Activation energy of diffusion determined from a single in-situ neutron reflectometry experiment

We present a new method for the determination of self-diffusivities in solids and the corresponding activation energy of diffusion using in-situ Neutron Reflectometry. In contrast to the classical ex-situ approach based on a sequence of isothermal measurements at different temperatures, the in-situ method allows one to work with a single experiment based on ramping the temperature with a constant rate. Our experiment demonstrates the success of the method for the model system of amorphous germanium. The activation energy of 2.2 eV and the absolute values of diffusivities achieved by the new method are in good agreement with the results of the classical approach, while a significantly lower amount of experimental time and samples are necessary. The presented method allows for an all-in-one type of experiment which can provide clearer and quicker results than similar methods using isothermal annealing procedures

Volume expansion of amorphous silicon electrodes during potentiostatic lithiation of Li-ion batteries

Large volume modifications during electrochemical cycling of electrodes in Li-ion batteries often limit successful applications due to stress formation, electrode fracture and delamination from the current collector. In this study, we carried out investigations on the volume changes taking place during potentiostatic lithiation of the high capacity electrode material amorphous silicon. Thin film electrodes were investigated at potentials of 0.45, 0.28, 0.19 und 0.06 V vs Li/Li+ during lithiation using in-operando neutron reflectometry. We found a strongly non-linear correlation between volume and state-of-charge for each potential applied in strong contrast to the results of galvanostatic lithiation. A possible explanation might be that for high current densities occurring at the beginning of each potentiostatic lithiation step free volumes are created in the electrode material leading to disproportionate volume expansion

Surfactant mediated growth of Ti/Ni multilayers

The surfactant mediated growth of Ti/Ni multilayers is studied. They were prepared using ion beam sputtering at different adatom energies. It was found that the interface roughness decreased significantly when the multilayers were sputtered with Ag as surfactant at an ion energy of 0.75 keV. On the other hand, when the ion energy was increased to 1 keV, it resulted in enhanced intermixing at the interfaces and no appreciable effect of Ag surfactant could be observed. On the basis of the obtained results, the influence of adatom energy on the surfactant mediated growth mechanism is discussed.Comment: 3 Pages, 3 Figure

Effect of dopants on thermal stability and self-diffusion in iron nitride thin films

We studied the effect of dopants (Al, Ti, Zr) on the thermal stability of iron nitride thin films prepared using a dc magnetron sputtering technique. Structure and magnetic characterization of deposited samples reveal that the thermal stability together with soft magnetic properties of iron nitride thin films get significantly improved with doping. To understand the observed results, detailed Fe and N self-diffusion measurements were performed. It was observed that N self-diffusion gets suppressed with Al doping whereas Ti or Zr doping results in somewhat faster N diffusion. On the other hand Fe self-diffusion seems to get suppressed with any dopant of which heat of nitride formation is significantly smaller than that of iron nitride. Importantly, it was observed that N self-diffusion plays only a trivial role, as compared to Fe self-diffusion, in affecting the thermal stability of iron nitride thin films. Based on the obtained results effect of dopants on self-diffusion process is discussed.Comment: 10 pages, 9 fig