7 research outputs found
Efficient Hydrogen Evolution by Mechanically Strained MoS<sub>2</sub> Nanosheets
We
demonstrated correlations
between mechanically bent tensile-strain-induced two-dimensional MoS<sub>2</sub> nanosheets (NSs) and their electrochemical activities toward
the hydrogen evolution reaction (HER). The tensile-strain-induced
MoS<sub>2</sub> NSs showed significantly steeper polarization curves
and lower Tafel slopes than the strain-free ones, which is consistent
with the simple d-band model. Furthermore, the mechanical strain increased
the electrochemical activities of all the NSs toward the HER except
those loaded with high MoS<sub>2</sub> mass. Mechanically bending
MoS<sub>2</sub> NSs to induce tensile strain enables the production
of powerful, efficient electrocatalysis systems for evolving hydrogen
Playing with Dimensions: Rational Design for Heteroepitaxial p–n Junctions
A design for a heteroepitaxial junction by the way of
one-dimensional
wurzite on a two-dimensional spinel structure in a low-temperature
solution process was introduced, and it's capability was confirmed
by successful fabrication of a diode consisting of p-type cobalt oxide
(Co<sub>3</sub>O<sub>4</sub>) nanoplate/n-type zinc oxide (ZnO) nanorods,
showing reasonable electrical performance. During thermal decomposition,
the 30° rotated lattice orientation of Co<sub>3</sub>O<sub>4</sub> nanoplates from the orientation of β-CoÂ(OH)<sub>2</sub> nanoplates
was directly observed using high-resolution transmission electron
microscopy. The epitaxial relations and the surface stress-induced
ZnO nanowire growth on Co<sub>3</sub>O<sub>4</sub> were well supported
using the first-principles calculations. Over the large area, (0001)
preferred oriented ZnO nanorods epitaxially grown on the (111) plane
of Co<sub>3</sub>O<sub>4</sub> nanoplates were experimentally obtained.
Using this epitaxial p–n junction, a diode was fabricated.
The ideality factor, turn-on voltage, and rectifying ratio of the
diode were measured to be 2.38, 2.5 V and 10<sup>4</sup>, respectively
Playing with Dimensions: Rational Design for Heteroepitaxial p–n Junctions
A design for a heteroepitaxial junction by the way of
one-dimensional
wurzite on a two-dimensional spinel structure in a low-temperature
solution process was introduced, and it's capability was confirmed
by successful fabrication of a diode consisting of p-type cobalt oxide
(Co<sub>3</sub>O<sub>4</sub>) nanoplate/n-type zinc oxide (ZnO) nanorods,
showing reasonable electrical performance. During thermal decomposition,
the 30° rotated lattice orientation of Co<sub>3</sub>O<sub>4</sub> nanoplates from the orientation of β-CoÂ(OH)<sub>2</sub> nanoplates
was directly observed using high-resolution transmission electron
microscopy. The epitaxial relations and the surface stress-induced
ZnO nanowire growth on Co<sub>3</sub>O<sub>4</sub> were well supported
using the first-principles calculations. Over the large area, (0001)
preferred oriented ZnO nanorods epitaxially grown on the (111) plane
of Co<sub>3</sub>O<sub>4</sub> nanoplates were experimentally obtained.
Using this epitaxial p–n junction, a diode was fabricated.
The ideality factor, turn-on voltage, and rectifying ratio of the
diode were measured to be 2.38, 2.5 V and 10<sup>4</sup>, respectively
Self-Seeded Growth of Poly(3-hexylthiophene) (P3HT) Nanofibrils by a Cycle of Cooling and Heating in Solutions
In spite of the recent successes in transistors and solar
cells
utilizing polyÂ(3-hexylthiophene) (P3HT) nanofibrils, systematic analysis
on the growth kinetics has not been reported due to the lack of analytical
tools. This study proposed a simple spectroscopic method to obtain
the crystallinity of P3HT in solutions. On the basis of the analytical
approach, we found that the crystallinity hysteresis upon temperature
is a simple function of the solubility parameter difference (Δδ)
between the P3HT and the solvents. When Δδ ≥ 0.7,
a cooling (−20 °C)-and-heating (25 °C) process allowed
the preparation of solutions including 1D crystal seeds dispersed
in the solution. Simple coating of the seeded solutions completed
the growth of the seeds into long nanofibrils at the early stage of
the coating and thereby achieved almost 100% crystallinity in the
resulting films without any postannealing process. The existence of
PCBM for bulk-heterojunction (BHJ) solar cells did not affect the
nucleation and growth of the nanofibrils during the cooling-and-heating
process. The solar cells prepared from the solutions with Δδ
≥ 0.7 had solar conversion efficiencies higher than the conventional
thermally annealed cells
Boron-Doped Peroxo-Zirconium Oxide Dielectric for High-Performance, Low-Temperature, Solution-Processed Indium Oxide Thin-Film Transistor
We developed a solution-processed
indium oxide (In<sub>2</sub>O<sub>3</sub>) thin-film transistor (TFT)
with a boron-doped peroxo-zirconium (ZrO<sub>2</sub>:B) dielectric
