3 research outputs found
ΠΠ΅ΡΠΎΠ΄Ρ ΠΏΠΎΠ»ΡΡΠ΅Π½ΠΈΡ ΡΡΠΈΡ Π»ΠΎΡΡΠΈΠ»Π°Π½Π° Π΄Π»Ρ ΠΏΡΠΎΠΈΠ·Π²ΠΎΠ΄ΡΡΠ²Π° ΠΏΠΎΠ»ΠΈΠΊΡΠΈΡΡΠ°Π»Π»ΠΈΡΠ΅ΡΠΊΠΎΠ³ΠΎ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ
Novel technical solutions and ideas for increasing the yield of solar and semiconductor grade polycrystalline silicon processes have been analyzed. The predominant polycrystalline silicon technology is currently still the Siemens process including the conversion of technical grade silicon (synthesized by carbon-thermal reduction of quartzites) to trichlorosilane followed by rectification and hydrogen reduction. The cost of product silicon can be cut down by reducing the trichlorosilane synthesis costs through process and equipment improvement. Advantages, drawbacks and production cost reduction methods have been considered with respect to four common trichlorosilane synthesis processes: hydrogen chloride exposure of technical grade silicon (direct chlorination, DC), homogeneous hydration of tetrachlorosilane (conversion), tetrachlorosilane and hydrogen exposure of silicon (hydro chlorination silicon, HC), and catalyzed tetrachlorosilane and dichlorosilane reaction (redistribution of anti-disproportioning reaction). These processes remain in use and are permanently improved. Catalytic processes play an important role on silicon surface, and understanding their mechanisms can help find novel applications and obtain new results. It has been noted that indispensable components of various equipment and process designs are recycling steps and combined processes including active distillation. They provide for the most complete utilization of raw trichlorosilane, increase the process yield and cut down silicon costΠ ΡΠ°Π±ΠΎΡΠ΅ ΠΏΡΠΎΠ²Π΅Π΄Π΅Π½ Π°Π½Π°Π»ΠΈΠ· Π½ΠΎΠ²ΡΡ
ΡΠ΅Ρ
Π½ΠΈΡΠ΅ΡΠΊΠΈΡ
ΡΠ΅ΡΠ΅Π½ΠΈΠΉ ΠΈ ΠΈΠ΄Π΅ΠΉ, Π½Π°ΠΏΡΠ°Π²Π»Π΅Π½Π½ΡΡ
