Plasma-assisted physical vapor deposition surface treatments for tribological control

In any mechanical or engineering system where contacting surfaces are in relative motion, adhesion, wear, and friction affect reliability and performance. With the advancement of space age transportation systems, the tribological requirements have dramatically increased. This is due to the optimized design, precision tolerance requirements, and high reliability expected for solid lubricating films in order to withstand hostile operating conditions (vacuum, high-low temperatures, high loads, and space radiation). For these problem areas the ion-assisted deposition/modification processes (plasma-based and ion beam techniques) offer the greatest potential for the synthesis of thin films and the tailoring of adherence and chemical and structural properties for optimized tribological performance. The present practices and new approaches of applying soft solid lubricant and hard wear resistant films to engineering substrates are reviewed. The ion bombardment treatments have increased film adherence, lowered friction coefficients, and enhanced wear life of the solid lubricating films such as the dichalcogenides (MoS2) and the soft metals (Au, Ag, Pb). Currently, sputtering is the preferred method of applying MoS2 films; and ion plating, the soft metallic films. Ultralow friction coefficients (less than 0.01) were achieved with sputtered MoS2. Further, new diamond-like carbon and BN lubricating films are being developed by using the ion assisted deposition techniques

Status and directions of modified tribological surfaces by ion processes

An overview is presented of recent advances in modifying contacting surfaces in motion by the various ion assisted surface coating/modification processes to reduce and control tribological failures. The ion assisted coating processes and the surface modification processes offer the greatest potential to custom tailor and optimize the tribological performance. Hard, wear resistant and low shear coatings deposited by the ion assisted processes are discussed. Primarily the recent advances of sputtered MoS2 ion plated Au, Ag, Pb lubricating films and sputtered and ion plated hard, wear resistant TiN, HfN, TiC films are described in terms of structural property performance interrelationships which lead to improved adhesion, cohesion, nucleation, morphological growth, density, film thickness as determined by structural and chemical characterization and frictional and wear behavior. Also, the recent tribological advances using the surface modification processes such as ion implantation, ion beam mixing is discussed with emphasis on the development of lubricous high temperature ceramic surfaces

Ion plated gold films: Properties, tribological behavior and performance

The glow discharge energizing favorably modifies and controls the coating/substrate adherence and the nucleation and growth sequence of ion plated gold films. As a result the adherence, coherence, internal stresses, and morphology of the films are significantly improved. Gold ion plated films because of their graded coating/substrate interface and fine uniform densely packed microstructure not only improve the tribological properties but also induce a surface strengthening effect which improves the mechanical properties such as yield, tensile, and fatigue strength. Consequently significant improvements in the tribological performance of ion plated gold films as compared to vapor deposited gold films are shown in terms of decreased friction/wear and prolonged endurance life

The Improvement of Ion Plated Ag and Au Film Adherence to Si3N4 and SiC Surfaces for Increased Tribological Performance

A modified dc-diode plating system, utilizing a metallic screen cage as a cathode and referred as SCREEN CAGE ION PLATING (SCIP), is used to deposit Ag and Au lubricating films on Si3N4 and SiC surfaces. When deposition is performed in Ar or N2, glow discharge, the surface displays poor adhesive strength (less than 5 MPa). A dramatic increase in adhesive strength (less than 80 MPa) is achieved when plating is performed in a reactive 50% 02 + 50% Ar glow discharge. The excited/ionized oxygen species (O2(+)/O(+) in the glow discharge contribute to the oxidation of the Si3N4 or SiC surfaces as determined by X-ray Photoelectron Spectroscopy (XTS) depth profiling. The reactively sputter-oxidized S3N4 or SiC surfaces and the activated-oxidized-metastable Ag or Au species formed in the plasma cooperatively contribute to the increased adherence. As a result, the linear thermal expansion coefficient mismatch at the interface is reduced. These lubricating Ag and Au films under sliding conditions reduce the friction coefficient by a factor of 2-1/2 to 4

The effect of ion plated silver and sliding friction on tensile stress-induced cracking in aluminum oxide

