2 research outputs found
FUNDAMENTAL ISSUE IN SPACE ELECTRONICS RELIABILITY: NEGATIVE BIAS TEMPERATURE INSTABILITY
Negative Bias Temperature Instability (NBTI) in silicon based metal-oxide-semiconductor-field-effect-transistors (MOSFETs) has been recognized as a critical reliability issue for advanced space qualified electronics. The phenomenon manifests itself as a modification of threshold voltage (Vth) resulting in degraded signal timing paths, and ultimately circuit failure. Despite the obvious importance of the issue, a standard measurement protocol has yet to be determined. This is a consequence of a large amount of complexity introduced by the strong dependencies of NBTI on temperature, electric field, frequency, duty cycle, and gate dielectric composition. We have improved upon the traditional measurement techniques which suffered from an underestimation of the magnitude of Vth shifts because they failed to account for trapped charge relaxation. Specifically, we have developed a means for measuring the maximum effect of NBTI by virtue of a method that can continuously monitor the Vth(t) without having to remove the stressing voltage. The interpretation methodology for this technique is explained in detail and the relevant approximations are justified. We have evidenced temperature and vertical electric field dependent Vth shifts in SiO2 and HfSiON devices. Furthermore, we have collected substantial evidence that the traditional \uf044Vth=At\uf061 analysis fails to explain the experimental data in the early time domain. Finally, we have discovered that \uf044Vth(t) on p-channel field effect transistors with HfSiON gate dielectrics is dependent upon the magnitude of Vds during the stressing cycle. To our knowledge this is not anticipated by any prior modeling attempts. We justify the exclusion of short channel effects as a possibility, leading us to conclude that positive charge in the dielectric stack is laterall
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Online Nbti Wear-out Estimation
CMOS feature size scaling has been a source of dramatic performance gains, but it has come at a cost of on-chip wear-out. Negative Bias Temperature Instability (NBTI) is one of the main on-chip wear-out problems which questions the reliability of a chip. To check the accuracy of Reaction-Diffusion (RD) model, this work first proposes to compare the NBTI wear-out data from the RD wear-out model and the reliability simulator - Ultrasim RelXpert, by monitoring the activity of the register file on a Leon3 processor. The simulator wear-out data obtained is considered to be the baseline data and is used to tune the RD model using a novel technique time slicing. It turns out that the tuned RD model NBTI degradation is on an average 80% accurate with respect to RelXpert simulator and its calculation is approximately 8 times faster than the simulator. We come up with a waveform compression technique, for the activity waveforms from the Leon3 register file, which consumes 131KB compared to 256MB required without compression, and also provides 91% accuracy in NBTI degradation, compared to the same obtained without compression. We also propose a NBTI ΔVth estimation/prediction technique to reduce the time consumption of the tuned RD model threshold voltage calculation by an order of with one day degradation being 93% within the same of the tuned RD model. This work further proposes to a novel NBTI Degradation Predictor (NDP), to predict the future NBTI degradation, in a DE2 FPGA for WCET benchmarks. Also we measure the ΔVth variation across the 4 corners of the DE2 FPGA running a single Leon3, which varies from 0.08% to 0.11% of the base Vth