Colored and transparent oxide thin films prepared by magnetron sputtering: The glass blower approach

This work describes the reactive magnetron sputtering processing at room temperature of several mixed oxide MxSiyOz thin films (M: Fe, Ni, Co, Mo, W, Cu) intended for optical, coloring, and aesthetic applications. Specific colors can be selected by adjusting the plasma gas composition and the Si-M ratio in the magnetron target. The microstructure and chemistry of the films are characterized by a large variety of techniques including X-ray photoemission spectroscopy, X-ray absorption spectroscopy (XAS), and infrared spectroscopy, while their optical properties are characterized by UV-vis transmission and reflection analysis. Particularly, XAS analysis of the M cations in the amorphous thin films has provided valuable information about their chemical state and local structure. It is concluded that the M cations are randomly distributed within the SiO2 matrix and that both the M concentration and its chemical state are the key parameters to control the final color of the films. © 2013 American Chemical Society.We thank the Junta de Andalucía (Projects P09-CTS-5189, TEP5283, and FQM-6900), the Ministry of Science and Innovation (Projects CENIT-ArtDeco, CONSOLIDER CSD2008-00023, MAT2010-21228, MAT2010-18447, MAT2008-06542-C04-01, MAT2011-27573-C04-04), and DGA NETOSHIMA grants for financial support. We acknowledge MICINN and CSIC for provision of synchrotron radiation facilities at the ESRF and the BM25-Spline staff for the technical support.Peer Reviewe