77 research outputs found

    Mid- to long-wavelength infrared surface plasmon properties in doped zinc oxides

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    pre-printThis work investigates properties of surface plasmons on doped metal oxides in the 2-20 μm wavelength regime. By varying the stoichiometry in pulse laser deposited Ga and Al doped ZnO, the plasmonic properties can be controlled via a fluctuating free carrier concentration. This deterministic approach may enable one to develop the most appropriate stoichometry of ZnAlO and ZnGaO in regards to specific plasmonic applications for particular IR wavelengths. Presented are theoretical and experimental investigations pertaining to ZnAlO and ZnGaO as surface plasmon host materials. Samples are fabricated via pulsed laser deposition and characterized by infrared ellipsometry and Hall-effect measurements. Complex permittivity spectra are presented, as well as plasmon properties such as the field propagation lengths and penetration depths, in the infrared range of interest. Drude considerations are utilized to determine how the optical properties may change with doping. Finite element simulations verify these plasmonic properties. These materials not only offer potential use as IR plasmon hosts for sensor applications, but also offer new integrated device possibilities due to stoichiometric control of electrical and optical properties. Keywords: plasmonics, infrared, sensors, waveguides, zinc oxides

    Surface depletion mediated control of inter-sub-band absorption in GaAs/AlAs semiconductor quantum well systems

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    The modification of quantum well inter-sub-band absorption properties due to surface depletion induced band bending is reported. Fourier transform infrared spectroscopy measurements of a GaAs/AlAs multiple quantum well system reveal a reduction in the characteristic absorption resonance in correlation with wet chemical etching. High resolution transmission electron microscopy confirms the presence of the quantum wells after etching, suggesting the quantum wells are positioned within the surface depletion region of the structure. This method of inter-sub-band absorption modification could be used for the formation of quantum dots from a quantum well system with the precise, deterministic control of their location

    Infrared surface polaritons on bismuth

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    Optical constants for evaporated bismuth (Bi) films were measured by ellipsometry and compared with those published for single crystal and melt-cast polycrystalline Bi in the wavelength range of 1 to 40 mu m. The bulk plasma frequency omega(p) and high-frequency limit to the permittivity epsilon(infinity) were determined from the long-wave portion of the permittivity spectrum, taking previously published values for the relaxation time tau and effective mass m*. This part of the complex permittivity spectrum was confirmed by comparing calculated and measured reflectivity spectra in the far-infrared. Properties of surface polaritons (SPs) in the long-wave infrared were calculated to evaluate the potential of Bi for applications in infrared plasmonics. Measured excitation resonances for SPs on Bi lamellar gratings agree well with calculated resonance spectra based on grating geometry and complex permittivity

    Investigation of Plasmon Resonance Tunneling through Subwavelength Hole Arrays in Highly Doped Conductive ZnO Films

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    Experimental results pertaining to plasmon resonance tunneling through a highly conductive zinc oxide (ZnO) layer with subwavelength hole-arrays is investigated in the mid-infrared regime. Gallium-doped ZnO layers are pulsed-laser deposited on a silicon wafer. The ZnO has metallic optical properties with a bulk plasma frequency of 214 THz, which is equivalent to a free space wavelength of 1.4 μm. Hole arrays with different periods and hole shapes are fabricated via a standard photolithography process. Resonant mode tunneling characteristics are experimentally studied for different incident angles and compared with surface plasmontheoretical calculations and finite-difference time-domain simulations. Transmission peaks, higher than the baseline predicted by diffraction theory, are observed in each of the samples at wavelengths that correspond to the excitation of surface plasmon modes

    Infrared surface plasmons on heavily doped silicon

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    Conductors with infrared plasma frequencies are potentially useful hosts of surface plasmon polaritons (SPP) with sub-wavelength mode confinement for sensing applications. A challenge is to identify such a conductor that also has sharp SPP excitation resonances and the capability to be functionalized for biosensor applications. In this paper we present experimental and theoretical investigations of IR SPPs on doped silicon and their excitation resonances on doped-silicon gratings. The measured complex permittivity spectra for p-type silicon with carrier concentration 6 x 10(19) and 1 x 10(20) cm(-3) show that these materials should support SPPs beyond 11 and 6 mu m wavelengths, respectively. The permittivity spectra were used to calculate SPP mode heights above the silicon surface and SPP propagation lengths. Reasonable merit criteria applied to these quantities suggest that only the heaviest doped material has sensor potential, and then mainly within the wavelength range 6 to 10 mu m. Photon-to-plasmon coupling resonances, a necessary condition for sensing, were demonstrated near 10 mu m wavelength for this material. The shape and position of these resonances agree well with simple analytic calculations based on the theory of Hessel and Oliner (1965)

    Finesse of silicon-based terahertz Fabry-Perot spectrometer

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    ABSTRACT This paper considers factors that affect achievable finesse for a recently demonstrated silicon-based scanning FabryPerot transmission filter at millimeter and sub-millimeter wavelengths. The mirrors are formed by alternating quarterwave optical thicknesses of silicon and air in the usual Bragg configuration. Fundamental loss by lattice and free carrier absorption are considered. Technological factors such as surface roughness, bowing, and misalignment are considered for various proposed manufacturing schemes

    Platinum germanides for mid- and long-wave infrared plasmonics

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    Platinum germanides (PtGe) were investigated for infrared plasmonic applications. Layers of Pt and Ge were deposited and annealed. X-ray diffraction identified PtGe2 and Pt2Ge3 phases, and x-ray photoelectron spectroscopy determined vertical atomic composition profiles for the films. Complex permittivity spectra were measured by ellipsometry over the 2 to 15 mu m wavelength range. Surface plasmon polariton (SPP) characteristics such as propagation length and field penetration depth were calculated. Photon-to-SPP couplers in the form of 1D lamellar gratings were fabricated and characterized in the range 9 - 10.5 mu m via wavelength-dependent specular reflection spectra for multiple angles of incidence. The observed resonances compare well with calculated spectra for SPP excitation on PtGe2. Platinum germanides are CMOS compatible and may serve as SPP hosts for on-chip mid-IR plasmonic components with tighter field confinement than noble-metal hosts

    Room-temperature-deposited dielectrics and superconductors for integrated photonics.

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    We present an approach to fabrication and packaging of integrated photonic devices that utilizes waveguide and detector layers deposited at near-ambient temperature. All lithography is performed with a 365 nm i-line stepper, facilitating low cost and high scalability. We have shown low-loss SiN waveguides, high-Q ring resonators, critically coupled ring resonators, 50/50 beam splitters, Mach-Zehnder interferometers (MZIs) and a process-agnostic fiber packaging scheme. We have further explored the utility of this process for applications in nonlinear optics and quantum photonics. We demonstrate spectral tailoring and octave-spanning supercontinuum generation as well as the integration of superconducting nanowire single photon detectors with MZIs and channel-dropping filters. The packaging approach is suitable for operation up to 160 &deg;C as well as below 1 K. The process is well suited for augmentation of existing foundry capabilities or as a stand-alone process.</p
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