Photoexcited-induced sensitivity of InGaAs surface QDs to environment

A detailed analysis of the impact of illumination on the electrical response of In0.5Ga0.5As surface nanostructures is carried out as a function of different relative humidity conditions. The importance of the surface-to-volume ratio for sensing applications is once more highlighted. From dark-to-photo conditions, the sheet resistance (SR) of a three-dimensional In0.5Ga0.5As nanostructure decays two orders of magnitude compared with that of a two-dimensional nanostructure. The electrical response is found to be vulnerable to the energy of the incident light and the external conditions. Illuminating with high energy light translates into an SR reduction of one order of magnitude under humid atmospheres, whereas it remains nearly unchanged under dry environments. Conversely, lighting with energy below the bulk energy bandgap, shows a negligible effect on the electrical properties regardless the local moisture. Both illumination and humidity are therefore needed for sensing. Photoexcited carriers can only contribute to conductivity if surface states are inactive due to water physisorption. The strong dependence of the electrical response on the environment makes these nanostructures very suitable for the development of highly sensitive and efficient sensing devices

Impact of carrier localization on the photoluminescence characteristics of (Ga,In)(N,As) and (Ga,In)(N,As,Sb) quantum wells

Using photoluminescence (PL) spectroscopy, we carry out a comparative study of the optical properties of (Ga,In)(N,As) and (Ga,In)(N,As,Sb) quantum wells. The incorporation of Sb into (Ga,In)(N,As) results in a reduced quantum efficiency at low temperatures but an improved one at room temperature (RT). A PL line shape analysis as well as the temperature dependence of the PL peak energy reveals the existence of band-tail localized states in both material systems. The carrier localization energy is larger for (Ga,In)(N,As,Sb) than for (Ga,In)(N,As), leading to a longer radiative lifetime and thus a reduced quantum efficiency at low temperatures for the former material. The thermal quenching of the quantum efficiency is analyzed by a rate equation model, which shows that the density of nonradiative centers is reduced in (Ga,In)(N,As,Sb) resulting in an enhanced quantum efficiency at RT

Mid-infrared photodetectors based on GaAsSb-capped InAs quantum dots

Quantum dot infrared photodetectors (QDIPs) are very attractive for many applications such as infrared imaging, remote sensing and gas sensing, thanks to its promising features such as high temperature operation, normal incidence response and low dark current [1]. However, the key issue is to obtain a high-quality active region which requires an optimization of the nanostructure. By using GaAsSb capping layer, InAs QDs have improved their optical emission in the range between 1.15 and 1.3 m (at Sb composition of 14 %), due to a reduction of a compressive strain in QD and an increment of a QD height [2]. In this work, we have demonstrated strong and narrow intraband photoresponses at ~ 5 m from GaAsSb-capped InAs/GaAs QDIPs under normal light-incidence

Synthesis and characterization of GaAsSb-capped InAs-based QDIPs

Quantum dot infrared photodetectors (QDIPs) are very attractive for infrared imaging applications due to its promising features such as high temperature operation, normal incidence response and low dark current [1]. However, the key issue is to obtain a high quality active region which requires a structural optimization of the nanostructures. With using GaAsSb capping layer, the optical properties, such as the PL intensity and its full width at half maximum (FWHM), of InAs QDs have been improved in the range between 1.15 and 1.5 m, because of the reduction of the compressive strain in QDs and the increment of QD height [2]. In this work, we have demonstrated strong and narrow intraband photoresponse spectra from GaAsSb-capped InAs-based QDIP

Room temperature photoluminescence of InGaAs Surface Quantum Dots

Self-assembled InGaAs quantum dots show unique physical properties such as three dimensional confinement, high size homogeneity, high density and low number of dislocations. They have been extensively used in the active regions of laser devices for optical communications applications [1]. Therefore, buried quantum dots (BQDs) embedded in wider band gap materials have been normally studied. The wave confinement in all directions and the stress field around the dot affect both optical and electrical properties [2, 3]. However, surface quantum dots (SQDs) are less affected by stress, although their optical and electrical characteristics have a strong dependence on surface fluctuation. Thus, they can play an important role in sensor application

