16 research outputs found

    Experimental and Theoretical Studies on the Corrosion Inhibition of Carbon Steel by Two Indazole Derivatives in HCl Medium

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    In this work, two indazole derivatives, namely 5-aminoindazole (AIA) and 5-nitroindazole (NIA), were investigated as corrosion inhibitors for carbon steel in 1 M HCl solution by experimental and density functional theory (DFT) methods. The electrochemical results indicate that the inhibition ability follows the order of AIA > NIA, which is due to the stronger electron-donating effect of –NH2 of the AIA group than the –NO2 group of NIA. Besides, the frontier orbital theory shows that the AIA exhibits higher reaction activity than NIA, and a more negative adsorption energy for AIA was also obtained, which is consistent with the analysis of the electrochemical measurements. We draw the conclusion that the electron-donating effect makes it easier for AIA to donate electrons to iron atoms to form a stronger protective layer than NIA

    Enhanced anticorrosion performance of copper by novel N-doped carbon dots

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    Enhanced anticorrosion performance of copper by novel N-doped carbon dot

    Insights into the inhibition mechanism of three 5-phenyltetrazole derivatives for copper corrosion in sulfuric acid medium via experimental and DFT methods

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    Insights into the inhibition mechanism of three 5-phenyltetrazole derivatives for copper corrosion in sulfuric acid medium via experimental and DFT method

    Investigation of Losartan Potassium as an eco-friendly corrosion inhibitor for copper in 0.5 M H2SO4

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    Losartan Potassium (LP) is a commonly used drug for the treatment of hypertension. In this study, the corrosion inhibition performance of LP on copper in 0.5 M H2SO4 was investigated using electrochemicalmethods, surface morphological observation, X-ray photoelectron spectroscopy (XPS), quantum chemical calculation and molecular dynamics (MD) simulation. The electrochemical results show that LP is a type of mixed-type inhibitor that suppresses both cathode and anode reactions by forming a protective film. This film follows the Langmuir adsorption model and mainly depends on chemisorption in this process. XPS analysis confirmed that the adsorption film was due to the formation of coordination compounds between N atoms in the LP molecule and copper. Quantum chemical calculation further confirmed the active centres of N atoms in LP molecules, andMD simulation demonstrated that the inhibitor was adsorbed almost tightly and parallel to the Cu (111) surface. (C) 2020 Elsevier B.V. All rights reserved

    Effects of 2,2-Dithiodipyridine as a Leveler for Through-Holes Filling by Copper Electroplating

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    Effects of 2,2-Dithiodipyridine as a Leveler for Through-Holes Filling by Copper Electroplatin

    Mn3O4/Co(OH)(2) cactus-type nanoarrays for high-energy-density asymmetric supercapacitors

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    Mn3O4/Co(OH)(2) cactus-type nanoarrays for high-energy-density asymmetric supercapacitor

    Experimental and theoretical studies on the inhibition properties of three diphenyl disulfide derivatives on copper corrosion in acid medium

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    2,2'-Dithiosalicylic acid (DSA), 2-aminophenyl disulfide (APD) and 2,2-dibenzamidodiphenyl disulfide (DPD) were determined for corrosion inhibition of Cu in H2SO4 media by electrochemical tests, surface morphology analysis, quantum chemical calculations and molecular dynamics simulations. The results of polarization curves showed that DSA, APD and DPD reveal good anti-corrosion capacity. They can simultaneously inhibit the cathodic and anodic reactions of copper. Therefore, they belong to the mixed-type corrosion inhibitors. Impedance spectroscopy results showed that when DSA, APD and DPD adsorption on the surface of Cu, the charge transfer resistance increases significantly and typical capacitance behavior produced, which indicates that the formed inhibitor film is very dense and ordered. In addition, the adsorption of corrosion inhibitors on the Cu surface is conforming to Langmuir monolayer adsorption. The experimental results obtained by surface topography analysis are consistent with the results of electrochemical experiments. Their corrosion inhibition ability is DSA < APD < DPD. Theoretical calculations further explore the relationship between corrosion inhibition performance and their molecular configurations. (C) 2019 Elsevier B.V. All rights reserved
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