A Hertzian analysis of the effect of sliding friction on contact stresses in alumina is used to predict the critical load for crack generation. The results for uncoated alumina and alumina coated with ion plated silver are compared. Friction coefficient inputs to the analysis are determined experimentally with a scratch test instrument employing an 0.2 mm radius diamond stylus. A series of scratches were made at constant load increments on coated and uncoated flat alumina surfaces. Critical loads for cracking are detected by microscopic examination of cross sections of scratches made at various loads and friction coefficients. Acoustic emission (AE) and friction trends were also evaluated as experimental techniques for determining critical loads for cracking. Analytical predictions correlate well with micrographic evidence and with the lowest load at which AE is detected in multiple scratch tests. Friction/load trends are not good indicators of early crack formation. Lubrication with silver films reduced friction and thereby increased the critical load for crack initiation in agreement with analytical predictions

Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films

By varying the radiofrequency (RF) power, the Ar pressure, and the potential on the substrates, MoS(x) films of various stoichiometry, density, adhesion, and morphology were produced. An increase of RF power increased the deposition rate and density of the MoS2 films as well as improved adhesion. However, the stoichiometry remained constant. An increase of Ar pressure increased the deposition rate but decreased the density, wheras both stoichiometry and adhesion were maximized at around 20 mtorr Ar pressure. Furthermore, a transition from compact film growth to columnar film growth was observed when the pressure was varied from 5 to 15 mtorr. Substoichiometric films were grown when a negative (bias) voltage was applied to the substrates

Frictional behavior and adhesion of Ag and Au films applied to aluminum oxide by oxygen-ion assisted Screen Cage Ion Plating (SCIP)

A modified dc-diode ion plating system, by utilizing a metallic screen cage as a cathode, is introduced for coating nonconductors such as ceramics. Screen cage ion plating (SCIP) is used to apply Ag and Au lubricating films on aluminum oxide surfaces. This process has excellent ability to coat around corners to produce three-dimensional coverage of the substrate. A dramatic increase in adhesion is achieved when plating is performed in a reactive 50 percent O2 - 50 percent Ar glow discharge compared to the adhesion when plating is performed in 100 percent Ar. The presence of oxygen ion assistance contributes to the excellent adhesion as measured in a pull-type adhesion tester. The Ag and Au film adhesion is significantly increased (less than 70MPa) and generally exceeds the cohesion of the substrate such that portions of the alumina are pulled out

A vacuum (10(exp -9) Torr) friction apparatus for determining friction and endurance life of MoSx films

The first part of this paper describes an ultrahigh vacuum friction apparatus (tribometer). The tribometer can be used in a ball-on-disk configuration and is specifically designed to measure the friction and endurance life of solid lubricating films such as MoS(x) in vacuum at a pressure of 10 exp -7 Pa. The sliding mode is typically unidirectional at a constant rotating speed. The second part of this paper presents some representative friction and endurance life data for magnetron sputtered MoS(x) films (110 nm thick) deposited on sputter-cleaned 440 C stainless-steel disk substrates, which were slid against a 6-mm-diameter 440 C stainless-steel bearing ball. All experiments were conducted with loads of 0.49 to 3.6 N (average Hertzian contact pressure, 0.33 to 0.69 GPa), at a constant rotating speed of 120 rpm (sliding velocity ranging from 31 to 107 mm/s due to the range of wear track radii involved in the experiments), in a vacuum of 7 x 10 exp -7 Pa and at room temperature. The results indicate that there are similarities in friction behavior of MoS(x) films overs their life cycles regardless of load applied. The coefficient of friction (mu) decreases as load W increases according to mu = kW exp -1/3. The endurance life E of MoS(x) films decreases as the load W increases according to E = KW exp -1.4 for the load range. The load- (or contract-pressure-) dependent endurance life allows us to reduce the time for wear experiments and to accelerate endurance life testing of MoS(x) films. For the magnetron-sputtered MoS(x) films deposited on 440 C stainless-steel disks: the specific wear rate normalized to the load and the number of revolutions was 3 x 10 exp -8 mm exp 3/N-revolution; the specific wear rate normalized to the load and the total sliding distance was 8 x 10 exp -7 mm exp 3/N-m; and the nondimensional wear coefficient of was approximately 5 x 10 exp -6. The values are almost independent of load in the range 0.49 to 3.6 N (average Hertzian contact pressures of 0.33 to 0.69 GPa)