1 research outputs found
Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae
The
directed self-assembly (DSA) and pattern transfer of polyÂ(5-vinyl-1,3-benzodioxole-<i>block</i>-pentamethyldisilylstyrene) (PVBD-<i>b</i>-PDSS) is reported. Lamellae-forming PVBD-<i>b</i>-PDSS
can form well resolved 5 nm (half-pitch) features in thin films with
high etch selectivity. Reactive ion etching was used to selectively
remove the PVBD block, and fingerprint patterns were subsequently
transferred into an underlying chromium hard mask and carbon layer.
DSA of the block copolymer (BCP) features resulted from orienting
PVBD-<i>b-</i>PDSS on guidelines patterned by nanoimprint
lithography. A density multiplication factor of 4× was achieved
through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning
tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS)
was used to analyze the BCP profile in the DSA samples. Wetting layers
of parallel orientation were observed to form unless the bottom and
top surface were neutralized with a surface treatment and top coat,
respectively