Implant isolation of ZnO

We study ion-irradiation-induced electrical isolation in n-type single-crystal ZnO epilayers. Emphasis is given to improving the thermal stability of isolation and obtaining a better understanding of the isolation mechanism. Results show that an increase in the dose of 2 MeV ¹⁶Oions (up to ∼2 orders of magnitude above the threshold isolation dose) and irradiation temperature (up to 350 °C) has a relatively minor effect on the thermal stability of electrical isolation, which is limited to temperatures of ∼300–400 °C. An analysis of the temperature dependence of sheet resistance suggests that effective levels associated with irradiation-produced defects are rather shallow (<50 meV). For the case of implantation with keV Cr, Fe, or Niions, the evolution of sheet resistance with annealing temperature is consistent with defect-induced isolation, with a relatively minor effect of Cr, Fe, or Ni impurities on the thermal stability of isolation. Results also reveal a negligible ion-beam flux effect in the case of irradiation with 2 MeV 16Oions, supporting high diffusivity of ion-beam-generated defects during ion irradiation and a very fast stabilization of collision cascade processes in ZnO. Based on these results, the mechanism for electrical isolation in ZnO by ion bombardment is discussed

Thermal quenching of photoluminescence in ZnO/ZnMgO multiple quantum wells following oxygen implantation and rapid thermal annealing

The temperature-dependent photoluminescence in oxygen-implanted and rapid thermally annealed ZnO/ZnMgO multiple quantum wells is investigated. A difference in the thermal quenching of the photoluminescence is found between the implanted and unimplanted quantum wells. Oxygen implantation and subsequent rapid thermal annealing results in the diffusion of magnesium atoms into quantum wells and thus, leads to an increased fluctuation in the potential of the quantum wells and the observation of a large thermal activation energy. However, a high dose of implantation results in large defect clusters and thus an additional nonradiative channel, which leads to a flat potential fluctuation and a small thermal activation energy

Polarity-dependence of the defect formation in c-axis oriented ZnO by the irradiation of an 8 MeV proton beam

The polarity dependence of the radiation hardness of single-crystalline ZnO bulk crystals is studied by irradiating the Zn-polar and O-polar c-planes with an 8 MeV proton beam up to the fluence of 4.2 × 1016 p/cm2. To analyze the hardness, radiation-induced defects were evaluated using positron annihilation (PA) analysis, and the recovery by post-annealing was examined using continuous-wave photoluminescence (PL) and time-resolved photoluminescence (TRPL) measurements. It was suggested by the PA and PL analyses that the major defects in both polarities were VZnVO divacancies. While the PA data did not show the clear dependence on the polarity, the PL and TRPL results showed that the Zn-polar c-plane had a little higher radiation tolerance than that of the O-polar c-plane, which was consistent with the result that the increase in the electrical resistance by proton beam irradiation was smaller for the former one. Considering these results in total, the polarity dependence is considered to be not so large, but the Zn-polar c-plane has a little higher tolerance than that of the O-polar one

Characteristics of an Extended Gate Field-Effect Transistor for Glucose Sensing Using an Enzyme-Containing Silk Fibroin Membrane as the Bio-Chemical Component

The characteristics of a glucose sensor based on an ion-sensitive TiO2/Ti extended gate electrode field-effect transistor (EGFET) are reported. A glucose oxidase-containing silk fibroin membrane was immobilized on a TiO2/Ti surface as the bio-sensing component. This EGFET-type biosensor was estimated to be able to detect a glucose concentration as low as 0.001 mg/mL in an aqueous electrolyte, which enables the sensing of glucose in the saliva and sweat. The endurance of this sensor was also examined, and it was found that the retention time of the original sensitivity for repeated use at room temperature was more than 30 days, with a high heat tolerance temperature close to 60 &deg;C