22 research outputs found
Development of a 0.15 Ī¼m GaAs pHEMT Process Design Kit for Low-Noise Applications
This work presents a process design kit (PDK) for a 0.15 Ī¼m GaAs pHEMT process for low-noise MMIC applications developed for AWR Microwave Office (MWO). A complete set of basic elements is proposed, such as TaN thin film resistors and mesa-resistors, capacitors, inductors, and transistors. The developed PDK can be used in technology transfer or education
Erratum to: Nonuniversal Scaling Behavior of Conductivity Peak Widths in the Quantum Hall Effect in InGaAs/InAlAs Structures (Semiconductors, (2018), 52, 12, (1551-1558), 10.1134/S1063782618120102)
The name of the third author should read E. V. Ilchenko. Ā© 2018, Pleiades Publishing, Ltd