Self assembled three-dimensional nonvolatile memories

A promising strategy for for the realisation of three-dimensional memories could be the self assembly of articial sub-micron elements (smarticles). Such elements can be realised by combining edge-lithography techniques and anisotropic etching. The first experiments into this direction are encouraging

A fabrication process for electrostatic microactuators with integrated gear linkages

A surface micromachining process is presented which has been used to fabricate electrostatic microactuators. These microactuators are interconnected with each other and linked to other movable microstructures by integrated gear linkages. The gear linkages consist of rotational and linear gear structures, and the electrostatic microactuators include curved electrode actuators, comb-drive actuators, and axial-gap wobble motors. The micromechanical structures are constructed from polysilicon. Silicon dioxide was used as a sacrificial layer, and silicon nitride was used for electrical insulation. A cyclohexane freeze drying technique was used to prevent problems with stiction. The actuators, loaded with various mechanisms, were successfully driven by electrostatic actuation. The work is a first step toward mechanical power transmission in micromechanical system

Thermally assisted ion beam etching of polytetrafluoroethylene, a new technique for high aspect ratio etching of MEMS

In micromechanics, the etching of high aspect ratio structures in polymers is a prime technology. Normally, oxygen-based reactive ion etching or the LIGA technique are used to achieve this goal. This paper reintroduces a different idea to create deep trenches at high etch speed: the ion beam etching of Teflon. Because of its extraordinary properties the etch selectivity with respect to most other materials is over 1000. A model is proposed to explain the high etch rate and selectivity. Generally, the etching ions are highly energetic and material from different sources is sputtered on top of the sample. The high selectivity, high anisotropy, and sputtering of material are thought to be responsible for the forming of micrograss during etching a sample. Ways are given to decrease or increase this grass. The high potential of this technique will be discussed and applications will be shown. Especially, the use of etched Teflon for direct moulding is believed to become the main use of this techniqu

High-Performance Shuffle Motor Fabricated by Vertical Trench Isolation Technology

Shuffle motors are electrostatic stepper micromotors that employ a built-in mechanical leverage to produce large output forces as well as high resolution displacements. These motors can generally move only over predefined paths that served as driving electrodes. Here, we present the design, modeling and experimental characterization of a novel shuffle motor that moves over an unpatterned, electrically grounded surface. By combining the novel design with an innovative micromachining method based on vertical trench isolation, we have greatly simplified the fabrication of the shuffle motors and significantly improved their overall performance characteristics and reliability. Depending on the propulsion voltage, our motor with external dimensions of 290 μm × 410 mm displays two distinct operational modes with adjustable step sizes varying respectively from 0.6 to 7 nm and from 49 to 62 nm. The prototype was driven up to a cycling frequency of 80 kHz, showing nearly linear dependence of its velocity with frequency and a maximum velocity of 3.6 mm/s. For driving voltages of 55 V, the device had a maximum travel range of ±70 μm and exhibited an output force of 1.7 mN, resulting in the highest force and power densities reported so far for an electrostatic micromotor. After five days of operation, it had traveled a cumulative distance of more than 1.5 km in 34 billion steps without noticeable deterioration in performance.\u

High-Resolution Contact Printing with Chemically Patterned Flat Stamps Fabricated by Nanoimprint Lithography

Chemically patterned flat stamps provide an effective solution to avoid mechanical stamp-stability problems currently encountered in microcontact printing. A new method is developed to fabricate chemical patterns on a flat PDMS stamp using nanoimprint lithography. Sub-100 nm gold patterns are successfully replicated by these chemically patterned flat PDMS stamps. \ud \u

Self-Aligned Formation and Positioning of Nanogap Templates

This paper presents a versatile and scalable method for generating sub 20 nm nanogaps based on standard I-line lithography. The nanogaps are self-aligned to lithographically patterned features and make use of a combination of corner lithography, edge retraction, and sidewall oxidization. We demonstrate the flexibility of this approach by extending it to include coaxial holes in the center of the circular nanogaps, and by filling of the nanogaps with platinum silicide to create nanowires.</p