An analysis of the double torsion test

Ph.D.John T. Berr

Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe

Atomic force microscope (AFM) equipped with diamond-like carbon (DLC)-coated Si probe has been used for scratch nanolithography on Si surfaces. The effect of scratch direction, applied tip force, scratch speed, and number of scratches on the size of the scratched geometry has been investigated. The size of the groove differs with scratch direction, which increases with the applied tip force and number of scratches but decreases slightly with scratch speed. Complex nanostructures of arrays of parallel lines and square arrays are further fabricated uniformly and precisely on Si substrates at relatively high scratch speed. DLC-coated Si probe has the potential to be an alternative in AFM-based scratch nanofabrication on hard surfaces

Performance Assessments of Technology Transfer Offices of Thirty Major US Research Universities in 2012/2013

The activities and performance of thirty major universities technology transfer offices (TTOs) selected from major US universities are quantitatively assessed and compared. Six leading metrics, including TTOs’ revenue, as well as quantity of invention disclosures, patent applications, patents granted, licenses signed, and startup companies launched, are used to develop a single overall performance metric (OPM) for representing the performance of the TTOs. The OPM are then evaluated for each of the thirty universities and their OPM scores are compared to each other to establish the reliability and effectiveness of a comprehensive OPM. A patenting control ratio (PCR) is also calculated to guide a TTO in setting its patenting strategy and procedures. These two metrics should be able to provide a comprehensive overview of how good is the TTO of a university as compare to those of its peers and, even more importantly, how the program fares globally

The European Union counter-terrorism strategy origins, problems, and prospects

The European Union (EU) published its first Counter-Terrorism Strategy in December of 2005. After four years of reacting to the major terrorist attacks in the United States in 2001, Madrid in 2004, and London in 2005, the EU has enacted a substantial body of counterterrorism measures across multiple functional areas. The implementation of these actions, however, has not always been consistent or timely, due to a number of issues, including public threat perception, concern over social tensions, and competing national priorities. These roadblocks to a successful counterterrorism policy were often discovered upon new terrorist attacks and a renewed evaluation of EU counterterrorist activity. After the London bombings, the United Kingdom held the EU Presidency and immediately set to work on a strategy to counter terrorism, both similar and subordinate to the 2003 European Security Strategy, which specifically listed terrorism and weapons of mass destruction amoung the top five threats to the EU. The new strategy of 2005 outlines EU efforts over the long term and provides a tool for public information. Despite the EU's embrace of its new strategy, the document has many shortcomings. Evaluation of this strategy against a series of counterterrorism best practices accumulated from the work of functional and scholarly experts shows several areas in which the effectiveness of this strategy to successfully affect terrorism is severely limited. In all, the European Union Counter-Terrorism Strategy serves limited use as a strategy document, but does serve to guide the EU's efforts in fighting terrorism, as well as deepen EU integration in security affairs and in justice and law enforcement.http://archive.org/details/theeuropeunionco109452447Approved for public release; distribution is unlimited

Electron Beam Lithography of Microbowtie Structures for Next-generation Optical Probe

[[abstract]]The development of microbowtie structures for a next-generation optical probe called the Wave Interrogated Near-Field Array (WINFA) is presented. The WINFA combines the sensitivity of near-field detection with the speed of optical scanning. The microbowties are designed to act as resonant elements to provide spatial resolution well below the diffraction limit with a transmission efficiency approaching unity. Following an introduction of the concept and background information, the design of the microbowtie is presented. A numerical electromagnetic scattering model is developed and used for better designs of the bowtie structures. The electron-beam lithography process is then used to fabricate the final designed bowties structure. Special fabrication procedures have been developed to cope with the charge dissipation problem that arises when lithographing an insulating substrate as is required in the present probe design. Two types of substrates and two types of resists are considered in the present study. The fabricated microstructures have 40 nm bowtie gaps that are more than 200 000 times smaller than the one built previously. All fabricated bowtie microstructures are examined and the results are compared. It has been found that, in addition to the relative ease in fabrication, the bowties on indium–tin–oxide coated glass substrate can not only minimize the charge accumulation in a glass substrate, but also satisfy the functional requirement of optical transparency to the incident wave. Recommendations for making a bowtie structure in the even smaller bowtie array are also included

Fabrication of Microbowtie Structures Using Electron-beam Lithography for a New Optical Probe

[[abstract]]A microbowtie array critical to a newly developed optical probe is studied. The optical probe is used for high speed detection of nanoscale objects. Based on the concept of Wave Interrogated Near Field Array, an array of microbowtie structures is acting as a detector in amplifying the incident light source to overcome the difficulties of the conventional optical probe that are limited by the diffraction limits of the optical light. In the present study, the micro bowties are fabricated by an electron beam lithography technique. The paper begins with an introduction of the probe concept and then the design considerations are given followed by the details of the fabrication procedure. Two different substrates are considered to study the charge accumulation problem caused by an insulating substrate required by the probe. The effect of the charge accumulation on the fabrication procedures is specifically discussed. Results indicate that the bowtie structure with an indium- tin-oxide coated glass substrate can minimize the charge accumulation problem, making it one of the most suitable substrates for the bowtie structures considered. The paper concludes with recommendations for making even smaller nano- sized bowtie structures

Recent developments on microablation of glass materials using excimer lasers

[[abstract]]For many years, the development of effective laser machining techniques for making glass-based microcomponents and devices has been a critical factor in the birth of new photonic and biomedical microsystems. In this article, the characteristics and abilities of excimer lasers for micromachining of a wide range of glass materials are reviewed and studied. Following the introduction, the special features of excimer lasers are discussed. The typical micromachining system used for glass materials is presented. Then, the fundamental micromachining parameters and the associated morphologies of machined surfaces are evaluated. The approaches by controlling the ablation rate for making the curve surfaces are specifically formulated. Although a wide range of commercially available glasses is covered in this article, two types of the most widely used glasses, borosilicate glass and fused silica, are thoroughly examined to illustrate the complexity in micromachining the glass materials. The procedures to machine single, arrayed, curved microstructures are described. The utilizations of these procedures for making microneedles, optical waveguides, submicron grating, and microlenses are specifically demonstrated. Finally, recommendations for future efforts are presented.[[notice]]補正完

Electron-Beam Lithography of Microbowtie Structures for Next Generation Optical Probe

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