275 research outputs found
An interferometric study of dissociative recombination radiation in neon and argon afterglows
Spectral line profiles on neon and argon determined by high resolution, photoelectric recording, pressure tuned Fabry-Perot interferomete
A mathematical study of the electron decay in diffusion and recombination controlled afterglows - Annals of physics
Mathematical solution for electron continuity equation in decaying plasma afterglo
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Fullerene derivative based spin-on-carbon hard masks for advanced lithographic applications
Spin-on-Carbon (SoC) hardmasks are an increasingly key component of the microchip fabrication process. Progress in lithographic resolution has made the adoption of extremely thin photoresist films necessary for the fabrication of “1x nanometre” linewidth structures to prevent issues such as resist collapse during development. While there are resists with high etch durability, ultimately etch depth is limited by resist thickness. A possible solution is the use of a multilayer etch stack. This allows for considerable increase in aspect ratio. For the organic hard mask base layer, a carbon-rich material is preferred as carbon possesses a high etch resistance in silicon plasma etch processes. A thin silicon topcoat deposited on the carbon film can be patterned with a thin photoresist film without feature collapse, and the pattern transferred to the underlying carbon film by oxygen plasma. This produces high aspect ratio carbon structures suitable for substrate etching. In terms of manufacturability it is beneficial to spin coat the carbon layer instead of using chemical vapor deposition, but the presence of carbon-hydrogen bonds in typical spin-on-carbon leads to line wiggling during the etch (a significant problem at smaller feature sizes). We have developed a fullerene based SoC and reported on material characterization. The materials low Ohnishi number provides high etch durability and the low hydrogen level allows for high resolution etching without wiggling. Here recent advances in material development and work towards commercialization of the materials are presented and the use of the materials in etch stacks is demonstrated
Theory of collision-induced translation-rotation spectra: H2-He
This is the published version, also available here: http://dx.doi.org/10.1103/PhysRevA.29.595.An adiabatic quantal theory of spectral line shapes in collision-induced absorption and emission is presented which incorporates the induced translation-rotation and translation-vibration spectra. The generalization to account for the anisotropy of the scattering potential is given. Calculations are carried out of the collision-induced absorption spectra of He in collisions with H2 with ab initio electric dipole functions and realistic potentials. The anisotropy of the interaction potential is small and is not included in the calculations. The predicted spectra are in satisfactory agreement with experimental data though some deviations occur which may be significant. The rotational line shapes have exponential wings and are not Lorentzian. The connection between the quantal and classical theories is written out explicitly for the isotropic overlap induction
Cooperative damping mechanism of the resonance in the nuclear photoabsorption
We propose a resonance damping mechanism to explain the disappearance of the
peaks around the position of the resonances higher than the resonance
in the nuclear photoabsorption. This phenomenon is understood by taking into
account the cooperative effect of the collision broadening of and
, the pion distortion and the interference in the two-pion
photoproduction processes in the nuclear medium.Comment: 11 pages, uses revtex.sty. To appear in Phys. Rev. Let
Nuclear Photoabsorption at Photon Energies between 300 and 850 Mev
We construct the formula for the photonuclear total absorption cross section
using the projection method and the unitarity relation. Our treatment is very
effective when interference effects in the absorption processes on a nucleon
are strong. The disappearance of the peak around the position of the
resonance in the nuclear photoabsorption can be explained with the cooperative
effect of the interference in two-pion production processes,the Fermi motion,
the collision broadenings of and , and the pion distortion in the
nuclear medium. The change of the interference effect by the medium plays an
important role.Comment: 22pages,7figures,revtex
Photofission of heavy nuclei at energies up to 4 GeV
Total photofission cross sections for 238U, 235U, 233U, 237Np, 232Th, and
natPb have been measured simultaneously, using tagged photons in the energy
range Egamma=0.17-3.84 GeV. This was the first experiment performed using the
Photon Tagging Facility in Hall B at Jefferson Lab. Our results show that the
photofission cross section for 238U relative to that for 237Np is about 80%,
implying the presence of important processes that compete with fission. We also
observe that the relative photofission cross sections do not depend strongly on
the incident photon energy over this entire energy range. If we assume that for
237Np the photofission probability is equal to unity, we observe a significant
shadowing effect starting below 1.5 GeV.Comment: 4 pages of RevTex, 6 postscript figures, Submitted to Phys. Rev. Let
Photoabsorption on nuclei
We calculate the total photoabsorption cross section on nuclei in the energy
range from 300 MeV to 1 GeV within the framework of a semi-classical phase
space model. Besides medium modifications like Fermi motion and Pauli blocking
we focus on the collision broadening of the involved resonances. The resonance
contributions to the elementary cross section are fixed by fits to partial wave
amplitudes of pion photoproduction. The cross sections for ,
needed for the calculation of collision broadening, are obtained by detailed
balance from a fit to cross sections. We show that a
reasonable collision broadening is not able to explain the experimentally
observed disappearance of the -resonance in the photoabsorption
cross section on nuclei.Comment: 26 pages Latex including 9 postscript figure
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