Π½Π° ΠΏΠΎΠ²ΡΡΠ΅Π½ΠΈΠ΅ ΠΏΡΠΎΠΈΠ·Π²ΠΎΠ΄ΠΈΡΠ΅Π»ΡΠ½ΠΎΡΡΠΈ ΠΏΡΠΎΡΠ΅ΡΡΠΎΠ² ΠΏΠΎΠ»ΡΡΠ΅Π½ΠΈΡ ΠΏΠΎΠ»ΠΈΠΊΡΠΈΡΡΠ°Π»Π»ΠΈΡΠ΅ΡΠΊΠΎΠ³ΠΎ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ Β«ΡΠΎΠ»Π½Π΅ΡΠ½ΠΎΠ³ΠΎΒ» ΠΈ ΠΏΠΎΠ»ΡΠΏΡΠΎΠ²ΠΎΠ΄Π½ΠΈΠΊΠΎΠ²ΠΎΠ³ΠΎ ΠΊΠ°ΡΠ΅ΡΡΠ²Π°. ΠΠΎΠΌΠΈΠ½ΠΈΡΡΡΡΠ΅ΠΉ ΡΠ΅Ρ
Π½ΠΎΠ»ΠΎΠ³ΠΈΠ΅ΠΉ ΠΏΠΎΠ»ΠΈΠΊΡΠΈΡΡΠ°Π»Π»ΠΈΡΠ΅ΡΠΊΠΎΠ³ΠΎ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ ΠΎΡΡΠ°Π΅ΡΡΡ Π‘ΠΈΠΌΠ΅Π½Ρ-ΠΏΡΠΎΡΠ΅ΡΡ, Π²ΠΊΠ»ΡΡΠ°ΡΡΠΈΠΉ ΠΏΠ΅ΡΠ΅Π²ΠΎΠ΄ ΡΠ΅Ρ
Π½ΠΈΡΠ΅ΡΠΊΠΎΠ³ΠΎ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ (ΠΏΠΎΠ»ΡΡΠ°Π΅ΠΌΠΎΠ³ΠΎ ΠΊΠ°ΡΠ±ΠΎΡΠ΅ΡΠΌΠΈΡΠ΅ΡΠΊΠΈΠΌ Π²ΠΎΡΡΡΠ°Π½ΠΎΠ²Π»Π΅Π½ΠΈΠ΅ΠΌ ΠΊΠ²Π°ΡΡΠΈΡΠΎΠ²) Π² ΡΡΠΈΡ
Π»ΠΎΡΡΠΈΠ»Π°Π½ Ρ ΠΏΠΎΡΠ»Π΅Π΄ΡΡΡΠΈΠΌΠΈ ΡΠ΅ΠΊΡΠΈΡΠΈΠΊΠ°ΡΠΈΠΎΠ½Π½ΠΎΠΉ ΠΎΡΠΈΡΡΠΊΠΎΠΉ ΠΈ Π²ΠΎΠ΄ΠΎΡΠΎΠ΄Π½ΡΠΌ Π²ΠΎΡΡΡΠ°Π½ΠΎΠ²Π»Π΅Π½ΠΈΠ΅ΠΌ. ΠΠ»Ρ ΡΠ½ΠΈΠΆΠ΅Π½ΠΈΡ ΡΡΠΎΠΈΠΌΠΎΡΡΠΈ ΠΏΠΎΠ»ΡΡΠ°Π΅ΠΌΠΎΠ³ΠΎ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ Π½Π΅ΠΎΠ±Ρ
ΠΎΠ΄ΠΈΠΌΠΎ ΡΠΌΠ΅Π½ΡΡΠ°ΡΡ Π·Π°ΡΡΠ°ΡΡ Π½Π° ΠΏΡΠΎΠΈΠ·Π²ΠΎΠ΄ΡΡΠ²ΠΎ ΡΡΠΈΡ
Π»ΠΎΡΡΠΈΠ»Π°Π½Π° ΠΏΡΡΠ΅ΠΌ ΡΠΎΠ²Π΅ΡΡΠ΅Π½ΡΡΠ²ΠΎΠ²Π°Π½ΠΈΡ ΡΠ΅Ρ
Π½ΠΎΠ»ΠΎΠ³ΠΈΠΈ ΠΈ Π°ΠΏΠΏΠ°ΡΠ°ΡΡΡΠ½ΠΎΠ³ΠΎ ΠΎΡΠΎΡΠΌΠ»Π΅Π½ΠΈΡ. Π Π°ΡΡΠΌΠΎΡΡΠ΅Π½Ρ ΠΏΡΠ΅ΠΈΠΌΡΡΠ΅ΡΡΠ²Π°, Π½Π΅Π΄ΠΎΡΡΠ°ΡΠΊΠΈ ΠΈ ΠΏΡΡΠΈ ΡΠ½ΠΈΠΆΠ΅Π½ΠΈΡ ΠΏΡΠΎΠΈΠ·Π²ΠΎΠ΄ΡΡΠ²Π΅Π½Π½ΡΡ
Π·Π°ΡΡΠ°Ρ ΡΠ΅ΡΡΡΠ΅Ρ
ΠΈΠ·Π²Π΅ΡΡΠ½ΡΡ
ΠΌΠ΅ΡΠΎΠ΄ΠΎΠ² ΠΏΠΎΠ»ΡΡΠ΅Π½ΠΈΡ ΡΡΠΈΡ
Π»ΠΎΡΡΠΈΠ»Π°Π½Π°: Π²Π·Π°ΠΈΠΌΠΎΠ΄Π΅ΠΉΡΡΠ²ΠΈΠ΅ΠΌ Ρ
Π»ΠΎΡΠΈΡΡΠΎΠ³ΠΎ Π²ΠΎΠ΄ΠΎΡΠΎΠ΄Π° Ρ ΡΠ΅Ρ
Π½ΠΈΡΠ΅ΡΠΊΠΈΠΌ ΠΊΡΠ΅ΠΌΠ½ΠΈΠ΅ΠΌ Β«direct chlorinationΒ» (DC), Π³ΠΎΠΌΠΎΠ³Π΅Π½Π½ΡΠΌ Π³ΠΈΠ΄ΡΠΈΡΠΎΠ²Π°Π½ΠΈΠ΅ΠΌ ΡΠ΅ΡΡΠ°Ρ
Π»ΠΎΡΡΠΈΠ»Π°Π½Π° (ΠΊΠΎΠ½Π²Π΅ΡΡΠΈΠ΅ΠΉ), ΡΠ΅Π°ΠΊΡΠΈΠ΅ΠΉ ΡΠ΅ΡΡΠ°Ρ
Π»ΠΎΡΡΠΈΠ»Π°Π½Π° ΠΈ Π²ΠΎΠ΄ΠΎΡΠΎΠ΄Π° Ρ ΠΊΡΠ΅ΠΌΠ½ΠΈΠ΅ΠΌ Β«hydro chlorination siliconΒ» (HC), Π° ΡΠ°ΠΊΠΆΠ΅ Π²Π·Π°ΠΈΠΌΠΎΠ΄Π΅ΠΉΡΡΠ²ΠΈΠ΅ΠΌ ΡΠ΅ΡΡΠ°Ρ
Π»ΠΎΡΡΠΈΠ»Π°Π½Π° ΠΈ Π΄ΠΈΡ
Π»ΠΎΡΡΠ»Π°Π½Π° Π² ΠΏΡΠΈΡΡΡΡΡΠ²ΠΈΠΈ ΠΊΠ°ΡΠ°Π»ΠΈΠ·Π°ΡΠΎΡΠ° (ΡΠ΅Π°ΠΊΡΠΈΠ΅ΠΉ ΠΏΠ΅ΡΠ΅ΡΠ°ΡΠΏΡΠ΅Π΄Π΅Π»Π΅Π½ΠΈΡ ΠΈΠ»ΠΈ Π°Π½ΡΠΈ-Π΄ΠΈΡΠΏΡΠΎΠΏΠΎΡΡΠΈΠΎΠ½ΠΈΡΠΎΠ²Π°Π½ΠΈΡ). ΠΡΠΈ ΠΌΠ΅ΡΠΎΠ΄Ρ ΠΎΡΡΠ°ΡΡΡΡ Π°ΠΊΡΡΠ°Π»ΡΠ½ΡΠΌΠΈ ΠΈ ΠΏΠΎΡΡΠΎΡΠ½Π½ΠΎ ΡΠΎΠ²Π΅ΡΡΠ΅Π½ΡΡΠ²ΡΡΡΡΡ. ΠΠΎΠ»ΡΡΡΡ ΡΠΎΠ»Ρ ΠΈΠ³ΡΠ°ΡΡ ΠΊΠ°ΡΠ°Π»ΠΈΡΠΈΡΠ΅ΡΠΊΠΈΠ΅ ΠΏΡΠΎΡΠ΅ΡΡΡ Π½Π° ΠΏΠΎΠ²Π΅ΡΡ
