Resistive Random Access Memories (RRAMs) Based on Metal Nanoparticles

It is demonstrated that planar structures based on silver nanoparticleshosted in a polymer matrix show reliable and reproducible switching properties attractive for non-volatile memory applications. These systems can be programmed between a low conductance (off-state) and high conductance (on-state) with an on/off ratio of 3 orders of magnitude, large retention times and good cycle endurance. The planar structure design offers a series of advantages discussed in this contribution, which make it an ideal tool to elucidate the resistive switching phenomena

New electronic memory device concepts based on metal oxide-polymer nanostructures planer diodes

Nanostructure silver oxide thin films diodes can exhibit resistive switching effects. After an electroforming process the device can be programmed between a low conductance (off-state) and high conductance (on- state) with a voltage pulse and they are already being considered for non-volatile memory applications. However, the origin of programmable resistivity changes in a network of nanostructure silver oxide embedded in polymer is still a matter of debate. This work provides some results on a planer diode which may help to elucidate resistive switching phenomena in nanostructure metal oxide diodes. The XRD pattern after switching appears with different crystalline planes, plus temperature dependent studies reveal that conduction of both on and off states is weak thermal activated. Intriguing the carrier transport is the same for both on and off-states. Difference between states comes from the dramatic changes in the carrier density. The main mechanism of charge transport for on-state is tunneling. The charge transport leads to SCLC in higher voltages pulse for the off state. The mechanism will be explained based on percolation concepts

Electroforming Process in Metal-Oxide-Polymer Resistive Switching Memories

Part 18: Electronic MaterialsInternational audienceElectroforming of an Al/Al2O3/polymer/Al resistive switching diode is reported. Electroforming is a dielectric soft-breakdown mechanism leading to hysteretic current–voltage characteristics and non–volatile memory behavior. Electron trapping occurs at early stages of electroforming. Trapping is physically located at the oxide/polymer interface. The detrapping kinetics is faster under reverse bias and for thicker oxides layers. Thermally detrapping experiments give a trap depth of 0.65 eV and a density of 5x1017 /cm2. It is proposed that the trapped electrons induce a dipole layer across the oxide. The associated electric field triggers breakdown and ultimately dictate the overall memory characteristics