Directed Self Assembly

Current Challenges to manufacturing •Limits of 193i and multiple patterning are approaching •10nm resolution has been demonstrated with multiple patterning •EUV as an alternative is expensive with low throughput Advantages of Directed Self Assembly •Resolution of 20nm and possibly lower •Can be integrated with current patterning techniques •Inexpensive Disadvantages of DSA •Complex patterns can be difficult or impossible to form •Has to be integrated into an existing lithography process •Pattern formation may take large amounts of tim

Microscale Freeform Integration by Directed Self Assembly

Most solid freeform fabrication (SFF) manufacturing processes assemble uniform components such as powder particles or polymer chains to produce desired geometries. Their capacity for producing highly functional parts (integrated actuation, sensing, and electronics) will dramatically increase when multiple materials and functional subcomponents can be automatically integrated. This paper addresses criteria for a system that integrates multiple materials and components through computer-controlled self-assembly. It builds complex systems from layers of self-assembled micro-components. The paper will address implementation methods, present a concept demonstration, and consider its application to micro-thermoelectric systems. This manufacturing process can be enhanced further through integration with mature additive processes.Mechanical Engineerin

Exploration of Directed Self Assembly Polymers

Directed Self Assembly (DSA) is an attractive alternative to 193i and multiple patterning. Various polymers were investigated to find the possible structures that can be created with them. Previous research was used to determine the process used. Two surface treatments, a polymer brush and hexamethyldisilazane (HMDS) were used to help the polymers phase separate into their respective structure. The first polymer a polystyrene (PS) block polydimethylsiloxane (PDMS) resulted in de-wetting and film non-uniformity that prevented measurement. The second polymer a PS block polyethylene oxide (PEO) resulted in crystallization if the PEO ratio was too high at 40% mole. When the PEO ratio was low enough at 29% mole and on a PS brush polymer via holes 30 nm in diameter were found using phase imaging on an Atomic Force Microscope (AFM). Repeat samples of the via holes de-wetted from the surface likely due to surface contamination preventing the brush polymer from adhering to the surface

Directed Self-Assembly: Expectations and Achievements

Nanotechnology has been a revolutionary thrust in recent years of development of science and technology for its broad appeal for employing a novel idea for relevant technological applications in particular and for mass-scale production and marketing as common man commodity in general. An interesting aspect of this emergent technology is that it involves scientific research community and relevant industries alike. Top–down and bottom–up approaches are two broad division of production of nanoscale materials in general. However, both the approaches have their own limits as far as large-scale production and cost involved are concerned. Therefore, novel new techniques are desired to be developed to optimize production and cost. Directed self-assembly seems to be a promising technique in this regard; which can work as a bridge between the top–down and bottom–up approaches. This article reviews how directed self-assembly as a technique has grown up and outlines its future prospects

Exploration of Directed Self Assembly Polymers

Directed Self Assembly (DSA) is an attractive alternative to 193i and multiple patterning. Various polymers were investigated to find the possible structures that can be created with them. Previous research was used to determine the process used. Two surface treatments, a polymer brush and hexamethyldisilazane (HMDS) were used to help the polymers phase separate into their respective structure. The first polymer a polystyrene (PS) block polydimethylsiloxane (PDMS) resulted in de-wetting and film non-uniformity that prevented measurement. The second polymer a PS block polyethylene oxide (PEO) resulted in crystallization if the PEO ratio was too high at 40% mole. When the PEO ratio was low enough at 29% mole and on a PS brush polymer via holes 30 nm in diameter were found using phase imaging on an Atomic Force Microscope (AFM). Repeat samples of the via holes de-wetted from the surface likely due to surface contamination preventing the brush polymer from adhering to the surface