12 research outputs found
Reaction of Nitrogen Dioxide with Ice Surface at Low Temperature (≤170 K)
We
studied the adsorption and reaction of nitrogen dioxide gas
on the surface of an ice film at temperatures of 100–170 K
under ultrahigh vacuum (UHV) conditions. Cs<sup>+</sup> reactive ion
scattering (RIS) and low-energy sputtering (LES) techniques were used
to identify and quantify the reactants and products on the surface
of the ice film, in conjunction with the use of temperature-programmed
desorption (TPD) to monitor the species desorbed. Temperature-ramping
experiments were performed to examine the changes in the populations
of these species as a function of temperature. Adsorption of NO<sub>2</sub> gas on the ice film at <110 K produced physisorbed species
that may possibly possess negative charge character (NO<sub>2</sub><sup>δ‑</sup>), as deduced from the NO<sub>2</sub> and NO<sub>2</sub><sup>–</sup> signals in the RIS and LES experiments.
At 110–130 K, NO<sub>2</sub><sup>δ‑</sup> species were
either desorbed as NO<sub>2</sub> gas or converted to nitrous acid
(HONO), NO<sub>3</sub><sup>–</sup>, and H<sub>3</sub>O<sup>+</sup> on the surface. Nitrous acid gas was desorbed at 140–160
K. The efficiency of conversion of NO<sub>2</sub> to surface nitrous
acid was about 40%, and that to nitrous acid gas was about 7%. The
efficiency of the reaction of NO<sub>2</sub> on the ice surface may
be higher than that at the gas/liquid water interface. The reaction
efficiency increased with a decrease of the NO<sub>2</sub> coverage
and was inversely correlated with the N<sub>2</sub>O<sub>4</sub> coverage,
which favors the mechanistic interpretation that an isolated NO<sub>2</sub> molecule reacts with water. However, NO<sub>2</sub> can diffuse
on the ice surface to form clusters at ≥120 K. Under these
conditions, the possibility that dimerization of NO<sub>2</sub> contributes
to the hydrolysis reaction of NO<sub>2</sub> may not be excluded
Design of Nanowire Optical Cavities as Efficient Photon Absorbers
Recent investigations of semiconductor nanowires have provided strong evidence for enhanced light absorption, which has been attributed to nanowire structures functioning as optical cavities. Precise synthetic control of nanowire parameters including chemical composition and morphology has also led to dramatic modulation of absorption properties. Here we report finite-difference time-domain (FDTD) simulations for silicon (Si) nanowire cavities to elucidate the key factors that determine enhanced light absorption. The FDTD simulations revealed that a crystalline Si nanowire with an embedded 20-nm-thick amorphous Si shell yields 40% enhancement of absorption as compared to a homogeneous crystalline Si nanowire, under air-mass 1.5 global solar spectrum for wavelengths between 280 and 1000 nm. Such a large enhancement in absorption results from localization of several resonant modes within the amorphous Si shell. A nanowire with a rectangular cross section exhibited enhanced absorption at specific wavelengths with respect to a hexagonal nanowire. The pronounced absorption peaks were assigned to resonant modes with a high symmetry that red-shifted with increasing size of the rectangular nanowire. We extended our studies to investigate the optical properties of single- and multilayer arrays of these horizontally oriented nanowire building blocks. The absorption efficiency of a nanowire stack increases with the number of nanowire layers and was found to be greater than that of a bulk structure or even a single nanowire of equivalent thickness. Lastly, we found that a single-layer nanowire array preserves the structured absorption spectrum of a single nanowire and ascribed this result to a diffraction effect of the periodic nanowire array. The results from these provide insight into the design of nanowire optical cavities with tunable and enhanced light absorption and thus, could help enable the development of ultrathin solar cells and other nanoscale optoelectronic devices
Broadband Omnidirectional Diffuse Mirrors with Hierarchically Designed All-Dielectric Surfaces
An electromagnetic
wave with a single wave vector can be converted
into multiple partial ones, with discrete or continuum wave vectors,
by means of diffraction or scattering elements; this phenomenon is
called optical diffusion. Optical diffusion is a crucial light–matter
interaction problem, particularly for lighting applications that require
uniform illumination. However, omnidirectional diffuse mirrors with
minimal absorption loss have not been reported thus far. Here, we
demonstrate the high-diffusivity, low-absorption reflecting surfaces,
on which hexagonally arranged Al<sub>2</sub>O<sub>3</sub> cones, with
a pitch of 3 μm, are conformally covered with HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> multilayers. Spectrally resolved far-field
measurements reveal that the hierarchically patterned surface diffuses
reflected light uniformly over the entire range of azimuthal and polar
angles at broadband wavelengths (λ = 400–800 nm), distinct
to two-dimensional Al<sub>2</sub>O<sub>3</sub> or Al patterned surfaces.
Such omnidirectional optical diffusion is clearly identified by means
of the momentum space representation; the hierarchical pattern allows
all of the available diffraction modes to possess nearly equal amplitudes,
which is strongly supported by near-to-far-field Fourier analysis.
