Positive Definite Tensors to Nonlinear Complementarity Problems

The main purpose of this note is to investigate some kinds of nonlinear complementarity problems (NCP). For the structured tensors, such as, symmetric positive definite tensors and copositive tensors, we derive the existence theorems on a solution of these kinds of nonlinear complementarity problems. We prove that a unique solution of the NCP exists under the condition of diagonalizable tensors.Comment: 11 page

Revealing Tripartite Quantum Discord with Tripartite Information Diagram

A new measure based on the tripartite information diagram is proposed for identifying quantum discord in tripartite systems. The proposed measure generalizes the mutual information underlying discord from bipartite to tripartite systems, and utilizes both one-particle and two-particle projective measurements to reveal the characteristics of the tripartite quantum discord. The feasibility of the proposed measure is demonstrated by evaluating the tripartite quantum discord for systems with states close to Greenberger-Horne-Zeilinger, W, and biseparable states. In addition, the connections between tripartite quantum discord and two other quantum correlations---namely genuine tripartite entanglement and genuine tripartite Einstein-Podolsky-Rosen steering---are briefly discussed. The present study considers the case of quantum discord in tripartite systems. However, the proposed framework can be readily extended to general N-partite systems

Deuteron production and elliptic flow in relativistic heavy ion collisions

The hadronic transport model \textsc{art} is extended to include the production and annihilation of deuterons via the reactions $BB \leftrightarrow dM$, where $B$ and $M$ stand for baryons and mesons, respectively, as well as their elastic scattering with mesons and baryons in the hadronic matter. This new hadronic transport model is then used to study the transverse momentum spectrum and elliptic flow of deuterons in relativistic heavy ion collisions, with the initial hadron distributions after hadronization of produced quark-gluon plasma taken from a blast wave model. The results are compared with those measured by the PHENIX and STAR Collaborations for Au+Au collisions at $\sqrt{s_{NN}^{}} = 200$ GeV, and also with those obtained from the coalescence model based on freeze-out nucleons in the transport model.Comment: 9 pages, 10 figures, REVTeX, version to be published in Phys. Rev.

Synergy between chemical dissolution and mechanical abrasion during chemical mechanical polishing of copper

Chemical mechanical planarization (CMP) is a mainstream semiconductor processing method for achieving local and global wafer planarization. However, the CMP process fundamentals are poorly understood, and thereby inhibit migratability of lab-scale experiments to production processes. This work addresses the synergistic role of chemical dissolution rate (CDR) and mechanical abrasion rate (MAR) on the material removal mechanisms during CMP process.;A set of nano-wear experiments on elecro-plated copper surfaces are conducted with systematic exposure to active slurry. Initial results of in situ wear test in chemically active slurry showed an increased material removal rate (MRR) relative to a dry wear test. A phenomenological MRR model based on scratch-intersections was formulated to understand the role of consumables and the process parameters. To further understand the synergistic effects between CDR and MAR, two plausible mechanisms of material removal are investigated. Mechanism-I is based on chemical dissolution enhancing MAR. A soft layer of chemical products is assumed to be formed on top of the polished surface due to chemical reaction with a rate much faster than the MAR. It is then followed by a gentle mechanical abrasion of that soft layer. It is found that, for pure copper exposed to ammonium hydroxide, the yield strength of film is about 50% of the substrate yield strength; the modulus of film is about 20% of the substrate modulus. The film thickness is found to be in the order of few nanometers, and increases with the exposure time according to first order linear kinetics. Mechanism-II is based on mechanical abrasion accelerating CDR. In this case, the nano-wear experiment is first performed to generate local variation of the residual stress levels, and then followed by chemical exposure to investigate the variation of the wear depth and the evolution of surface topography. It is found that the residual stress caused by the mechanical wear enhances the CDR, as manifested by the increase of wear depth.;The developed understanding from these experiments can be used in future studies to control the relative rates of CDR and MAR as well as investigating the various process-induced defects

ZnMgTe/ZnTe 導波路の作製と高性能電気光学効果デバイスの開発

早大学位記番号:新7502早稲田大

Complete Street Design

Complete Streets refers to a national movement that promotes street and road designs accommodating all users. Typical components of a complete street accommodate pedestrians, bicyclists, transit users, motor vehicles and trucks. In America, as well as across South Carolina, there is an increased awareness of the environment and how our habits and decisions can positively or negatively affect area waterways, wildlife, and air quality. Bike to Work Day and Walk to School Day are just two national efforts that get people out of their cars and into their communities, so as to become more physically active and to reduce their impact upon air pollution. In this project, the researcher selected 3 different streets in Greenville to redesign by complete street design tools. Firstly, the researcher conducted onsite analysis and literature review to establish the cultural significance of the selected site and city. Then, case studies in the United States and Europe were used to help frame strategies that these cases could be employed to increase the safety and convenience for all users. Finally, a series of design aiming to support the concept of complete street and showing how those streets could be transferred into public places or green spaces