On Both Spatial And Velocity Distribution Of Sputtered Particles In Magnetron Discharge

The kinetics of the sputtered atoms from the metallic target as well as the time-space distribution of the argon metastable atoms have been investigated for DC and high power pulse magnetron discharge by means of Tunable Diode – Laser Absorption Spectroscopy (TD-LAS) and Tunable Diode – Laser Induced Fluorescence (TD-LIF). The discharge was operated in argon (5-30 mTorr) with two different targets, tungsten and aluminum, for pulses of 1 to 20 μs, at frequencies of 0.2 to 1 kHz. Peak current intensity of ~100 A has been attained at cathode peak voltage of ~1 kV. The mean velocity distribution functions and particle fluxes of the sputtered metal atoms, in parallel and perpendicular direction to the target, have been obtained and compared for DC and pulse mode

Magnetic properties of Fe-based amorphous thin films

Results on the bulk and surface magnetic behavior of Fe-Si-B-C amorphous thin films, with thickness in the range of 80 – 250 nm, deposited onto glass substrates using RF sputtering and pulsed laser deposition techniques are presented. In the as-deposited state the coercivity of the samples prepared by pulsed laser deposition is higher than of the RF sputtered samples. The obtained results show a small difference between bulk and surface magnetic behaviour. The thermal treatments reduce both surface and bulk coercivity values