Morphology, structure, and optical properties of semiconductor films with GeSiSn nanoislands and strained layers

The dependences of the two-dimensional to three-dimensional growth (2D-3D) critical transition thickness on the composition for GeSiSn films with a fixed Ge content and Sn content from 0 to 16% at the growth temperature of 150 °С have been obtained. The phase diagrams of the superstructure change during the epitaxial growth of Sn on Si and on Ge(100) have been built. Using the phase diagram data, it becomes possible to identify the Sn cover on the Si surface and to control the Sn segregation on the superstructure observed on the reflection high-energy electron diffraction (RHEED) pattern. The multilayer structures with the GeSiSn pseudomorphic layers and island array of a density up to 1.8 × 1012 cm−2 have been grown with the considering of the Sn segregation suppression by the decrease of GeSiSn and Si growth temperature. The double-domain (10 × 1) superstructure related to the presence of Sn on the surface was first observed in the multilayer periodic structures during Si growth on the GeSiSn layer. The periodical GeSiSn/Si structures demonstrated the photoluminescence in the range of 0.6–0.85 eV corresponding to the wavelength range of 1.45–2 μm. The calculation of the band diagram for the structure with the pseudomorphic Ge0.315Si0.65Sn0.035 layers allows assuming that photoluminescence peaks correspond to the interband transitions between the X valley in Si or the Δ4-valley in GeSiSn and the subband of heavy holes in the GeSiSn layer

Elastically strained GeSiSn layers and GeSiSn islands in multilayered periodical structures

This work deals with elastically strained GeSiSn films and GeSiSn islands. The kinetic diagram of GeSiSn growth for different lattice mismatches between GeSiSn and Si has been drawn. The multilayered periodic structures with pseudomorphic GeSiSn layers and GeSiSn island arrays have been obtained. The density of the islands in the GeSiSn layer is 1.8 · 1012 cm-2 for an average island size of 4 nm. Analysis of the rocking curves has shown that the structures contain smooth heterointerfaces, and no abrupt changes of composition and thickness between periods have been found. Photoluminescence has been demonstrated and calculation of band diagram with the model-solid theory has been carried out. Luminescence presented for sample with pseudomorphic Ge0.315Si0.65Sn0.035 layers in the narrow range 0.71–0.82 eV is observed with the maximum intensity near 0.78 eV corresponding to 1.59 µm wavelength. Based on the band diagram calculation for Si/Ge0.315Si0.65Sn0.035/Si heterocomposition we have concluded that 0.78 eV photon energy luminescence corresponds to interband transitions between the X-valley in Si and the heavy hole subband in the Ge0.315Si0.65Sn0.035 layer

Fine structure splitting analysis of cavity-enhanced telecom-wavelength InAs quantum dots grown on a GaAs(111)A vicinal substrate

The effcient generation of entangled photons at telecom wavelength is crucial for the success of many quantum communication protocols and the development of fiber-based quantum networks. Entangled light can be generated by solid state quantum emitters with naturally low fine structure splitting, such as highly symmetric InAs quantum dots (QDs) grown on (111)-oriented surfaces. Incorporating this kind of QDs into optical cavities is critical to achieve sufficient signal intensitiesfor applications, but has so far shown major complications. In this work we present droplet epitaxy of telecom-wavelength InAs QDs within an optical cavity on a vicinal (2{\deg} miscut) GaAs(111)A substrate. We show a remarkable enhancement of the photon extraction efficiency compared to previous reports together with a reduction of the density that facilitates the isolation of single spectral lines. Moreover, we characterise the exciton fine structure splitting and employ numerical simulations under the framework of the empirical pseudopotential and configuration interaction methods to study the impact of the miscut on the optical properties of the QDs. We demonstrate that the presence of miscut steps influences the polarisation of the excitonic states and introduces a preferential orientation in the $C_{3v}$ symmetry of the surface