4 research outputs found

    Quantification of phase content in TiO2 thin films by Raman spectroscopy

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    Recently, it has been reported that TiO2 with mixture of phases (anatase/rutile) exhibit higher photocatalytic activity than TiO2 with pure anatase phase. Therefore, the production and correct quantification of the ratio of phases becomes an important task. In this work, anatase TiO2 thin films were obtained by the DC reactive magnetron sputtering technique. TiO2 with mixture of phases (anatase/rutile) were prepared by thermal annealing of the as-deposited thin films. The value of the anatase/rutile ratio in the titanium dioxide thin films was estimated using Raman spectroscopy. Additionally, it is reported the dependence of the bandgap of the TiO2 thin films as a function of the anatase/rutile ratio. The band gap of the TiO2 thin films was determined from diffuse reflectance measurements

    Electron evaporation of carbon using a high density plasma

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    High-density plasmas are often used either in the preparation of thin films or for the modification of surfaces; nitriding. However, except for collision-driven chemical reactions the electrons present are not used, although electron bombardment heating of the work piece nearly always occurs. Principally it is the ions and neutrals that are utilised for materials processing. By suitable biasing of a conducting source material the electrons can be extracted from a highdensity low-pressure plasma to such an extent that evaporation of this source material can be achieved. Due to the presence of the plasma and the flux of electrons a large proportion of the evaporant is expected to be ionised. We have used this novel arrangement to prepare thin films of carbon using a resonant high-density argon plasma and a water cooled rod of high purity graphite. Multiple substrates were used both outside of, and immersed in, the plasma. We report the characteristics of the plasma (electron temperature and density, the ion energy and flux, and optical emission spectra), the deposition process (the evaporation rate and ion/neutral ratio), and the film properties (IR and UV/Vis absorption spectra, Raman spectra, elemental analysis, hardness and refractive index

    Caracterizaci贸n de bicapas TiO2/SnO2 depositadas por ablaci贸n l谩ser para fotocat谩lisis

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    Se depositaron pel铆culas delgadas de oxido de esta帽o y oxido de titanio sobre sustratos de vidrio usando la t茅cnica de ablaci贸n l谩ser. Los dep贸sitos obtenidos fueron amorfos y con el prop贸sito de obtener las fases cristalinas se sometieron a tratamientos t茅rmicos. La caracterizaci贸n de las pel铆culas depositadas incluy贸 composici贸n (EDS y EFA), micro-estructura (espectroscopia Raman y XRD), morfolog铆a superficial (SEM), propiedades 贸pticas (UV-Vis) y resistividad. Los resultados de la caracterizaci贸n estructural muestran que en el caso del oxido de esta帽o se obtiene la fase casiterita, mientras que en el caso del oxido de titanio se obtuvo la fase anatasa. En ambos casos los resultados de composici贸n muestran que se obtienen los 贸xidos estequiom茅tricos, siendo uniformes en profundidad. Las capas de oxido de esta帽o muestran resistividades del orden de 4.2 x10-2 ohm-cm, y las bicapas una transparencia 贸ptica del 65 % en el intervalo de 400 a 700 nm. Las bicapas obtenidas tienen propiedades que las hacen potencialmente 煤tiles en fotocat谩lisis
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