Topical Generalization for Presentation of User Profiles

Fine-grained user profile generation approaches have made it increasingly feasible to display on a profile page in which topics a user has expertise or interest. Earlier work on topical user profiling has been directed at enhancing search and personalization functionality, but making such profiles useful for human consumption presents new challenges. With this work, we have taken a first step toward a semantic layout mode for topical user profiles. We have developed a topical generalization approach which finds coherent groups of topics and adds labels to them, based on their association with broader topics in the Wikipedia category graph. A nested layout mode, employing topical generalization, is compared with a simpler flat layout mode in our user study. The results indicate that users favor the nested structure over flat profiles, but tend to overlook the specific topics on the lower level. We propose a third layout mode to address this issue.Comment: (to be) presented at DIR'16, November 25, 2016, Delft, The Netherland

Atmospheric-pressure atomic layer deposition:recent applications and new emerging applications in high-porosity/3D materials

Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process with a potentially lower ownership cost of the reactor. In this review, we provide a comprehensive overview of the recent applications and development of ALD approaches emphasizing those based on operation at atmospheric pressure. Each application determines its own specific reactor design. Spatial ALD (s-ALD) has been recently introduced for the commercial production of large-area 2D displays, the surface passivation and encapsulation of solar cells and organic light-emitting diode (OLED) displays. Atmospheric temporal ALD (t-ALD) has opened up new emerging applications such as high-porosity particle coatings, functionalization of capillary columns for gas chromatography, and membrane modification in water treatment and gas purification. The challenges and opportunities for highly conformal coating on porous substrates by atmospheric ALD have been identified. We discuss in particular the pros and cons of both s-ALD and t-ALD in combination with their reactor designs in relation to the coating of 3D and high-porosity materials.</p