27 research outputs found

    Optical Layers for Thin-film Silicon Solar Cells

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    In this work we develop and analyze optical layers for use in Micromorph solar cells, a tandem configuration with an amorphous silicon top cell and a microcrystalline silicon bottom cell. The morphology of the front electrode has a decisive role in maximizing the efficiency of a solar cell. To reach a better understanding of the requirements for the front electrode surface, we present a wide range of morphologies that can be obtained with as-grown rough zinc oxide (ZnO) and post-deposition argon plasma surface treatments. We correlate the morphological parameters to light scattering in transmission and reflection, and identify the inclination angles of ZnO pyramids as the most pertinent parameter for thin-film silicon solar cells. We show that there are no reflection losses at the interface between as-grown rough ZnO and silicon, and we quantify the reflection losses for smoother interfaces. With titanium dioxide, produced by reactive magnetron sputtering, we demonstrate that for flat interfaces reflection losses of up to 7.4% can be canceled at 550 nm wavelength. We show that in microcrystalline silicon cells p-type silicon sub-oxide (SiOx) can also be used to reduce reflection losses, and at the same time can act as field-creating window layer. We develop a wide range of mixed-phase SiOx layers and with energy-filtered transmission electron microscopy we reveal the filamentous nanostructure of films produced with high hydrogen dilution of the precursor gas mixture. A partial decoupling of electrical and optical parameters is achieved for such films, where the transparency and the refractive index are determined mostly by the silicon oxide matrix, while sufficient transverse conductivity for the use in solar cells is maintained by few-nanometer-wide silicon filaments. In thin-film silicon solar cells, p-type SiOx~0.5 shows the best results as a window layer with enhanced transparency, while strongly phosphorous-doped n-type SiOx~1 is best suited for use as an intermediate reflecting layer in tandem cells due to a low refractive index of 1.8 with sufficient transverse conductivity. The tunable resistance of doped SiOx layers can be used at various locations in a Micromorph cell to quench shunts or bad diodes in spatially non-uniform devices. Implementation of SiOx with these three functionalities in Micromorph cells has significantly contributed to increasing the best initial efficiency from 11.8% in 2006 to 13.5% in 2010. While rough ZnO front electrodes and SiOx-based intermediate reflecting layers both help to improve Micromorph cell efficiencies, they render the devices more sensitive to water-vapor-induced degradation. With lock-in thermography measurements we demonstrate that water contamination affects mainly the cell borders resulting in non-uniform distribution of the local open circuit voltage. Finally we show how free-carrier absorption and surface plasmon polariton absorption can reduce the reflectivity of the back reflector, and we present preliminary results aimed toward the realization of an absorption-free back reflector making use of polished ZnO and sputtered silver layers

    Des batteries au service du réseau

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    De plus en plus d’installations photovoltaïques sont équipées d’un système de stockage par batterie dans le but de maximiser la consommation propre. Or, ce stockage pourrait également contribuer à la stabilité du réseau de distribution. Des simulations ont permis d’étudier comment celui-ci pourrait être délesté grâce à des stratégies d’exploitation tenant compte du réseau

    Unlinking absorption and haze in thin film silicon solar cells front electrodes

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    We study the respective influence of haze and free carrier absorption (FCA) of transparent front electrodes on the photogenerated current of micromorph thin film silicon solar cells. To decouple the haze and FCA we develop bi-layer front electrodes: a flat indium tin oxide layer assures conduction and allows us to tune FCA while the haze is adjusted by varying the thickness of a highly transparent rough ZnO layer. We show how a minimum amount of FCA leads only to a few percents absorption for a single light path but to a strong reduction of the cell current in the infrared part of the spectrum. Conversely, a current enhancement is shown with increasing front electrode haze up to a saturation of the current gain. This saturation correlates remarkably well with the haze of the front electrode calculated in silicon. This allows us to clarify the requirements for the front electrodes of micromorph cells

    Bat4SG: Netz-optimierter Betrieb von dezentralen Kundenspeichern

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    Transparent conducting oxide electrodes requirements for high efficiency micromorph solar cells

