Faster Training of Mask R-CNN by Focusing on Instance Boundaries

We present an auxiliary task to Mask R-CNN, an instance segmentation network, which leads to faster training of the mask head. Our addition to Mask R-CNN is a new prediction head, the Edge Agreement Head, which is inspired by the way human annotators perform instance segmentation. Human annotators copy the contour of an object instance and only indirectly the occupied instance area. Hence, the edges of instance masks are particularly useful as they characterize the instance well. The Edge Agreement Head therefore encourages predicted masks to have similar image gradients to the ground-truth mask using edge detection filters. We provide a detailed survey of loss combinations and show improvements on the MS COCO Mask metrics compared to using no additional loss. Our approach marginally increases the model size and adds no additional trainable model variables. While the computational costs are increased slightly, the increment is negligible considering the high computational cost of the Mask R-CNN architecture. As the additional network head is only relevant during training, inference speed remains unchanged compared to Mask R-CNN. In a default Mask R-CNN setup, we achieve a training speed-up and a relative overall improvement of 8.1% on the MS COCO metrics compared to the baseline.Comment: 9 pages, 7 figures, 5 table

Method for growing low defect, high purity crystalline layers utilizing lateral overgrowth of a patterned mask

A method for growing a high purity, low defect layer of semiconductor is described. This method involves depositing a patterned mask of a material impervious to impurities of the semiconductor on a surface of a blank. When a layer of semiconductor is grown on the mask, the semiconductor will first grow from the surface portions exposed by the openings in the mask and will bridge the connecting portions of the mask to form a continuous layer having improved purity, since only the portions overlying the openings are exposed to defects and impurities. The process can be iterated and the mask translated to further improve the quality of grown layers

Old Mask

abstract The mask is a duplication of a human face which is usually used to dance in Bali this mask.Karya retrieve the object mask (Mask Old) because they want to preserve the art and culture of another is Bali.Alasan object mask as a work of art has a very high artistic value. This work is a rare photographic work, because to get this work, the author must wait while the mask dance dipentaskannya classified as sacred and only exhibited at certain moments. This work is unique because it works diats photography printed palm leaves. Usually we know photographic work printed on paper or canvas. Thus this work proved, that the photographic work could be developed to print on palm leaves. Can add new kazanah photographic work has its own uniqueness. Keywords: Papyrus, Old Mas

PENARAN PENASAR DALAM PATOPENGAN

Influence of science and technological like television to present mask dance, Mask Prembom and or Babondresan and tourism development is given the excite-ment which strong enough for mask enthusiast Bali society. Patopengan like is so-ciety in Bali, because mask is one of artistry, total art and easy understood by story “Babad”. Mask Show use the ancient language Jawa translated to Balinese Langu-age. Figure penasar in mask is determining to figure succeed its show. Penasar have the function complex:namely story, puppeteer and interpreter, connect ther story, commentator, stage manager, and even as cover or conclusion and show, hence to became the this figure characterization seemingly is not easy. To act this figure have to own the skill the dance, ability the good vowel, technique of retorica knowledge and artisticly is show. Many matter which must be prepared/owned by somebody which wish to elaborate the figure penasar. This role is inclusive of rareness, so that not many enthusiastic young artist to deepen the role of penasar

Low defect, high purity crystalline layers grown by selective deposition

The purity and perfection of a semiconductor is improved by depositing a patterned mask of a material impervious to impurities of the semiconductor on a surface of a blank. When a layer of semiconductor is grown on the mask, the semiconductor will first grow from the surface portions exposed by the openings in the mask and will bridge the connecting portions of the mask to form a continuous layer having improved purity, since only the portions overlying the openings are exposed to defects and impurities