant Circuits for Nanometer CMOS Technology: Circuits and Architecture Co-Design

Aggressive scaling of CMOS technology in sub-90nm nodes has created huge challenges. Variations due to fundamental physical limits, such as random dopants fluctuation (RDF) and line edge roughness (LER) are increasing significantly with technology scaling. In addition, manufacturing tolerances in process technology are not scaling at the same pace as transistor's channel length due to process control limitations (e.g., sub-wavelength lithography). Therefore, within-die process variations worsen with successive technology generations. These variations have a strong impact on the maximum clock frequency and leakage power for any digital circuit, and can also result in functional yield losses in variation-sensitive digital circuits (such as SRAM). Moreover, in nanometer technologies, digital circuits show an increased sensitivity to process variations due to low-voltage operation requirements, which are aggravated by the strong demand for lower power consumption and cost while achieving higher performance and density. It is therefore not surprising that the International Technology Roadmap for Semiconductors (ITRS) lists variability as one of the most challenging obstacles for IC design in nanometer regime. To facilitate variation-tolerant design, we study the impact of random variations on the delay variability of a logic gate and derive simple and scalable statistical models to evaluate delay variations in the presence of within-die variations. This work provides new design insight and highlights the importance of accounting for the effect of input slew on delay variations, especially at lower supply voltages. The derived models are simple, scalable, bias dependent and only require the knowledge of easily measurable parameters. This makes them useful in early design exploration, circuit/architecture optimization as well as technology prediction (especially in low-power and low-voltage operation). The derived models are verified using Monte Carlo SPICE simulations using industrial 90nm technology. Random variations in nanometer technologies are considered one of the largest design considerations. This is especially true for SRAM, due to the large variations in bitcell characteristics. Typically, SRAM bitcells have the smallest device sizes on a chip. Therefore, they show the largest sensitivity to different sources of variations. With the drastic increase in memory densities, lower supply voltages and higher variations, statistical simulation methodologies become imperative to estimate memory yield and optimize performance and power. In this research, we present a methodology for statistical simulation of SRAM read access yield, which is tightly related to SRAM performance and power consumption. The proposed flow accounts for the impact of bitcell read current variation, sense amplifier offset distribution, timing window variation and leakage variation on functional yield. The methodology overcomes the pessimism existing in conventional worst-case design techniques that are used in SRAM design. The proposed statistical yield estimation methodology allows early yield prediction in the design cycle, which can be used to trade off performance and power requirements for SRAM. The methodology is verified using measured silicon yield data from a 1Mb memory fabricated in an industrial 45nm technology. Embedded SRAM dominates modern SoCs and there is a strong demand for SRAM with lower power consumption while achieving high performance and high density. However, in the presence of large process variations, SRAMs are expected to consume larger power to ensure correct read operation and meet yield targets. We propose a new architecture that significantly reduces array switching power for SRAM. The proposed architecture combines built-in self-test (BIST) and digitally controlled delay elements to reduce the wordline pulse width for memories while ensuring correct read operation; hence, reducing switching power. A new statistical simulation flow was developed to evaluate the power savings for the proposed architecture. Monte Carlo simulations using a 1Mb SRAM macro from an industrial 45nm technology was used to examine the power reduction achieved by the system. The proposed architecture can reduce the array switching power significantly and shows large power saving - especially as the chip level memory density increases. For a 48Mb memory density, a 27% reduction in array switching power can be achieved for a read access yield target of 95%. In addition, the proposed system can provide larger power saving as process variations increase, which makes it a very attractive solution for 45nm and below technologies. In addition to its impact on bitcell read current, the increase of local variations in nanometer technologies strongly affect SRAM cell stability. In this research, we propose a novel single supply voltage read assist technique to improve SRAM static noise margin (SNM). The proposed technique allows precharging different parts of the bitlines to VDD and GND and uses charge sharing to precisely control the bitline voltage, which improves the bitcell stability. In addition to improving SNM, the proposed technique also reduces memory access time. Moreover, it only requires one supply voltage, hence, eliminates the need of large area voltage shifters. The proposed technique has been implemented in the design of a 512kb memory fabricated in 45nm technology. Results show improvements in SNM and read operation window which confirms the effectiveness and robustness of this technique