Adhesion and growth of electrically-active cortical neurons on polyethyleimine patterns microprinted on PEO-PPO-PEO triblockcopolymer-coated hydrophobic surfaces

This paper describes the adhesion and growth of dissociated cortical neurons on chemically patterned surfaces over a time period of 30 days. The presence of neurons was demonstrated by measurement of spontaneous bioelectrical activity on a micropatterned multielectrode array. Chemical patterns were prepared with a combination of neurophobic layers of polyethylenoxide-polypropylenoxide-polyethylenoxide (PEO-PPO-PEO) triblockcopolymers adsorbed onto hydrophobic surfaces and neurophilic microprinted tracks of polyethylenimine (PEI). Results showed that commercially available PEO-PPO-PEO triblockcopolymers F108 and F127 (Synperonics, ICI) significantly reduced the adhesion of neuronal tissue when adsorbed on hydrophobic Polyimide (PI) and Fluorocarbon (FC) surfaces over a time period of eight days. In general, both F108- and F127-coated PI displayed equal or better neurophobic background properties after 30 days. Viability of neuronal tissue after 30 days on PEI microprinted F108- and F127-coated PI was comparable with relatively high viability factors between 0.9 and 1 (scale from 0 to 1). Summarizing, the strategy to combine the neurophobic adsorbed triblock-copolymers F108 and F127 onto hydrophobic surfaces with neurophilic microprinted PEI resulted in relatively long-term neuronal pattern preservation with high numbers of viable neurons present after 30 days

Statistical Methods for the Qualitative Assessment of Dynamic Models with Time Delay (R Package qualV)

Results of ecological models differ, to some extent, more from measured data than from empirical knowledge. Existing techniques for validation based on quantitative assessments sometimes cause an underestimation of the performance of models due to time shifts, accelerations and delays or systematic differences between measurement and simulation. However, for the application of such models it is often more important to reproduce essential patterns instead of seemingly exact numerical values. This paper presents techniques to identify patterns and numerical methods to measure the consistency of patterns between observations and model results. An orthogonal set of deviance measures for absolute, relative and ordinal scale was compiled to provide informations about the type of difference. Furthermore, two different approaches accounting for time shifts were presented. The first one transforms the time to take time delays and speed differences into account. The second one describes known qualitative criteria dividing time series into interval units in accordance to their main features. The methods differ in their basic concepts and in the form of the resulting criteria. Both approaches and the deviance measures discussed are implemented in an R package. All methods are demonstrated by means of water quality measurements and simulation data. The proposed quality criteria allow to recognize systematic differences and time shifts between time series and to conclude about the quantitative and qualitative similarity of patterns

The compositional meaning of a detection limit

Conclusions The chemical interpretation of the detection limit and its stochastic model counterpart has thus different consequences for the statistical analysis than we would expect from the word by word interpretation of “below detection limit” as a concentration below some limit. The state of the art model on BDL compositional analysis is biased. Some ideas are not directly applicable to the true effects of measurement errors near the detection limit. Even the basic principles like subcompositional coherence and the requirement of the independence of the analysis from the total are not fully valid near the detection limit.Peer ReviewedPostprint (published version

The compositional meaning of a detection limit

In compositional data analysis a value below detection limit (BDL) is typically modeled as the definitive information that the actual value is below some fixed value - the detection limit (see e.g. Palarea- Albaladejo et. al (2007, 2008)). Analytical chemistry (Heinrichs and Herrmann (1990); Fletcher (1981); Kellner et al. (2004)) however has a different view on measured concentrations. The measured concentration Cm is not the true concentration cm of the measurant but a quantity computed from an observable quantity Om through a calibration equation

Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning

A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. Thereby apertures in a 100-500 nm thick low-stress silicon nitride membrane in the size range from 100 mum were made. The stencil device is mechanically fixed on the surface and used as miniature shadow mask during deposition of metal layers. Using this method, aluminum micro- and nanostructures as small as 100 nm in width were patterned. The deposited micro- and nano-scale structures were used as etch mask and transferred into a sub-layer (in our case silicon nitride) by dry plasma etching. High-resolution shadow masking can be used to create micro/nanoscale patterns on arbitrary substrates including mechanically fragile or chemically active surfaces. (C) 2003 Elsevier Science B.V. All rights reserved