NASA SBIR abstracts of 1990 phase 1 projects

The research objectives of the 280 projects placed under contract in the National Aeronautics and Space Administration (NASA) 1990 Small Business Innovation Research (SBIR) Phase 1 program are described. The basic document consists of edited, non-proprietary abstracts of the winning proposals submitted by small businesses in response to NASA's 1990 SBIR Phase 1 Program Solicitation. The abstracts are presented under the 15 technical topics within which Phase 1 proposals were solicited. Each project was assigned a sequential identifying number from 001 to 280, in order of its appearance in the body of the report. The document also includes Appendixes to provide additional information about the SBIR program and permit cross-reference in the 1990 Phase 1 projects by company name, location by state, principal investigator, NASA field center responsible for management of each project, and NASA contract number

NASA SBIR abstracts of 1991 phase 1 projects

The objectives of 301 projects placed under contract by the Small Business Innovation Research (SBIR) program of the National Aeronautics and Space Administration (NASA) are described. These projects were selected competitively from among proposals submitted to NASA in response to the 1991 SBIR Program Solicitation. The basic document consists of edited, non-proprietary abstracts of the winning proposals submitted by small businesses. The abstracts are presented under the 15 technical topics within which Phase 1 proposals were solicited. Each project was assigned a sequential identifying number from 001 to 301, in order of its appearance in the body of the report. Appendixes to provide additional information about the SBIR program and permit cross-reference of the 1991 Phase 1 projects by company name, location by state, principal investigator, NASA Field Center responsible for management of each project, and NASA contract number are included

Data systems elements technology assessment and system specifications, issue no. 2

The ability to satisfy the objectives of future NASA Office of Applications programs is dependent on technology advances in a number of areas of data systems. The hardware and software technology of end-to-end systems (data processing elements through ground processing, dissemination, and presentation) are examined in terms of state of the art, trends, and projected developments in the 1980 to 1985 timeframe. Capability is considered in terms of elements that are either commercially available or that can be implemented from commercially available components with minimal development

Energy End-Use Technologies for the 21st Century. A Report of the World Energy Council

This report makes clear the opportunities and places technology development firmly centre stage in meeting and overcoming the challenges confronting the energy industry and policy makers. Energy End-Use Technologies for the 21st Century makes it crystal clear that technologies deployed in 20 to 50 years will be the result of policy and funding decisions taken now and that we cannot afford to duck these decisions if we are to meet the World Energy Council’s goals of energy availability, accessibility and acceptability

Measuring Globalization: Better Trade Statistics for Better Policy

Understanding the impacts of globalization requires good data, and national statistical systems were not designed to measure many of the transactions occurring in today’s global economy. The chapters in this volume and its companion volume identify biases and gaps in national statistics, examine the magnitude of the problems they pose, and propose solutions to address significant biases and fill key data gaps.https://research.upjohn.org/up_press/1250/thumbnail.jp

A framework for modelling embodied product energy to support energy efficient manufacturing

This thesis reports on the research undertaken to minimise energy consumption within the production phase of a product lifecycle through modelling, monitoring and improved control of energy use within manufacturing facilities. The principle objective of this research is to develop a framework which integrates energy data at plant and process levels within a manufacturing system so as to establish how much energy is required to manufacture a unit product. The research contributions are divided into four major parts. The first reviews relevant literature in energy trends, related governmental policies, and energy tools and software. The second introduces an Embodied Product Energy framework which categorises energy consumption within a production facility into direct and indirect energy required to manufacture a product. The third describes the design and implementation of a simulation model based on this framework to support manufacturing and design decisions for improved energy efficiency through the use of what-if scenario planning. The final part outlines the utilisation of this energy simulation model to support a Design for Energy Minimisation methodology which incorporates energy considerations within the design process. The applicability of the research concepts have been demonstrated via two case studies. The detailed analysis of energy consumption from a product viewpoint provides greater insight into inefficiencies of processes and associated supporting activities, thereby highlighting opportunities for optimisation of energy consumption via operational or design improvements. Although the research domain for this thesis is limited to the production phase, the flexibility offered by the energy modelling framework and associated simulation tool allow for their employment other product lifecycle phases. In summary, the research has concluded that investment in green sources of power generation alone is insufficient to deal with the rapid rise in energy demand, and has highlighted the paramount importance of energy rationalisation and optimisation within the manufacturing industry

A Unique Opportunity for Michigan's Future: An Investment in Engineering Excellence Rationale and Plan

http://deepblue.lib.umich.edu/bitstream/2027.42/79529/1/1984_A_Unique_Opportunity_for_Michigans_Future_An_Investment_in_Engineering_Excellence_Rationale_and_Plan.pd

Virtual metrology for plasma etch processes.

Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of mathematical models with accessible measurements from an operating process to estimate variables of interest. This thesis addresses the challenge of virtual metrology for plasma processes, with a particular focus on semiconductor plasma etch. Introductory material covering the essentials of plasma physics, plasma etching, plasma measurement techniques, and black-box modelling techniques is rst presented for readers not familiar with these subjects. A comprehensive literature review is then completed to detail the state of the art in modelling and VM research for plasma etch processes. To demonstrate the versatility of VM, a temperature monitoring system utilising a state-space model and Luenberger observer is designed for the variable specic impulse magnetoplasma rocket (VASIMR) engine, a plasma-based space propulsion system. The temperature monitoring system uses optical emission spectroscopy (OES) measurements from the VASIMR engine plasma to correct temperature estimates in the presence of modelling error and inaccurate initial conditions. Temperature estimates within 2% of the real values are achieved using this scheme. An extensive examination of the implementation of a wafer-to-wafer VM scheme to estimate plasma etch rate for an industrial plasma etch process is presented. The VM models estimate etch rate using measurements from the processing tool and a plasma impedance monitor (PIM). A selection of modelling techniques are considered for VM modelling, and Gaussian process regression (GPR) is applied for the rst time for VM of plasma etch rate. Models with global and local scope are compared, and modelling schemes that attempt to cater for the etch process dynamics are proposed. GPR-based windowed models produce the most accurate estimates, achieving mean absolute percentage errors (MAPEs) of approximately 1:15%. The consistency of the results presented suggests that this level of accuracy represents the best accuracy achievable for the plasma etch system at the current frequency of metrology. Finally, a real-time VM and model predictive control (MPC) scheme for control of plasma electron density in an industrial etch chamber is designed and tested. The VM scheme uses PIM measurements to estimate electron density in real time. A predictive functional control (PFC) scheme is implemented to cater for a time delay in the VM system. The controller achieves time constants of less than one second, no overshoot, and excellent disturbance rejection properties. The PFC scheme is further expanded by adapting the internal model in the controller in real time in response to changes in the process operating point

Virtual metrology for plasma etch processes.

Plasma processes can present dicult control challenges due to time-varying dynamics and a lack of relevant and/or regular measurements. Virtual metrology (VM) is the use of mathematical models with accessible measurements from an operating process to estimate variables of interest. This thesis addresses the challenge of virtual metrology for plasma processes, with a particular focus on semiconductor plasma etch. Introductory material covering the essentials of plasma physics, plasma etching, plasma measurement techniques, and black-box modelling techniques is rst presented for readers not familiar with these subjects. A comprehensive literature review is then completed to detail the state of the art in modelling and VM research for plasma etch processes. To demonstrate the versatility of VM, a temperature monitoring system utilising a state-space model and Luenberger observer is designed for the variable specic impulse magnetoplasma rocket (VASIMR) engine, a plasma-based space propulsion system. The temperature monitoring system uses optical emission spectroscopy (OES) measurements from the VASIMR engine plasma to correct temperature estimates in the presence of modelling error and inaccurate initial conditions. Temperature estimates within 2% of the real values are achieved using this scheme. An extensive examination of the implementation of a wafer-to-wafer VM scheme to estimate plasma etch rate for an industrial plasma etch process is presented. The VM models estimate etch rate using measurements from the processing tool and a plasma impedance monitor (PIM). A selection of modelling techniques are considered for VM modelling, and Gaussian process regression (GPR) is applied for the rst time for VM of plasma etch rate. Models with global and local scope are compared, and modelling schemes that attempt to cater for the etch process dynamics are proposed. GPR-based windowed models produce the most accurate estimates, achieving mean absolute percentage errors (MAPEs) of approximately 1:15%. The consistency of the results presented suggests that this level of accuracy represents the best accuracy achievable for the plasma etch system at the current frequency of metrology. Finally, a real-time VM and model predictive control (MPC) scheme for control of plasma electron density in an industrial etch chamber is designed and tested. The VM scheme uses PIM measurements to estimate electron density in real time. A predictive functional control (PFC) scheme is implemented to cater for a time delay in the VM system. The controller achieves time constants of less than one second, no overshoot, and excellent disturbance rejection properties. The PFC scheme is further expanded by adapting the internal model in the controller in real time in response to changes in the process operating point