3 research outputs found
LiFeO<sub>2</sub>-Incorporated Li<sub>2</sub>MoO<sub>3</sub> as a Cathode Additive for Lithium-Ion Battery Safety
Li<sub>2</sub>MoO<sub>3</sub>, with a MoÂ(IV)/MoÂ(VI) redox
couple,
has been tested as a cathode additive to make lithium-ion batteries
safe under abnormal discharge conditions. Its high charging capacity
and sloping discharge voltage below 3.4 V vs Li<sup>+</sup>/Li effectively
prevents the Cu anode current collector from oxidative dissolution
at the overdischarge condition. However, molybdenum dissolution from
the electrochemically charged Li<sub>2</sub>MoO<sub>3</sub> quickly
deteriorates the battery performance at 45 °C. A solid solution
of Li<sub>2</sub>MoO<sub>3</sub> with LiFeO<sub>2</sub> has stabilized
the crystalline structure at the charged states and suppressed the
MoÂ(VI) dissolution. The addition of 10 wt % 0.9Li<sub>2</sub>MoO<sub>3</sub>–0.1LiFeO<sub>2</sub> to LiCoO<sub>2</sub> electrode
enables long-term, high-temperature cycling in the operating voltage
range of 0.0–4.3 V vs graphite
CO<sub>2</sub> Enhanced Chemical Vapor Deposition Growth of Few-Layer Graphene over NiO<sub><i>x</i></sub>
The use of mild oxidants in chemical vapor deposition (CVD) reactions has proven enormously useful. This was also true for the CVD growth of carbon nanotubes. As yet though, the use of mild oxidants in the CVD of graphene has remained unexplored. Here we explore the use of CO<sub>2</sub> as a mild oxidant during the growth of graphene over Ni with CH<sub>4</sub> as the feedstock. Both our experimental and theoretical findings provide in-depth insight into the growth mechanisms and point to the mild oxidants playing multiple roles. Mild oxidants lead to the formation of a suboxide in the Ni, which suppresses the bulk diffusion of C species suggesting a surface growth mechanism. Moreover, the formation of a suboxide leads to enhanced catalytic activity at the substrate surface, which allows reduced synthesis temperatures, even as low as 700 °C. Even at these low temperatures, the quality of the graphene is exceedingly high as indicated by a negligible D mode in the Raman spectra. These findings suggest the use of mild oxidants in the CVD fabrication as a whole could have a positive impact
Measuring Compositions in Organic Depth Profiling: Results from a VAMAS Interlaboratory Study
We report the results of a VAMAS
(Versailles Project on Advanced
Materials and Standards) interlaboratory study on the measurement
of composition in organic depth profiling. Layered samples with known
binary compositions of Irganox 1010 and either Irganox 1098 or Fmoc-pentafluoro-l-phenylalanine in each layer were manufactured in a single
batch and distributed to more than 20 participating laboratories.
The samples were analyzed using argon cluster ion sputtering and either
X-ray photoelectron spectroscopy (XPS) or time-of-flight secondary
ion mass spectrometry (ToF-SIMS) to generate depth profiles. Participants
were asked to estimate the volume fractions in two of the layers and were provided with the compositions of all other layers. Participants using XPS provided volume fractions within 0.03 of the nominal values. Participants using ToF-SIMS either made no attempt, or used various methods that gave results ranging in error from 0.02 to over 0.10 in volume fraction, the latter representing a 50% relative error for a nominal volume fraction of 0.2. Error was predominantly caused by inadequacy in the ability to compensate for primary ion intensity variations and the matrix effect in SIMS. Matrix effects in these materials appear to be more pronounced as the number of atoms in both the primary analytical ion and the secondary ion increase. Using the participants’ data we show that organic SIMS matrix effects can be measured and are remarkably consistent between instruments. We provide recommendations for identifying and compensating for matrix effects. Finally, we demonstrate, using a simple normalization method, that virtually all ToF-SIMS participants could have obtained estimates of volume fraction that were at least as accurate and consistent as XPS