21 research outputs found
Visualization 1.mp4
Modes transformation of the elliptic perfect optical vortex modulated by the scaling factor m
Supplementary document for Generation of discrete higher-order optical vortex lattice at focus - 6535639.pdf
Response to reviewers’ comments_Supplementary materia
Supplementary Material_OL_Revised.docx
Response to reviewers’ comments_Supplementary materia
The complete chloroplast genome of <i>Meconopsis bella</i> Prain 1894 (Papaveraceae), a high-altitude plant distributed on the Qinghai-Tibet plateau
Meconopsis bella Prain 1894 (M. bella) is a rare herb within the family Papaveraceae of which unique and gorgeous purple flowers are blooming in the flowering phase. In this study, we reported the complete chloroplast (cp) genome of M. bella, which was mainly distributed on the Qinghai-Tibet plateau. The complete chloroplast genome sequence of M. bella was 153,073 bp in size and was characterized by a typical quadripartite structure consisting of a large single-copy (LSC) region of 83,562 bp, a small single-copy (SSC) region of 178,33 bp and two identical inverted repeats (IR) regions of 25,839 bp. The genome contained 133 genes, including 88 protein-encoding genes, eight ribosomal RNA genes, and 37 transfer RNA genes. Phylogenetic analysis based on the maximum-likelihood (ML) method showed that M. bella was closely related to M. paniculate and M. pinnatifolia within the genus Meconopsis.</p
Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering
<div><p>NiO thin films were deposited on Si and Corning 1737 glass substrates using radio frequency (rf) magnetron sputtering system. The physical properties of NiO films under different sputtering power were thoroughly studied. The XRD results indicated that as-prepared NiO films with the sputtering power above 100 W developed only (200) preferred orientation. The AFM results showed that the NiO films were composed of different-size NiO nano-grains and the grain size increased with increasing the sputtering power. The samples marked A-E under the sputtering power of 80, 100, 120, 140 and 160 W have optical band gap values of 3.70, 3.65, 3.50, 3.45 and 3.44 eV, respectively. Comparatively, the controllable electrical properties of the films could be achieved by the variation of crystal quality arises from the sputtering power.</p></div
Sequencing coverage of each gene.
<p>The coverage of the protein-coding sequence of each gene of interest is tabulated, as a percentage, for a range of sequencing depths (≥1x, 10x, 20x, 30x, 50x and 100x reads).</p