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    The requirements for a micromorph tandem cell front transparent conductive oxide (TCO) are multiple. This essential layer needs a high transparency, excellent conduction, strong light scattering into silicon and good surface morphology for the subsequent growth of silicon cells. These parameters are all linked and trade-offs have to be found for optimal layer. The optimum combination, taking into account current achievable materials properties, is still unclear. Concerning transparency, we study here the impact of free carrier absorption (FCA) on the photogenerated current by using first doped and non-intentionally-doped zinc oxide (ZnO). Then, Bi-layers made of flat indium tin oxide (ITO) under various thicknesses of rough ZnO allow a study of the haze influence alone. It is shown that FCA induces drastic current losses in the infra-red part of the spectrum, and haze increase enhances the cell response in the infra-red part up to a certain limit of grain size. Surface feature sizes above 0.4ÎĽm appear to be useless for haze increase purpose at the ZnO/Si interface. By using an optimized 2ÎĽm thick LPCVD ZnO, micromorph cells showing 13.7% initial efficiency, with a total current of 27.7 mA/cm2 could be obtained with 240nm and 2.8ÎĽm of top and bottom cell thicknesses

    A New View of Microcrystalline Silicon: The Role of Plasma Processing in Achieving a Dense and Stable Absorber Material for Photovoltaic Applications

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    To further lower production costs and increase conversion efficiency of thin-film silicon solar modules, challenges are the deposition of high-quality microcrystalline silicon (ÎĽc-Si:H) at an increased rate and on textured substrates that guarantee efficient light trapping. A qualitative model that explains how plasma processes act on the properties of ÎĽc-Si:H and on the related solar cell performance is presented, evidencing the growth of two different material phases. The first phase, which gives signature for bulk defect density, can be obtained at high quality over a wide range of plasma process parameters and dominates cell performance on flat substrates. The second phase, which consists of nanoporous 2D regions, typically appears when the material is grown on substrates with inappropriate roughness, and alters or even dominates the electrical performance of the device. The formation of this second material phase is shown to be highly sensitive to deposition conditions and substrate geometry, especially at high deposition rates. This porous material phase is more prone to the incorporation of contaminants present in the plasma during film deposition and is reported to lead to solar cells with instabilities with respect to humidity exposure and post-deposition oxidation. It is demonstrated how defective zones influence can be mitigated by the choice of suitable plasma processes and silicon sub-oxide doped layers, for reaching high efficiency stable thin film silicon solar cells

    On the Interplay Between Microstructure and Interfaces in High-Efficiency Microcrystalline Silicon Solar Cells

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    This paper gives new insights into the role of both the microstructure and the interfaces in microcrystalline silicon (ÎĽc- Si) single-junction solar cells. A 3-D tomographic reconstruction of a ÎĽc-Si solar cell reveals the 2-D nature of the porous zones, which can be present within the absorber layer. Tomography thus appears as a valuable technique to provide insights into the ÎĽc- Si microstructure. Variable illumination measurements enable to study the negative impact of such porous zones on solar cells performance. The influence of such defectivematerial can bemitigated by suitable cell design, as discussed here. Finally, a hydrogen plasma cell post-deposition treatment is demonstrated to improve solar cells performance, especially on rough superstrates, enabling us to reach an outstanding 10.9% efficiency microcrystalline singlejunction solar cell

    Light Harvesting Schemes for High Efficiency Thin Film Silicon Solar Cells

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    In Thin Film Silicon (TF-Si) solar cells light harvesting schemes must guarantee an efficient light trapping in the thin absorber layers without decreasing the silicon layers quality and consecutively the p-i-n diodes electrical performance. TF-Si solar cells resilience to the substrate roughness is reported to be possibly improved through optimizations of the cell design and of the silicon deposition processes. By further tailoring the superstrate texture, amorphous silicon / microcrystalline silicon (a-Si:H/mu c-Si:H) tandem solar cells with an initial efficiency up to 13.7 % and a stabilized efficiency up to 11.8 % are demonstrated on single-scale textured superstrates. An alternative approach combining large and smooth features nanoimprinted onto a transparent lacquer with small and sharp textures from as-grown LPCVD ZnO is then shown to have a high potential for further increasing TF-Si devices efficiency. First results demonstrate up to 14.1 % initial efficiency for a TF-Si tandem solar cell
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