A Nitsche-based cut finite element method for a fluid--structure interaction problem

We present a new composite mesh finite element method for fluid--structure interaction problems. The method is based on surrounding the structure by a boundary-fitted fluid mesh which is embedded into a fixed background fluid mesh. The embedding allows for an arbitrary overlap of the fluid meshes. The coupling between the embedded and background fluid meshes is enforced using a stabilized Nitsche formulation which allows us to establish stability and optimal order \emph{a priori} error estimates, see~\cite{MassingLarsonLoggEtAl2013}. We consider here a steady state fluid--structure interaction problem where a hyperelastic structure interacts with a viscous fluid modeled by the Stokes equations. We evaluate an iterative solution procedure based on splitting and present three-dimensional numerical examples.Comment: Revised version, 18 pages, 7 figures. Accepted for publication in CAMCo

Measurements of the asymmetric, dynamic sheath around a pulse biased sphere immersed in flowing metal plasma

A long-probe technique was utilized to record the expansion and retreat of the dynamic sheath around a spherical substrate immersed in pulsed cathode arc metal plasma. Positively biased, long cylindrical probes were placed on the side and downstream of a negatively pulsed biased stainless steel sphere of 1" (25.4 mm) diameter. The amplitude and width of the negative high voltage pulses (HVP) were 2 kV, 5 kV, 10 kV, and 2 mu s, 4 mu s, 10 mu s, respectively. The variation of the probe (electron) current during the HVP is a direct measure for the sheath expansion and retreat. Maximum sheath sizes were determined for the different parameters of the HVP. The expected rarefaction zone behind the biased sphere (wake) due to the fast plasma flow was clearly established and quantified

Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper

The spatial distribution of copper ions and atoms in high power impulse magnetron sputtering (HIPIMS) discharges was determined by (i) measuring the ion current to electrostatic probes and (ii) measuring the film thickness by profilometry. A set of electrostatic and collection probes were placed at different angular positions and distances from the target surface. The angular distribution of the deposition rate and the average charge state of the copper species (including ions and neutrals) were deduced.The discharge showed a distinct transition to a high current mode dominated by copper self-sputtering when the applied voltage exceeded the threshold of 535 V. For a lower voltage, the deposition rate was very low and the average charge state was found to be less than 0.4. For higher voltage (and average power), the absolute deposition rates were much higher, but they were smaller than the corresponding direct current (DC) rates if normalized to the same average power. At the high voltage level, the spatial distribution of the average charge state showed some similarities with the distribution of the magnetic field, suggesting that the generation and motion of copper ions is affected by magnetized electrons. At higher voltage, the average charge state increases with the distance from the target and locally may exceed unity, indicating the presence of significant amounts of doubly charged copper ions

Unified Framework for Finite Element Assembly

At the heart of any finite element simulation is the assembly of matrices and vectors from discrete variational forms. We propose a general interface between problem-specific and general-purpose components of finite element programs. This interface is called Unified Form-assembly Code (UFC). A wide range of finite element problems is covered, including mixed finite elements and discontinuous Galerkin methods. We discuss how the UFC interface enables implementations of variational form evaluation to be independent of mesh and linear algebra components. UFC does not depend on any external libraries, and is released into the public domain

Metal plasmas for the fabrication of nanostructures

A review is provided covering metal plasma production, theenergetic condensation of metal plasmas, and the formation ofnanostructures using such plasmas. Plasma production techniques includepulsed laser ablation, filtered cathodic arcs, and various forms ofionized physical vapor deposition, namely magnetron sputtering withionization of sputtered atoms in radio frequency discharges,self-sputtering, and high power impulse magnetron sputtering. Thediscussion of energetic condensation focuses on the control of kineticenergy by biasing and also includes considerations of the potentialenergy and the processes occurring at subplantation and implantation. Inthe final section on nanostructures, two different approaches arediscussed. In the top-down approach, the primary nanostructures arelithographically produced and metal plasma is used to coat or filltrenches and vias. Additionally, multilayers with nanosize periods(nanolaminates) can be produced. In the bottom-up approach, thermodynamicforces are used to fabricate nanocomposites and nanoporous materials bydecomposition and dealloying

Approaches to rid cathodic arc plasmas of macro- andnanoparticles: A review

A major obstacle for the broad application of cathodic arc plasma deposition is the presence of micro- and nanoparticles in the plasma, also often referred to as 'macroparticles'. This paper reviews the formation of macroparticles at cathode spots, their interaction with the arc plasma and substrate, and macroparticle separation and removal from the plasma by various filtering methods. Nineteen variants of filters are discussed, including Aksenov's classic 90{sup o}-duct filter, filters of open architecture, and the concept of stroboscopic filtering