A novel fabrication process for capacitive cantilever structures for smart fabric applications

This paper reports, for the first time, capacitive freestanding cantilever beams fabricated by screen printing sacrificial and structural materials onto a fabric/textile. Unlike traditional weaving process, the device will be screen printed layer by layer with desired pattern onto the fabric substrate. Free standing structures will be fabricated directly onto fabrics rather than other methods such as bonding or embedding. In addition, a low temperature removable sacrificial material capable for the removal conditions on fabrics will also be reported

Low loss high index contrast nanoimprinted polysiloxane waveguides

Nanoimprint lithography is gaining rapid acceptance in fields as diverse as microelectronics and microfluidics due to its simplicity high resolution and low cost. These properties are critically important for the fabrication of photonic devices, where cost is often the major inhibiting deployment factor for high volume applications. We report here on the use of nanoimprint technology to fabricate low loss broadband high index contrast waveguides in a Polysiloxane polymer system for the first time