Towards a magnetoresistance characterization methodology for 1D nanostructured transistors

session 7: CharacterizationInternational audienceA novel approach to magnetoresistance characterization of ID-like nanoscaled transistor structures is presented. The proposed approach, which is based on the physical magnetoresistance effect (PMR), exploits the reality that carriers have non-discrete velocity distributions even when only a single carrier species is present

Mobility spectrum analysis of magnetoresistance in fully-depleted MOSFETs

session C9L-G: CMOS CharacterizationInternational audienceHigh-resolution mobility spectrum analysis has been employed to study the magnetic-field dependent geometrical magnetoresistance characteristics of planar FD-SOI MOSFETs with 10 nm thick transistor channel layer. It is shown that transport in the Si channel is due to two well-defined electron species. According to self-consistent Poisson-Schrdinger calculations, these species correspond to carriers in two distinct subbands within the Si channel region which arise from strong carrier confinement and volume inversion. The mobility peak of the first sub-band was found to occur under gate bias conditions that result in a minimum perpendicular effective electric field

High-resolution mobility spectrum analysis of magnetoresistance in fully-depleted silicon-on-insulator MOSFETs

International audienceMulti-carrier transport in planar fully-depleted silicon-on-insulator (FD-SOI) MOSFETs has been investigated employing magnetic-field dependent geometrical magnetoresistance measurements and high-resolution mobility spectrum analysis. The results indicate that electronic transport in the 10 nm thick Si channel layer is due to two distinct and well-defined electron species. Although self-consistent Schrödinger–Poisson numerical calculations indicate significant localization of the total electron population near the back and front interfaces, the results of mobility spectrum analysis suggest that the mobility distributions associated with these spatially localized populations are strongly coupled through carrier scattering processes, and do not have independent and distinguishable mobility distributions. The two detected electron mobility distributions are thus evidence of sub-band modulated transport in 10-nm thick Si planar FD-SOI MOSFETs. The mobility maximum of the dominant carrier was found to occur under gate bias conditions that result in a minimum perpendicular effective electric field

Evidence of Sub-Band Modulated Transport in Planar Fully Depleted Silicon-on-Insulator MOSFETs

International audienceModulation of the sub-band electron population in the inversion channel of 10-nm planar fully depleted silicon-on-insulator MOSFETs is evidenced by the bias dependence of inversion layer transport parameters. Two distinct inversion-layer electron species were detected by magnetic-field-dependent magnetoresistance measurements and high-resolution mobility spectrum analysis. According to self-consistent Poisson-Schrödinger calculations, these species correspond to carriers in distinct sub-bands within the Si channel region. The mobility peak of the carrier with the highest sheet density occurs under gate bias conditions that result in a minimum perpendicular effective electric field