The degree of diffusivity is quantitatively evaluated with respect
to different angular ranges (Δθ = 3°, 12°, and
24°) around a specular reflection angle. Under all of the considered
metrics, the hierarchical pattern yields a relatively large diffusivity
compared to the reference two-dimensional patterns. Measurements of
reflectance spectra, together with full-vectorial electromagnetic
simulations, suggest that the hierarchically patterned surface with
a backside reflector serves as a high-reflectance diffuse mirror,
contrasting with a patterned Al mirror that inevitably suffers from
plasmonic absorption loss. These experimental and numerical findings
studied herein will provide a fundamental platform for achieving omnidirectional
optical diffusers
Doubling Absorption in Nanowire Solar Cells with Dielectric Shell Optical Antennas
Semiconductor
nanowires (NWs) often exhibit efficient, broadband
light absorption despite their relatively small size. This characteristic
originates from the subwavelength dimensions and high refractive indices
of the NWs, which cause a light-trapping optical antenna effect. As
a result, NWs could enable high-efficiency but low-cost solar cells
using small volumes of expensive semiconductor material. Nevertheless,
the extent to which the antenna effect can be leveraged in devices
will largely determine the economic viability of NW-based solar cells.
Here, we demonstrate a simple, low-cost, and scalable route to dramatically
enhance the optical antenna effect in NW photovoltaic devices by coating
the wires with conformal dielectric shells. Scattering and absorption
measurements on Si NWs coated with shells of SiN<sub><i>x</i></sub> or SiO<sub><i>x</i></sub> exhibit a broadband enhancement
of light absorption by ∼50–200% and light scattering
by ∼200–1000%. The increased light–matter interaction
leads to a ∼80% increase in short-circuit current density in
Si photovoltaic devices under 1 sun illumination. Optical simulations
reproduce the experimental results and indicate the dielectric–shell
effect to be a general phenomenon for groups IV, II–VI, and
III–V semiconductor NWs in both lateral and vertical orientations,
providing a simple route to approximately double the efficiency of
NW-based solar cells
Facet-Selective Growth on Nanowires Yields Multi-Component Nanostructures and Photonic Devices
Enhanced
synthetic control of the morphology, crystal structure, and composition
of nanostructures can drive advances in nanoscale devices. Axial and
radial semiconductor nanowires are examples of nanostructures with
one and two structural degrees of freedom, respectively, and their
synthetically tuned and modulated properties have led to advances
in nanotransistor, nanophotonic, and thermoelectric devices. Similarly,
developing methods that allow for synthetic control of greater than
two degrees of freedom could enable new opportunities for functional
nanostructures. Here we demonstrate the first regioselective nanowire
shell synthesis in studies of Ge and Si growth on faceted Si nanowire
surfaces. The selectively deposited Ge is crystalline, and its facet
position can be synthetically controlled <i>in situ</i>.
We use this synthesis to prepare electrically addressable nanocavities
into which solution soluble species such as Au nanoparticles can be
incorporated. The method furnishes multicomponent nanostructures with
unique photonic properties and presents a more sophisticated nanodevice
platform for future applications in catalysis and photodetection
High-Responsivity Deep-Ultraviolet-Selective Photodetectors Using Ultrathin Gallium Oxide Films
Wavelength-selective
photodetectors responding to deep-ultraviolet (DUV) wavelengths (λ
= 200–300 nm) are drawing significant interest in diverse sensing
applications, ranging from micrometer biological molecules to massive
military missiles. However, most DUV photodetectors developed thus
far have suffered from long response times, low sensitivity, and high
processing temperatures, impeding their practical use. Here, we report
fast, high-responsivity, and general-substrate-compatible DUV photodetectors
based on ultrathin (3–50 nm) amorphous gallium oxide (GaO<sub>X</sub>) films grown by low-temperature (∼<250 °C)
atomic layer deposition (ALD) for the first time. ALD-grown GaO<sub>X</sub> films on glass substrates display a typical amorphous nature,
which is identified by electron beam diffraction and X-ray diffraction
measurements, while their band gap is sharply featured at ∼4.8
eV. Metal–semiconductor–metal photodetectors (active
area of 30 × 30 μm<sup>2</sup>) using the 30-nm-thick GaO<sub>X</sub> films work reliably only for DUV wavelengths; the responsivity
is maximized to 45.11 A/W at λ = 253 nm, which dropped off at
λ ≈ 300 nm (i.e., a cutoff wavelength). The dark current
measured at 10 V is as low as 200 pA and the signal-to-noise ratio
reaches up to ∼10<sup>4</sup>, underpinning the pristine material
quality of the ALD-grown GaO<sub>X</sub> films. In addition, the rise
time (i.e., the time interval for photocurrent to increase from 10%
to 90%) is as quick as 2.97 μs at λ = 266 nm. Such a reliable
and fast photoresponse is achieved for even atomically thin (∼3
nm) devices. The substrate-compatible and low-temperature ALD growth
permits the demonstration of flexible DUV photodetectors using amorphous
GaO<sub>X</sub> films grown on polyimide substrates, suggesting their
facile integration into other curved optoelectronic systems. We believe
that photodetectors developed herein will provide an economically
viable solution for high-performance DUV detection and create a variety
of sensing applications
Enhancement of Light Absorption in Silicon Nanowire Photovoltaic Devices with Dielectric and Metallic Grating Structures
We report the enhancement
of light absorption in Si nanowire photovoltaic
devices with one-dimensional dielectric or metallic gratings that
are fabricated by a damage-free, precisely aligning, polymer-assisted
transfer method. Incorporation of a Si<sub>3</sub>N<sub>4</sub> grating
with a Si nanowire effectively enhances the photocurrents for transverse-electric
polarized light. The wavelength at which a maximum photocurrent is
generated is readily tuned by adjusting the grating pitch. Moreover,
the electrical properties of the nanowire devices are preserved before
and after transferring the Si<sub>3</sub>N<sub>4</sub> gratings onto
Si nanowires, ensuring that the quality of pristine nanowires is not
degraded during the transfer. Furthermore, we demonstrate Si nanowire
photovoltaic devices with Ag gratings using the same transfer method.