on silicon as well as polyimide substrate at 200 °C, using water
as the solvent for the In<sub>2</sub>O<sub>3</sub> precursor. The
formation of In<sub>2</sub>O<sub>3</sub> and ZrO<sub>2</sub>:B films
were intensively studied by thermogravimetric differential thermal
analysis (TG-DTA), attenuated total reflectance Fourier transform
infrared spectroscopy (ATR-FT IR), high-resolution X-ray diffraction
(HR-XRD), and X-ray photoelectron spectroscopy (XPS). Boron was selected
as a dopant to make a denser ZrO<sub>2</sub> film. The ZrO<sub>2</sub>:B film effectively blocked the leakage current at 200 °C with
high breakdown strength. To evaluate the ZrO<sub>2</sub>:B film as
a gate dielectric, we fabricated In<sub>2</sub>O<sub>3</sub> TFTs
on the ZrO<sub>2</sub>:B dielectrics with silicon substrates and annealed
the resulting samples at 200 and 250 °C. The resulting mobilities
were 1.25 and 39.3 cm<sup>2</sup>/(V s), respectively. Finally, we
realized a flexible In<sub>2</sub>O<sub>3</sub> TFT with the ZrO<sub>2</sub>:B dielectric on a polyimide substrate at 200 °C, and
it successfully operated a switching device with a mobility of 4.01
cm<sup>2</sup>/(V s). Our results suggest that aqueous solution-processed
In<sub>2</sub>O<sub>3</sub> TFTs on ZrO<sub>2</sub>:B dielectrics
could potentially be used for low-cost, low-temperature, and high-performance
flexible devices
Effects of Solution Temperature on Solution-Processed High-Performance Metal Oxide Thin-Film Transistors
Herein,
we report a novel and easy strategy for fabricating solution-processed
metal oxide thin-film transistors by controlling the dielectric constant
of H<sub>2</sub>O through manipulation of the metal precursor solution
temperature. As a result, indium zinc oxide (IZO) thin-film transistors
(TFTs) fabricated from IZO solution at 4 °C can be operated after
annealing at low temperatures (∼250 °C). In contrast,
IZO TFTs fabricated from IZO solutions at 25 and 60 °C must be
annealed at 275 and 300 °C, respectively. We also found that
IZO TFTs fabricated from the IZO precursor solution at 4 °C had
the highest mobility of 12.65 cm<sup>2</sup>/(V s), whereas the IZO
TFTs fabricated from IZO precursor solutions at 25 and 60 °C
had field-effect mobility of 5.39 and 4.51 cm<sup>2</sup>/(V s), respectively,
after annealing at 350 °C. When the IZO precursor solution is
at 4 °C, metal cations such as indium (In<sup>3+</sup>) and zinc
ions (Zn<sup>2+</sup>) can be fully surrounded by H<sub>2</sub>O molecules,
because of the higher dielectric constant of H<sub>2</sub>O at lower
temperatures. These chemical complexes in the IZO precursor solution
at 4 °C are advantageous for thermal hydrolysis and condensation
reactions yielding a metal oxide lattice, because of their high potential
energies. The IZO TFTs fabricated from the IZO precursor solution
at 4 °C had the highest mobility because of the formation of
many metal–oxygen–metal (M-O-M) bonds under these conditions.
In these bonds, the ns-orbitals of the metal cations overlap each
other and form electron conduction pathways. Thus, the formation of
a high proportion of M-O-M bonds in the IZO thin films is advantageous
for electron conduction, because oxide lattices allow electrons to
travel easily through the IZO
Highly Bendable Large-Area Printed Bulk Heterojunction Film Prepared by the Self-Seeded Growth of Poly(3-hexylthiophene) Nanofibrils
Applying conventional printing technologies
to fabricate large-area
flexible bulk heterojunction (BHJ) solar cells is of great interest.
Achieving this task requires (i) large tolerance of the maximum photoconversion
efficiency (PCE) to the film thickness, (ii) fast hole transport in
both the thickness and lateral directions of the BHJ layer, and (iii)
improved stability against bending and heat. This paper demonstrates
that a P3HT:PCBM BHJ layer made of long P3HT nanofibrils of almost
100% crystallinity can be an excellent approach to achieve large-area
printed solar cells. We applied a cool-and-heat (C&H) process
with a P3HT/PCBM <i>m</i>-xylene solution to generate P3HT:PCBM
nanofibril composite films. We found that the hole transport of the
nanofibril composite was 2.6 times faster in the thickness direction
and 6.5 times more conductive in the in-plane direction compared with
conventionally annealed composites. The fast hole transport in the
thickness direction led to negligible dependence of the PCE on the
thickness of the composite layer. The improved conductivity in the
in-plane direction prevented the sharp drop of the PCE as the active
area increased. Taking advantage of the unique characteristics, we
employed a roll-printing method to fabricate large-area unit solar
cells in air. In addition, the curved contour path of the nanofibrils
provided excellent stability against large bending strains, allowing
the production of highly bendable organic solar cells