Critical Role of Two-Dimensional Island-Mediated Growth on the Formation of Semiconductor Heterointerfaces

We experimentally demonstrate a sigmoidal variation of the composition profile across semiconductor heterointerfaces. The wide range of material systems (III-arsenides, III-antimonides, III-V quaternary compounds, III-nitrides) exhibiting such a profile suggests a universal behavior. We show that sigmoidal profiles emerge from a simple model of cooperative growth mediated by twodimensional island formation, wherein cooperative effects are described by a specific functional dependence of the sticking coefficient on the surface coverage. Experimental results confirm that, except in the very early stages, island growth prevails over nucleation as the mechanism governing the interface development and ultimately determines the sigmoidal shape of the chemical profile in these two-dimensional grown layers. In agreement with our experimental findings, the model also predicts a minimum value of the interfacial width, with the minimum attainable value depending on the chemical identity of the species

Gas sensor based on room temperature optical properties of Surface QDs

Self-organized InGaAs QDs are intensively studied for optoelectronic applications. Several approaches are in study to reach the emission wavelengths needed for these applications. The use of antimony (Sb) in either the capping layer or into the dots is one example. However, these studies are normally focused on buried QD (BQD) where there are still different controversial theories concerning the role of Sb. Ones suggest that Sb incorporates into the dot [1], while others support the hypothesis that the Sb occupies positions surrounding the dot [2] thus helping to keep their shape during the capping growth

Vertical composition fluctuations in (Ga,In)(N,As) quantum wells grown on vicinal (1 1 1) B GaAs

In this work, we present a detailed transmission electron microscopy analysis of the interfacial structure and composition uniformity of (Ga,In)(N,As) quantum wells grown by molecular beam epitaxy on vicinal GaAs(1 1 1)B substrates. Vertical composition fluctuations inside the (Ga,In)(N,As) quantum well are detected depending on the growth conditions, in particular the V/III flux ratio and the growth rate. This vertical composition fluctuation due to the phase separation tendency is in contrast to the (0 0 1) case, where the fluctuations proceed in the lateral direction. The specific character of the phase instabilities is discussed with respect to the spinodal decomposition of the (Ga,In)(N,As) alloy grown by step-flow on the misoriented (1 1 1)B substrates. The vertical composition fluctuations are explained by the formation of step bunches of alternating composition as a consequence of the different propagation velocity of steps with different atom terminations

The effect of rapid thermal annealing on the photoluminescence of InAsN/InGaAs dot-in-a-well structures

The effect of post-growth rapid thermal annealing on the optical characteristics of InAsN/InGaAs dot-in-a-well DWELL structures grown by molecular beam epitaxy on GaAs(1 0 0) has been studied. InAs/InGaAs DWELL structures have been used as a reference. Photoluminescence measurements of these samples show similar optical effects, such as a blueshift of the peak wavelength and a reduction of the full width of at half maximum PL emission, in both types of structures up to an annealing temperature of 750 °C. Nevertheless, at 850 °C, these effects are much more pronounced in the structures with N. These results suggest that an additional As–N interdiffusion process inside the InAsN quantum dots plays a dominant role in these effects at high annealing temperatures (850 °C) on InAsN/InGaAs structures

The influence of Ga composition of GaInAsN QDs on N incorporation.

Currently, dilute nitride III-N-As semiconductors, such as InGaAsN/GaAs quantum well material system, allow to develop very competitive lasers at long wavelength emission (1.3 µm). However, longer wavelengths, such as 1.55 µm, are very difficult to achieve without making worse the performance of the device. Alternatively, as it is well known, great efforts are being devoted to the study of dilute nitride III-N-As quantum dots (QDs) semiconductor [1]. Mainly, this is due to the attractive advantages that they show over other materials and structures: the strong reduction in the bandgap of the III-As semiconductor by adding even a few percent of nitrogen into them, and the interesting physical properties that the QDs offer to laser characteristics (e.g. low threshold current, etc