Measurements on the fabricated devices reveal approximately 27.1%
enhancement in light absorption compared to that of the same devices
without the Ag gratings without any degradation of electrical properties.
We believe that our polymer-assisted transfer method is not limited
to the fabrication of grating-incorporated nanowire photovoltaic devices
but can also be generically applied for the implementation of complex
nanoscale structures toward the development of multifunctional optoelectronic
devices
Facet-Selective Epitaxy of Compound Semiconductors on Faceted Silicon Nanowires
Integration of compound semiconductors
with silicon (Si) has been a long-standing goal for the semiconductor
industry, as direct band gap compound semiconductors offer, for example,
attractive photonic properties not possible with Si devices. However,
mismatches in lattice constant, thermal expansion coefficient, and
polarity between Si and compound semiconductors render growth of epitaxial
heterostructures challenging. Nanowires (NWs) are a promising platform
for the integration of Si and compound semiconductors since their
limited surface area can alleviate such material mismatch issues.
Here, we demonstrate facet-selective growth of cadmium sulfide (CdS)
on Si NWs. Aberration-corrected transmission electron microscopy analysis
shows that crystalline CdS is grown epitaxially on the {111} and {110}
surface facets of the Si NWs but that the Si{113} facets remain bare.
Further analysis of CdS on Si NWs grown at higher deposition rates
to yield a conformal shell reveals a thin oxide layer on the Si{113}
facet. This observation and control experiments suggest that facet-selective
growth is enabled by the formation of an oxide, which prevents subsequent
shell growth on the Si{113} NW facets. Further studies of facet-selective
epitaxial growth of CdS shells on micro-to-mesoscale wires, which
allows tuning of the lateral width of the compound semiconductor layer
without lithographic patterning, and InP shell growth on Si NWs demonstrate
the generality of our growth technique. In addition, photoluminescence
imaging and spectroscopy show that the epitaxial shells display strong
and clean band edge emission, confirming their high photonic quality,
and thus suggesting that facet-selective epitaxy on NW substrates
represents a promising route to integration of compound semiconductors
on Si
Microstructured Air Cavities as High-Index Contrast Substrates with Strong Diffraction for Light-Emitting Diodes
Two-dimensional high-index-contrast
dielectric gratings exhibit unconventional transmission and reflection
due to their morphologies. For light-emitting devices, these characteristics
help guided modes defeat total internal reflections, thereby enhancing
the outcoupling efficiency into an ambient medium. However, the outcoupling
ability is typically impeded by the limited index contrast given by
pattern media. Here, we report strong-diffraction, high-index-contrast
cavity engineered substrates (CESs) in which hexagonally arranged
hemispherical air cavities are covered with a 80 nm thick crystallized
alumina shell. Wavelength-resolved diffraction measurements and Fourier
analysis on GaN-grown CESs reveal that the high-index-contrast air/alumina
core/shell patterns lead to dramatic excitation of the low-order diffraction
modes. Large-area (1075 × 750 μm<sup>2</sup>) blue-emitting
InGaN/GaN light-emitting diodes (LEDs) fabricated on a 3 μm
pitch CES exhibit ∼39% enhancement in the optical power compared
to state-of-the-art, patterned-sapphire-substrate LEDs, while preserving
all of the electrical metrics that are relevant to LED devices. Full-vectorial
simulations quantitatively demonstrate the enhanced optical power
of CES LEDs and show a progressive increase in the extraction efficiency
as the air cavity volume is expanded. This trend in light extraction
is observed for both lateral- and flip-chip-geometry LEDs. Measurements
of far-field profiles indicate a substantial beaming effect for CES
LEDs, despite their few-micron-pitch pattern. Near-to-far-field transformation
simulations and polarization analysis demonstrate that the improved
extraction efficiency of CES LEDs is ascribed to the increase in emissions
via the top escape route and to the extraction of transverse-magnetic
polarized light
Association between humidifier disinfectant exposure-related characteristics and HDLI risk.
<p>Association between humidifier disinfectant exposure-related characteristics and HDLI risk.</p