High-Performance ZnO Nanowire Transistors with Aluminum Top-Gate Electrodes and Naturally Formed Hybrid Self-Assembled Monolayer/AlO_<i>x</i> Gate Dielectric

A method for the formation of a low-temperature hybrid gate dielectric for high-performance, top-gate ZnO nanowire transistors is reported. The hybrid gate dielectric consists of a self-assembled monolayer (SAM) and an aluminum oxide layer. The thin aluminum oxide layer forms naturally and spontaneously when the aluminum gate electrode is deposited by thermal evaporation onto the SAM-covered ZnO nanowire, and its formation is facilitated by the poor surface wetting of the aluminum on the hydrophobic SAM. The hybrid gate dielectric shows excellent electrical insulation and can sustain voltages up to 6 V. ZnO nanowire transistors utilizing the hybrid gate dielectric feature a large transconductance of 50 μS and large on-state currents of up to 200 μA at gate-source voltages of 3 V. The large on-state current is sufficient to drive organic light-emitting diodes with an active area of 6.7 mm² to a brightness of 445 cd/m². Inverters based on ZnO nanowire transistors and thin-film carbon load resistors operate with frequencies up to 30 MHz

High-Yield Transfer Printing of Metal–Insulator–Metal Nanodiodes

Nanoscale metal–insulator–metal (MIM) diodes represent important devices in the fields of electronic circuits, detectors, communication, and energy, as their cutoff frequencies may extend into the “gap” between the electronic microwave range and the optical long-wave infrared regime. In this paper, we present a nanotransfer printing method, which allows the efficient and simultaneous fabrication of large-scale arrays of MIM nanodiode stacks, thus offering the possibility of low-cost mass production. In previous work, we have demonstrated the successful transfer and electrical characterization of macroscopic structures. Here, we demonstrate for the first time the fabrication of several millions of nanoscale diodes with a single transfer-printing step using a temperature-enhanced process. The electrical characterization of individual MIM nanodiodes was performed using a conductive atomic force microscope (AFM) setup. Our analysis shows that the tunneling current is the dominant conduction mechanism, and the electrical measurement data agree well with experimental data on previously fabricated microscale diodes and numerical simulations