6 research outputs found
Contrasting the Role of Ni/Al<sub>2</sub>O<sub>3</sub> Interfaces in WaterāGas Shift and Dry Reforming of Methane
Transition metal
nanoparticles (NPs) are typically supported on
oxides to ensure their stability, which may result in modification
of the original NP catalyst reactivity. In a number of cases, this
is related to the formation of NP/support interface sites that play
a role in catalysis. The metal/support interface effect verified
experimentally
is commonly ascribed to stronger reactants adsorption or their facile
activation on such sites compared to bare NPs, as indicated by DFT-derived
potential energy surfaces (PESs). However, the relevance of specific
reaction elementary steps to the overall reaction rate depends on
the preferred reaction pathways at reaction conditions, which usually
cannot be inferred based solely on PES. Hereby, we use a multiscale
(DFT/microkinetic) modeling approach and experiments to investigate
the reactivity of the Ni/Al<sub>2</sub>O<sub>3</sub> interface toward
waterāgas shift (WGS) and dry reforming of methane (DRM), two
key industrial reactions with common elementary steps and intermediates,
but held at significantly different temperatures: 300 vs 650 Ā°C,
respectively. Our model shows that despite the more energetically
favorable reaction pathways provided by the Ni/Al<sub>2</sub>O<sub>3</sub> interface, such sites may or may not impact the overall reaction
rate depending on reaction conditions: the metal/support interface
provides the active site for WGS reaction, acting as a reservoir for
oxygenated species, while all Ni surface atoms are active for DRM.
This is in contrast to what PESs alone indicate. The different active
site requirement for WGS and DRM is confirmed by the experimental
evaluation of the activity of a series of Al<sub>2</sub>O<sub>3</sub>-supported Ni NP catalysts with different NP sizes (2ā16 nm)
toward both reactions
<i>In Situ</i> XRD and Dynamic Nuclear Polarization Surface Enhanced NMR Spectroscopy Unravel the Deactivation Mechanism of CaO-Based, Ca<sub>3</sub>Al<sub>2</sub>O<sub>6</sub>āStabilized CO<sub>2</sub> Sorbents
CaO is an effective
high temperature CO<sub>2</sub> sorbent that,
however, suffers from a loss of its CO<sub>2</sub> absorption capacity
upon cycling due to sintering. The cyclic CO<sub>2</sub> uptake of
CaO-based sorbents is improved by Ca<sub>3</sub>Al<sub>2</sub>O<sub>6</sub> as a structural stabilizer. Nonetheless, the initially rather
stable CO<sub>2</sub> uptake of Ca<sub>3</sub>Al<sub>2</sub>O<sub>6</sub>-stabilized CaO yet starts to decay after around 10 cycles
of CO<sub>2</sub> capture and sorbent regeneration, albeit at a significantly
reduced rate compared to the unmodified reference material. Here,
we show by a combined use of <i>in situ</i> XRD together
with textural and morphological characterization techniques (SEM,
STEM, and N<sub>2</sub> physisorption) and solid-state <sup>27</sup>Al NMR (in particular dynamic nuclear polarization surface enhanced
NMR spectroscopy, DNP SENS) how microscopic changes trigger the sudden
onset of deactivation of Ca<sub>3</sub>Al<sub>2</sub>O<sub>6</sub>-stabilized CaO. After a certain number of CO<sub>2</sub> capture
and regeneration cycles (approximately 10), Ca<sub>3</sub>Al<sub>2</sub>O<sub>6</sub> transformed into Ca<sub>12</sub>Al<sub>14</sub>O<sub>33</sub>, followed by Al<sub>2</sub>O<sub>3</sub> segregation and
enrichment at the surface in the form of small nanoparticles. Al<sub>2</sub>O<sub>3</sub> in such a form is not able to stabilize effectively
the initially highly porous structure against thermal sintering, leading
in turn to a reduced CO<sub>2</sub> uptake
Cooperativity and Dynamics Increase the Performance of NiFe Dry Reforming Catalysts
The
dry reforming of methane (DRM), i.e., the reaction of methane
and CO<sub>2</sub> to form a synthesis gas, converts two major greenhouse
gases into a useful chemical feedstock. In this work, we probe the
effect and role of Fe in bimetallic NiFe dry reforming catalysts.
To this end, monometallic Ni, Fe, and bimetallic Ni-Fe catalysts supported
on a Mg<sub><i>x</i></sub>Al<sub><i>y</i></sub>O<sub><i>z</i></sub> matrix derived via a hydrotalcite-like
precursor were synthesized. Importantly, the textural features of
the catalysts, i.e., the specific surface area (172ā178 m<sup>2</sup>/g<sub>cat</sub>), pore volume (0.51ā0.66 cm<sup>3</sup>/g<sub>cat</sub>), and particle size (5.4ā5.8 nm) were kept
constant. Bimetallic, Ni<sub>4</sub>Fe<sub>1</sub> with Ni/(Ni + Fe)
= 0.8, showed the highest activity and stability, whereas rapid deactivation
and a low catalytic activity were observed for monometallic Ni and
Fe catalysts, respectively. XRD, Raman, TPO, and TEM analysis confirmed
that the deactivation of monometallic Ni catalysts was in large due
to the formation of graphitic carbon. The promoting effect of Fe in
bimetallic Ni-Fe was elucidated by combining operando XRD and XAS
analyses and energy-dispersive X-ray spectroscopy complemented with
density functional theory calculations. Under dry reforming conditions,
Fe is oxidized partially to FeO leading to a partial dealloying and
formation of a Ni-richer NiFe alloy. Fe migrates leading to the formation
of FeO preferentially at the surface. Experiments in an inert helium
atmosphere confirm that FeO reacts via a redox mechanism with carbon
deposits forming CO, whereby the reduced Fe restores the original
Ni-Fe alloy. Owing to the high activity of the material and the absence
of any XRD signature of FeO, it is very likely that FeO is formed
as small domains of a few atom layer thickness covering a fraction
of the surface of the Ni-rich particles, ensuring a close proximity
of the carbon removal (FeO) and methane activation (Ni) sites
Conformal Deposition of Conductive Single-Crystalline Cobalt Silicide Layer on Si Wafer via a Molecular Approach
The realization of metalāsemiconductor
contacts plays a
significant role in ultrascaled integrated circuits. Here, we establish
a low-temperature molecular approach for the conformal deposition
of a 20 nm Co-rich layer on Si (100) wafers by reaction in solution
of Co<sub>2</sub>(CO)<sub>8</sub> with SiH<sub>4</sub>. Postannealing
at 850 Ā°C under vacuum (ā¼10<sup>ā5</sup> mbar)
yields a crystalline CoSi<sub>2</sub> film with a lower surface roughness
(<i>R</i><sub>rms</sub> = 5.3 nm) by comparison with the
conventional physical method; this layer exhibiting a metallic conductive
behavior (ohmic behavior) with a low resistivity (Ļ = 11.6 Ī¼Ī©
cm) according to four-point probe measurement. This approach is applicable
to trench-structured wafers, showing the conformal layer deposition
on 3D structures and showcasing the potential of this approach in
modern transistor technology