Π½ΠΎΡΡΠΈ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ, ΠΏΠΎΠ½ΠΈΠΌΠ°Π½ΠΈΠ΅ ΠΌΠ΅Ρ
Π°Π½ΠΈΠ·ΠΌΠ° ΠΊΠΎΡΠΎΡΡΡ
ΠΏΠΎΠ·Π²ΠΎΠ»ΠΈΡ Π½Π°ΠΉΡΠΈ Π½ΠΎΠ²ΡΠ΅ ΠΏΡΠΈΠ»ΠΎΠΆΠ΅Π½ΠΈΡ ΠΈ ΠΏΠΎΠ»ΡΡΠΈΡΡ Π½ΠΎΠ²ΡΠ΅ ΡΠ΅Π·ΡΠ»ΡΡΠ°ΡΡ. ΠΡΠΌΠ΅ΡΠ΅Π½ΠΎ, ΡΡΠΎ Π½Π΅ΠΎΠ±Ρ
ΠΎΠ΄ΠΈΠΌΡΠΌΠΈ ΡΠ»Π΅ΠΌΠ΅Π½ΡΠ°ΠΌΠΈ Π°ΠΏΠΏΠ°ΡΠ°ΡΡΡΠ½ΠΎ-ΡΠ΅Ρ
Π½ΠΎΠ»ΠΎΠ³ΠΈΡΠ΅ΡΠΊΠΈΡ
ΡΡ
Π΅ΠΌ ΡΠ²Π»ΡΡΡΡΡ ΡΠ΅ΡΠΈΠΊΠ»Ρ ΠΈ ΡΠΎΠ²ΠΌΠ΅ΡΠ΅Π½Π½ΡΠ΅ ΠΏΡΠΎΡΠ΅ΡΡΡ, Π² ΡΠΎΠΌ ΡΠΈΡΠ»Π΅ ΡΠ΅Π°ΠΊΡΠΈΠ²Π½Π°Ρ Π΄ΠΈΡΡΠΈΠ»Π»ΡΡΠΈΡ. ΠΡΠΎ ΠΏΠΎΠ·Π²ΠΎΠ»ΡΠ΅Ρ Π½Π°ΠΈΠ±ΠΎΠ»Π΅Π΅ ΠΏΠΎΠ»Π½ΠΎ ΠΈΡΠΏΠΎΠ»ΡΠ·ΠΎΠ²Π°ΡΡ ΠΈΡΡ
ΠΎΠ΄Π½ΡΠΉ ΡΡΠΈΡ
Π»ΠΎΡΡΠΈΠ»Π°Π½, ΠΏΠΎΠ»ΡΡΠ°ΡΡ ΠΏΠΎΠ»Π΅Π·Π½ΡΠ΅ ΠΏΡΠΎΠ΄ΡΠΊΡΡ ΠΈ ΡΠ½ΠΈΠΆΠ°ΡΡ ΡΡΠΎΠΈΠΌΠΎΡΡΡ ΠΈΠ·Π³ΠΎΡΠ°Π²Π»ΠΈΠ²Π°Π΅ΠΌΠΎΠ³ΠΎ ΠΊΡΠ΅ΠΌΠ½ΠΈΡ
Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 1: Direct synthesis
Novel technical solutions and ideas for increasing the yield of solar and semiconductor grade polycrystalline silicon processes have been analyzed. The predominant polycrystalline silicon technology is currently still the Siemens process including the conversion of technical grade silicon (synthesized by carbon-thermal reduction of quartzites) to trichlorosilane followed by rectification and hydrogen reduction. The cost of product silicon can be cut down by reducing the trichlorosilane synthesis costs through process and equipment improvement. Advantages, drawbacks and production cost reduction methods have been considered with respect to four common trichlorosilane synthesis processes: hydrogen chloride exposure of technical grade silicon (direct chlorination, DC), homogeneous hydration of tetrachlorosilane (conversion), tetrachlorosilane and hydrogen exposure of silicon (hydro chlorination silicon, HC), and catalyzed tetrachlorosilane and dichlorosilane reaction (redistribution of anti-disproportioning reaction). These processes remain in use and are permanently improved. Catalytic processes play an important role on silicon surface, and understanding their mechanisms can help find novel applications and obtain new results. It has been noted that indispensable components of various equipment and process designs are recycling steps and combined processes including active distillation. They provide for the most complete utilization of raw trichlorosilane, increase the process yield and cut down silicon cost
