1 research outputs found
Deterministic Nucleation of InP on Metal Foils with the Thin-Film Vapor–Liquid–Solid Growth Mode
A method for growth of ultralarge
grain (>100 μm) semiconductor
thin-films on nonepitaxial substrates was developed via the thin-film
vapor–liquid–solid growth mode. The resulting polycrystalline
films exhibit similar optoelectronic quality as their single-crystal
counterparts. Here, deterministic control of nucleation sites is presented
by substrate engineering, enabling user-tuned internuclei spacing
of up to ∼1 mm. Besides examining the theory associated with
the nucleation process, this work presents an important advance toward
controlled growth of high quality semiconductor thin films with unprecedented
grain sizes on nonepitaxial substrates