Design optimization for the measurement accuracy improvement of a large range nanopositioning stage

Both an accurate machine design and an adequate metrology loop definition are critical factors when precision positioning represents a key issue for the final system performance. This article discusses the error budget methodology as an advantageous technique to improve the measurement accuracy of a 2D-long range stage during its design phase. The nanopositioning platform NanoPla is here presented. Its specifications, e.g., XY-travel range of 50 mm ˆ 50 mm and sub-micrometric accuracy; and some novel designed solutions, e.g., a three-layer and two-stage architecture are described. Once defined the prototype, an error analysis is performed to propose improvement design features. Then, the metrology loop of the system is mathematically modelled to define the propagation of the different sources. Several simplifications and design hypothesis are justified and validated, including the assumption of rigid body behavior, which is demonstrated after a finite element analysis verification. The different error sources and their estimated contributions are enumerated in order to conclude with the final error values obtained from the error budget. The measurement deviations obtained demonstrate the important influence of the working environmental conditions, the flatness error of the plane mirror reflectors and the accurate manufacture and assembly of the components forming the metrological loop. Thus, a temperature control of ¿0.1 ¿C results in an acceptable maximum positioning error for the developed NanoPla stage, i.e., 41 nm, 36 nm and 48 nm in X-, Y- and Z-axis, respectively

Positioning uncertainty of the control system for the planar motion of a nanopositioning platform

The novel nanopositioning platform (NanoPla) that is in development at the University of Zaragoza has been designed to achieve nanometre resolution in a large working range of 50 mm × 50 mm. The 2D movement is performed by four custom-made Halbach linear motors and a 2D laser system provides positioning feedback, while the moving part of the platform is levitating and unguided. As control hardware, this work proposes the use of a commercial solution, in contrast to other systems, where the control hardware and software were specifically designed for the purpose. In a previous work of this research, the control system of one linear motor implemented in the selected commercial hardware was presented. In this study, the developed control system is extended to the four motors of the nanopositioning platform to generate a 2D planar movement in the whole working range of the nanopositioning platform. In addition, the positioning uncertainty of the control system is assessed. The obtained results satisfy the working requirements of the NanoPla, achieving a positioning uncertainty of ±0.5 µm along the whole working range

Progress of nanopositioning and nanomeasuring machines for cross-scale measurement with sub-nanometre precision

Nanopositioning and nanomeasuring machines (NPM-machines), developed at Technische Universität Ilmenau, have provided high-precision measurement and positioning of objects across ten decades, from 20 pm resolution up to 200 mm measuring range. They work on the basis of the error-minimal, extended six degrees of freedom Abbe-comparator principle, with high-precision fibre-coupled laser interferometers and optical or atomic force probes. These machines are suitable not only for measuring but also for positioning with an outstanding sub-nanometre performance. Measurements on precision step heights up to 5 mm show a repeatability of 20 pm. Consecutive step positioning of 80 pm can be demonstrated. With the new approach of an atomic clock-stabilized He–Ne-laser via a high-stable-frequency comb, we achieve a frequency stability of less than 300 Hz, respectively 0.6 ċ 10−12 relative frequency stability within 1 h at an integration time of 1 s. For the first time, we can demonstrate a direct, permanent and unbroken chain of traceability between the laser interferometric measurement within an NPM-machine and a GPS satellite-based atomic clock. This paper presents a closer insight into the scientific and metrological background as well as unrivalled measurement results, and discusses the great possibilities of this new technology

Positioning Control System for a Large Range 2D Platform with Submicrometre Accuracy for Metrological and Manufacturing Applications

The importance of nanotechnology in the world of Science and Technology has rapidly increased over recent decades, demanding positioning systems capable of providing accurate positioning in large working ranges. In this line of research, a nanopositioning platform, the NanoPla, has been developed at the University of Zaragoza. The NanoPla has a large working range of 50 mm × 50 mm and submicrometre accuracy. The NanoPla actuators are four Halbach linear motors and it implements planar motion. In addition, a 2D plane mirror laser interferometer system works as positioning sensor. One of the targets of the NanoPla is to implement commercial devices when possible. Therefore, a commercial control hardware designed for generic three phase motors has been selected to control and drive the Halbach linear motors.This thesis develops 2D positioning control strategy for large range accurate positioning systems and implements it in the NanoPla. The developed control system coordinates the performance of the four Halbach linear motors and integrates the 2D laser system positioning feedback. In order to improve the positioning accuracy, a self calibration procedure for the characterisation of the geometrical errors of the 2D laser system is proposed. The contributors to the final NanoPla positioning errors are analysed and the final positioning uncertainty (k=2) of the 2D control system is calculated to be ±0.5 µm. The resultant uncertainty is much lower than the NanoPla required positioning accuracy, broadening its applicability scope.<br /

Enhanced Positioning Bandwidth in Nanopositioners via Strategic Pole Placement of the Tracking Controller

Funding: This research received no external funding.Peer reviewedPublisher PD

High-precision Control of a Piezo-driven Nanopositioner Using Fuzzy Logic Controllers

Acknowledgments: The authors would like to thank Douglas Russell for the technical help and Andres San-Millan for data measurements. Financial support via the Elphinstone Research Scholarship, provided by the School of Engineering, University of Aberdeen, to fund Mohammed Altaher’s Ph.D. work is highly appreciated.Peer reviewedPublisher PD

Fractional order implementation of Integral Resonant Control – A nanopositioning application

This paper was sponsored by the Spanish FPU12/00984 Program (Ministerio de Educacion, Cultura y Deporte). It was also sponsored by the Spanish Government Research Program with the Project DPI2012-37062-CO2-01 (Ministerio de Economia y Competitividad) and by the European Social Fund.Peer reviewedPostprin

2D positioning control system for the planar motion of a nanopositioning platform

A novel nanopositioning platform (referred as NanoPla) in development has been designed to achieve nanometre resolution in a large working range of 50 mm × 50 mm. Two-dimensional (2D) movement is performed by four custom-made Halbach linear motors, and a 2D laser system provides positioning feedback, while the moving part of the platform is levitating and unguided. For control hardware, this work proposes the use of a commercial generic solution, in contrast to other systems where the control hardware and software are specifically designed for that purpose. In a previous paper based on this research, the control system of one linear motor implemented in selected commercial hardware was presented. In this study, the developed control system is extended to the four motors of the nanopositioning platform to generate 2D planar movement in the whole working range of the nanopositioning platform. In addition, the positioning uncertainty of the control system is assessed. The obtained results satisfy the working requirements of the NanoPla, achieving a positioning uncertainty of ±0.5 µm along the whole working range