Methods of trichlorosilane synthesis for polycrystalline silicon production. Part 2: Hydrochlorination and redistribution
Novel technical solutions and ideas for increasing the yield of solar and semiconductor grade polycrystalline silicon processes have been analyzed. The predominant polycrystalline silicon technology is currently still the Siemens process including the conversion of technical grade silicon (synthesized by carbon-thermal reduction of quartzites) to trichlorosilane followed by rectification and hydrogen reduction. The cost of product silicon can be cut down by reducing the trichlorosilane synthesis costs through process and equipment improvement. Advantages, drawbacks and production cost reduction methods have been considered with respect to four common trichlorosilane synthesis processes: hydrogen chloride exposure of technical grade silicon (direct chlorination, DC), homogeneous hydration of tetrachlorosilane (conversion), tetrachlorosilane and hydrogen exposure of silicon (hydro chlorination silicon, HC), and catalyzed tetrachlorosilane and dichlorosilane reaction (redistribution of anti-disproportioning reaction). These processes remain in use and are permanently improved. Catalytic processes play an important role on silicon surface, and understanding their mechanisms can help find novel applications and obtain new results. It has been noted that indispensable components of various equipment and process designs are recycling steps and combined processes including active distillation. They provide for the most complete utilization of raw trichlorosilane, increase the process yield and cut down silicon cost